IP Library › Granted Patent US 12,198,963
Granted Patent B2
US 12,198,963 · App. 18/480,745 · Granted Jan 14, 2025

Bonding system

Inventor: Yoshitaka Otsuka (Koshi, JP)
Assignee: TOKYO ELECTRON LIMITED
H01L21/681H01L21/67092H01L21/67103H01L21/67259H01L21/6838H01L24/80H01L2224/80011H01L2224/8013H01L2224/80896
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Quick Facts
Patent No.
US 12,198,963
App. No.
18/480,745
Granted
Jan 14, 2025
Kind
B2
Abstract

A bonding system includes a first holder and a second holder arranged to be spaced apart from each other in a vertical direction; a position adjuster configured to move the first holder and the second holder relatively to perform a position adjustment in a horizontal direction between a first substrate held by the first holder and a second substrate held by the second holder; a pressing unit configured to press the first substrate and the second substrate against each other; a measuring unit configured to measure a position deviation between an alignment mark on the first substrate and an alignment mark on the second substrate, the first substrate and the second substrate being bonded by the pressing unit; and a position adjustment controller configured to control the position adjustment in the horizontal direction in a currently-performed bonding processing based on the position deviation generated in a previously-performed bonding processing.

Claims (54)

1. A bonding system, comprising:

a first holder and a second holder arranged to be spaced apart from each other in a vertical direction, the first holder having, on a surface thereof facing the second holder, an attraction surface configured to attract and hold a first substrate, and the second holder having, on a surface thereof facing the first holder, an attraction surface configured to attract and hold a second substrate;

a position adjuster configured to move the first holder and the second holder relatively to perform a position adjustment in a horizontal direction between the first substrate held by the first holder and the second substrate held by the second holder;

a pressing unit configured to press the first substrate held by the first holder and the second substrate held by the second holder against each other;

a position adjustment controller configured to receive, after the first substrate and the second substrate are pressed against each other by the pressing unit and a bonding of the first substrate and the second substrate is completed, measurement data obtained by measuring a position deviation between an alignment mark formed on the first substrate and an alignment mark formed on the second substrate in a state upon the completion of the bonding from a measuring unit positioned outside the bonding system, and configured to control the position adjustment in the horizontal direction in a currently-performed bonding processing based on the position deviation generated in a previously-performed bonding processing;

a distortion generator configured to generate a distortion of the second substrate held by the second holder; and

a distortion controller configured to control the distortion in the currently-performed bonding processing based on the position deviation generated in the previously-performed bonding processing.

2. The bonding system of claim 1 ,

wherein the distortion generator comprises an attracting pressure distribution adjuster configured to generate the distortion of the second substrate by adjusting a distribution of an attracting pressure of the second holder configured to attract the second substrate.

3. The bonding system of claim 2 ,

wherein the distortion generator comprises a temperature distribution adjuster configured to generate the distortion of the second substrate by adjusting a temperature distribution of the second substrate.

4. The bonding system of claim 3 ,

wherein the distortion generator comprises an attraction surface transforming unit configured to generate, by transforming the attraction surface of the second holder configured to attract the second substrate, the distortion of the second substrate previously attracted to the attraction surface.

5. The bonding system of claim 4 , further comprising:

a determination unit configured to determine, through a statistical analysis, whether there is a meaningful difference between the position deviation generated in the previously-performed bonding processing and the position deviation generated in the currently-performed bonding processing.

6. A bonding system, comprising:

a first holder and a second holder arranged to be spaced apart from each other in a vertical direction, the first holder having, on a surface thereof facing the second holder, an attraction surface configured to attract and hold a first substrate, and the second holder having, on a surface thereof facing the first holder, an attraction surface configured to attract and hold a second substrate;

a position adjuster configured to move the first holder and the second holder relatively to perform a position adjustment in a horizontal direction between the first substrate held by the first holder and the second substrate held by the second holder;

a pressing unit configured to press the first substrate held by the first holder and the second substrate held by the second holder against each other;

a position adjustment controller configured to receive, after the first substrate and the second substrate are pressed against each other by the pressing unit and a bonding of the first substrate and the second substrate is completed, measurement data obtained by measuring a position deviation between an alignment mark formed on the first substrate and an alignment mark formed on the second substrate in a state upon the completion of the bonding from a measuring unit positioned outside the bonding system, and configured to control the position adjustment in the horizontal direction in a currently-performed bonding processing based on the position deviation generated in a previously-performed bonding processing;

a determination unit configured to determine, through a statistical analysis, whether there is a meaningful difference between the position deviation generated in the previously-performed bonding processing and the position deviation generated in the currently-performed bonding processing.

7. The bonding system of claim 1 ,

wherein if a cumulative number of a calculation data of the position deviation generated in the previously-performed bonding processing is equal to or larger than a preset number, the position adjustment controller is configured to control the position adjustment in the horizontal direction in the currently-performed bonding processing based on the cumulated calculation data, and

if the cumulative number is less than the preset number, the position adjustment controller is configured not to control the position adjustment in the horizontal direction in the currently-performed bonding processing based on the cumulated calculation data.

8. The bonding system of claim 1 ,

wherein the distortion generator comprises a temperature distribution adjuster configured to generate the distortion of the second substrate by adjusting a temperature distribution of the second substrate.

9. The bonding system of claim 1 ,

wherein the distortion generator comprises an attraction surface transforming unit configured to generate, by transforming the attraction surface of the second holder configured to attract the second substrate, the distortion of the second substrate previously attracted to the attraction surface.

10. The bonding system of claim 2 ,

wherein the distortion generator comprises an attraction surface transforming unit configured to generate, by transforming the attraction surface of the second holder configured to attract the second substrate, the distortion of the second substrate previously attracted to the attraction surface.

11. The bonding system of claim 8 ,

wherein the distortion generator comprises an attraction surface transforming unit configured to generate, by transforming the attraction surface of the second holder configured to attract the second substrate, the distortion of the second substrate previously attracted to the attraction surface.

12. The bonding system of claim 1 , further comprising:

a determination unit configured to determine, through a statistical analysis, whether there is a meaningful difference between the position deviation generated in the previously-performed bonding processing and the position deviation generated in the currently-performed bonding processing.

13. The bonding system of claim 2 , further comprising:

a determination unit configured to determine, through a statistical analysis, whether there is a meaningful difference between the position deviation generated in the previously-performed bonding processing and the position deviation generated in the currently-performed bonding processing.

14. The bonding system of claim 3 , further comprising:

a determination unit configured to determine, through a statistical analysis, whether there is a meaningful difference between the position deviation generated in the previously-performed bonding processing and the position deviation generated in the currently-performed bonding processing.

15. The bonding system of claim 8 , further comprising:

a determination unit configured to determine, through a statistical analysis, whether there is a meaningful difference between the position deviation generated in the previously-performed bonding processing and the position deviation generated in the currently-performed bonding processing.

16. The bonding system of claim 9 , further comprising:

a determination unit configured to determine, through a statistical analysis, whether there is a meaningful difference between the position deviation generated in the previously-performed bonding processing and the position deviation generated in the currently-performed bonding processing.

17. The bonding system of claim 2 ,

wherein if a cumulative number of a calculation data of the position deviation generated in the previously-performed bonding processing is equal to or larger than a preset number, the position adjustment controller is configured to control the position adjustment in the horizontal direction in the currently-performed bonding processing based on the cumulated calculation data, and

if the cumulative number is less than the preset number, the position adjustment controller is configured not to control the position adjustment in the horizontal direction in the currently-performed bonding processing based on the cumulated calculation data.

18. The bonding system of claim 6 ,

wherein if a cumulative number of a calculation data of the position deviation generated in the previously-performed bonding processing is equal to or larger than a preset number, the position adjustment controller is configured to control the position adjustment in the horizontal direction in the currently-performed bonding processing based on the cumulated calculation data, and

if the cumulative number is less than the preset number, the position adjustment controller is configured not to control the position adjustment in the horizontal direction in the currently-performed bonding processing based on the cumulated calculation data.

19. The bonding system of claim 8 ,

wherein if a cumulative number of a calculation data of the position deviation generated in the previously-performed bonding processing is equal to or larger than a preset number, the position adjustment controller is configured to control the position adjustment in the horizontal direction in the currently-performed bonding processing based on the cumulated calculation data, and

if the cumulative number is less than the preset number, the position adjustment controller is configured not to control the position adjustment in the horizontal direction in the currently-performed bonding processing based on the cumulated calculation data.

20. The bonding system of claim 9 ,

wherein if a cumulative number of a calculation data of the position deviation generated in the previously-performed bonding processing is equal to or larger than a preset number, the position adjustment controller is configured to control the position adjustment in the horizontal direction in the currently-performed bonding processing based on the cumulated calculation data, and

if the cumulative number is less than the preset number, the position adjustment controller is configured not to control the position adjustment in the horizontal direction in the currently-performed bonding processing based on the cumulated calculation data.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 4, 2023
From: OTSUKA, YOSHITAKA
To: TOKYO ELECTRON LIMITED
Reel/Frame 065121/0588 →
Priority Claims (1)
JP 2018-008892 · Jan 23, 2018 · national
Continuity (2)
Continuation 16964070
Related Publication 20240047257A1 · Feb 8, 2024
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Cited By (1)
US 12,500,108