Granted Patent B2

US 12,195,855 · App. 17/897,307 · Granted Jan 14, 2025

Inventors: SungBae Kim (Cheonan-si, KR); HakYong Kwon (Hwaseong-si, KR); YoungMin Kim (Hwaseong-si, KR); KiKang Kim (Yongin-si, KR); SeungHwan Lee (Anseong-si, KR)

Assignee: ASM IP Holding B.V.

C23C16/52C23C16/4401C23C16/4412C23C16/45561H01L21/67242H01L21/67253G01M3/04

Abstract

Claims (26)

1. A gas-phase reactor system comprising:

a reactor comprising a reaction chamber;

a gas supply unit coupled to the reaction chamber via a gas supply line;

a first exhaust system coupled to the reaction chamber via a first exhaust line;

a bypass line coupled to the gas supply unit and to the first exhaust system;

a gas detector coupled to the bypass line via a connecting line;

a connecting line valve coupled to the connecting line; and

a controller configured to cause the gas-phase reactor system to perform a leak test while heating a substrate to a desired process temperature.

2. The gas-phase reactor system of claim 1 , wherein the bypass line is coupled to the gas supply line.

3. The gas-phase reactor system of claim 1 , wherein the bypass line is coupled to the first exhaust line.

4. The gas-phase reactor system of claim 1 , further comprising a second exhaust line coupled to the connecting line.

5. The gas-phase reactor system of claim 4 , further comprising a second exhaust line valve between the connecting line and a second exhaust system.

6. The gas-phase reactor system of claim 5 , wherein the second exhaust system is coupled to a chamber.

7. The gas-phase reactor system of claim 1 , further comprising a first bypass line valve between the gas supply unit and the first exhaust system.

8. The gas-phase reactor system of claim 7 , further comprising a second bypass line valve between the gas supply unit and the first exhaust system.

9. The gas-phase reactor system of claim 1 , wherein the gas detector is configured to detect a flow rate of a gas.

10. The gas-phase reactor system of claim 1 , wherein the gas detector is configured to detect a composition of a gas.

11. The gas-phase reactor system of claim 1 , wherein the controller is configured to cause the gas-phase reactor system to perform a leak test after a substrate has been loaded into the reaction chamber and before the substrate is removed from the reaction chamber.

12. The gas-phase reactor system of claim 1 , wherein the controller is configured to perform a leak test during a process cycle.

13. The gas-phase reactor system of claim 1 , wherein the controller is configured to stop flow of gas to the reaction chamber when the gas detector detects a flow rate of gas above a predetermined value.

14. The gas-phase reactor system of claim 1 , wherein the controller is configured to stop operation of the gas-phase reactor system when the gas detector detects a flow rate of gas above a predetermined value.

15. The gas-phase reactor system of claim 1 , wherein the controller is configured to exhaust the connecting line during a substrate process within the reaction chamber.

16. The gas-phase reactor system of claim 1 , wherein the controller is configured to exhaust the connecting line by closing the connecting line valve and opening a second exhaust line valve.

17. The gas-phase reactor system of claim 5 , wherein the controller is configured to exhaust gas to the first exhaust system and the second exhaust system during a leak check of the gas supply unit.

18. The gas-phase reactor system of claim 1 , further comprising a gas inlet line between the gas supply unit and the reactor.

19. The gas-phase reactor system of claim 1 , further comprising a gas inlet valve between the gas supply unit and the reactor.

Assignments (1)

Continuity (3)

References Cited (400)