Granted Patent B2

US 12,189,305 · App. 18/004,555 · Granted Jan 7, 2025

Inventors: Simon Gijsbert Josephus Mathijssen (Rosmalen, NL); Patricius Aloysius Jacobus Tinnemans (Hapert, NL); Arie Jeffrey Den Boef (Waalre, NL); Kaustuve Bhattacharyya (Veldhoven, NL); Samee Ur Rehman (Milpitas, CA)

Assignee: ASML Netherlands B.V.

G03F7/70633G03F9/7042G03F9/7046

Abstract

Claims (48)

1. A method of improving a measurement of a parameter of interest comprising:

obtaining metrology data comprising a plurality of measured values of the parameter of interest, relating to one or more targets on a substrate, each measured value relating to a different measurement combination of a target of the one or more targets and a measurement condition used to measure that target;

obtaining asymmetry metric data relating to asymmetry for the one or more targets;

determining a respective relationship for each of the measurement combinations relating a true value for the parameter of interest to the asymmetry metric data, based on an assumption that there is a common true value for the parameter of interest over the measurement combinations; and

using one or more of the respective relationships to improve a measurement of the parameter of interest.

2. The method of claim 1 , wherein the respective relationships are linear and are described by a proportionality constant.

3. The method of claim 1 , wherein the one or more targets comprise a plurality of targets and/or target sections of one or more targets that are all located within 1.5 mm of each other.

4. The method of claim 1 , wherein the metrology data comprises, for each of the one or more targets, two or more measured values for the parameter of interest, each measured value per target relating to a different measurement condition.

5. The method of claim 1 , further comprising:

performing an optimization that determines the relationship for each measurement combination so as to minimize differences in the measured values for the parameter of interest over the measurement combinations.

6. The method of claim 1 , wherein the using the one or more of the respective relationships to improve a measurement of the parameter of interest comprises using the respective relationship to correct a subsequent measurement of the parameter of interest from a corresponding target and/or relating to a corresponding measurement combination.

7. The method of claim 1 , wherein the using the one or more of the respective relationships to improve a measurement of the parameter of interest comprises using the respective relationship to determine a measurement recipe for measurement illumination used in a subsequent measurement of the parameter of interest from a corresponding target and/or relating to a corresponding measurement combination.

8. The method of claim 7 , wherein the determining a measurement recipe comprises performing a calibration to determine a preferred subset of measurement wavelengths for each target and/or measurement combination from a plurality of wavelengths.

9. The method of claim 8 , wherein the subset of measurement wavelengths numbers two or three wavelengths.

10. The method of claim 8 , further comprising:

identifying candidate subsets of wavelengths out of the plurality of wavelengths;

performing an optimization that determines the respective relationships for each measurement combination and candidate subset of wavelengths, so as to minimize differences in the measured values for the parameter of interest over the measurement combinations and candidate subsets; and

determining which candidate subsets of wavelengths results in the smallest variation in the parameter of interest over the measurement combinations and/or for which candidate subsets of wavelength does the measurement data best match an expected model.

11. The method of claim 8 , further comprising:

using one or more of the respective relationships to determine a reference value representing a true value of the parameter of interest; and

evaluating candidate subsets of wavelengths out of the plurality of wavelengths by comparing measured values of the parameter of interest for a target using each candidate subset to the reference value.

12. A processing arrangement comprising:

a non-transient computer program carrier comprising a computer program comprising program instructions operable to perform operations comprising improving a measurement of a parameter of interest comprising:

obtaining metrology data comprising a plurality of measured values of the parameter of interest, relating to one or more targets on a substrate, each measured value relating to a different measurement combination of a target of the one or more targets and a measurement condition used to measure that target;

obtaining asymmetry metric data relating to asymmetry for the one or more targets;

determining a respective relationship for each of the measurement combinations relating a true value for the parameter of interest to the asymmetry metric data, based on an assumption that there is a common true value for the parameter of interest over the measurement combinations; and

using one or more of the respective relationships to improve a measurement of the parameter of interest, when run on a suitable apparatus; and

a processor operable to run the computer program stored on the non-transient computer program carrier.

13. A lithographic apparatus comprising:

an alignment sensor;

a patterning device support configured to support a patterning device;

a substrate support configured to support a substrate; and

a processing arrangement comprising a non-transient computer program carrier comprising a computer program comprising program instructions operable to perform a method of improving a measurement of a parameter of interest comprising:

obtaining metrology data comprising a plurality of measured values of the parameter of interest, relating to one or more targets on a substrate, each measured value relating to a different measurement combination of a target of the one or more targets and a measurement condition used to measure that target;

obtaining asymmetry metric data relating to asymmetry for the one or more targets;

determining a respective relationship for each of the measurement combinations relating a true value for the parameter of interest to the asymmetry metric data, based on an assumption that there is a common true value for the parameter of interest over the measurement combinations; and

using one or more of the relationships to improve a measurement of the parameter of interest, when run on a suitable apparatus; and

a processor operable to run the computer program stored on the non-transient computer program carrier.

14. A metrology apparatus comprising:

a support configured to support a substrate;

an optical system configured to illuminate a structure with measurement radiation;

a detector configured to detect the measurement radiation scattered by the structure; and

a non-transient computer program carrier comprising a computer program comprising program instructions operable to perform a method of improving a measurement of a parameter of interest, the method comprising:

obtaining metrology data comprising a plurality of measured values of the parameter of interest, relating to one or more targets on a substrate, each measured value relating to a different measurement combination of a target of the one or more targets and a measurement condition used to measure that target;

obtaining asymmetry metric data relating to asymmetry for the one or more targets;

determining a respective relationship for each of the measurement combinations relating a true value for the parameter of interest to the asymmetry metric data, based on an assumption that there is a common true value for the parameter of interest over the measurement combinations; and

using one or more of the relationships to improve a measurement of the parameter of interest, when run on a suitable apparatus; and

a processor operable to run the computer program stored on the non-transient computer program carrier.

Assignments (1)

Continuity (2)

References Cited (27)