Calibration hardware for ion implanter
View Patent ↗A horizontally oriented calibration jig for a wafer gripper arm of an ion implanter is disclosed. The calibration jig is mounted within the process chamber of the ion implanter. The calibration jig includes a mounting plate that spans a diameter of the wafer gripper arm, a support stand passing through the mounting plate, and a calibration plate at a bottom end of the support stand. The perimeter of the calibration plate includes a plurality of notches. The calibration plate is rotated. If any finger of the wafer gripper arm falls into a notch, the rotating calibration plate stops. The finger is then adjusted until it does not fall into a notch.
1. A method for calibrating a wafer gripper arm of an ion implantation device, comprising:
inserting the wafer gripper arm into a horizontally oriented calibration jig that comprises:
a mounting plate that spans a diameter of the wafer gripper arm;
a support stand passing through the mounting plate; and
a calibration plate at a bottom end of the support stand, a perimeter of the calibration plate including one or more notches;
rotating the calibration plate; and
adjusting any finger of the wafer gripper arm that falls into the one or more notches until the calibration plate can be rotated without any fingers falling into a notch of the calibration plate.
2. The method of claim 1 , wherein the calibration plate has a plurality of notches spaced around a perimeter of the calibration plate.
3. The method of claim 1 , wherein the calibration plate is circular.
4. The method of claim 1 , wherein each notch has a depth of about 1 millimeter to about 2 millimeters.
5. The method of claim 1 , wherein each notch has a rectangular, elliptical, or polygonal shape.
6. The method of claim 1 , wherein a diameter of the calibration plate is less than an inner diameter of the wafer gripper arm.
7. The method of claim 1 , wherein the mounting plate includes vertical hooks at opposite ends thereof for holding the wafer gripper arm in place.
8. The method of claim 1 , wherein the calibration plate is located about 30 mm to about 100 mm below the mounting plate.
9. The method of claim 1 , further comprising orienting the wafer gripper arm horizontally prior to inserting the wafer gripper arm into the calibration jig.
10. The method of claim 1 , wherein the calibration jig is located within a process chamber of the ion implantation device.
11. A method for repairing a wafer gripper arm of an ion implantation device, comprising:
replacing one or more elements of the wafer gripper arm;
moving the wafer gripper arm within a process chamber of the ion implantation device to a horizontally-oriented calibration jig that comprises:
a mounting plate that spans a diameter of the wafer gripper arm;
a support stand passing through the mounting plate; and
a calibration plate at a bottom end of the support stand, a perimeter of the calibration plate including one or more notches;
inserting the wafer gripper arm into the calibration jig;
rotating the calibration plate; and
adjusting any finger of the wafer gripper arm that falls into the one or more notches until the calibration plate can be rotated without any fingers falling into a notch of the calibration plate.
12. The method of claim 11 , wherein the calibration plate has a plurality of notches spaced around a perimeter of the calibration plate.
13. The method of claim 11 , wherein the calibration plate is circular.
14. The method of claim 11 , wherein each notch has a depth of about 1 millimeter to about 2 millimeters.
15. The method of claim 11 , wherein each notch has a rectangular, elliptical, or polygonal shape.
16. The method of claim 11 , wherein the mounting plate includes vertical hooks at opposite ends thereof for holding the wafer gripper arm in place.
17. The method of claim 11 , wherein the calibration plate is located about 30 mm to about 100 mm below the mounting plate.
18. An ion implantation device, comprising:
a process chamber containing a vertically oriented scanning wheel with a plurality of wafer support structures;
a load-lock chamber;
at least one wafer gripper arm located within the process chamber for transferring wafers from the load-lock chamber to the wafer support structures of the scanning wheel; and
a horizontally oriented calibration jig within the process chamber, the calibration jig comprising
a mounting plate that spans a diameter of the wafer gripper arm;
a support stand passing through the mounting plate; and
a calibration plate at a bottom end of the support stand, a perimeter of the calibration plate including one or more notches.
19. The method of claim 18 , wherein the calibration plate has a plurality of notches spaced around a perimeter of the calibration plate.
20. The device of claim 18 , wherein the calibration plate is located about 30 mm to about 100 mm below the mounting plate.