Array substrate and fabrication method thereof, display panel
Provided are an array substrate, a fabrication method thereof, and a display panel. The array substrate includes a substrate; a reflective electrode layer on the substrate; a pixel defining layer on a side of the reflective electrode layer away from the substrate; an anti-reflection layer between the reflective electrode layer and the pixel defining layer, and configured to absorb light from outside, an orthographic projection of the anti-reflection layer on the substrate being within an overlapping portion between the orthographic projection of the reflective electrode layer on the substrate and the orthographic projection of the pixel defining layer on the substrate; and a black matrix on a side of the pixel defining layer away from the substrate, an orthographic projection of at least a portion of the anti-reflection layer on the substrate not overlapping with an orthographic projection of the black matrix on the substrate.
1. An array substrate, comprising:
a substrate;
a reflective electrode layer on the substrate;
a pixel defining layer on a side of the reflective electrode layer away from the substrate, wherein an orthographic projection of the reflective electrode layer on the substrate overlaps with an orthographic projection of the pixel defining layer on the substrate;
an anti-reflection layer between the reflective electrode layer and the pixel defining layer, and configured to absorb light from outside, wherein an orthographic projection of the anti-reflection layer on the substrate is within an overlapping portion between the orthographic projection of the reflective electrode layer on the substrate and the orthographic projection of the pixel defining layer on the substrate;
a black matrix on a side of the pixel defining layer away from the substrate, wherein an orthographic projection of at least a portion of the anti-reflection layer on the substrate does not overlap with an orthographic projection of the black matrix on the substrate; and
a first protective layer on the side of the reflective electrode layer away from the substrate, wherein the first protective layer and the anti-reflection layer are formed from a same black metal oxide layer, and a light transmittance of a portion of the black metal oxide layer serving as the first protective layer is greater than a light transmittance of a portion of the black metal oxide layer serving as the anti-reflection layer.
2. The array substrate of claim 1 , wherein the orthographic projection of the anti-reflection layer on the substrate adjoins the orthographic projection of the black matrix on the substrate.
3. The array substrate of claim 1 , wherein the orthographic projection of the anti-reflection layer on the substrate partially overlaps with the orthographic projection of the black matrix on the substrate.
4. The array substrate of claim 1 , wherein an orthographic projection of at least one edge of the anti-reflection layer on the substrate coincides with an orthographic projection of an edge of the pixel defining layer on the substrate.
5. The array substrate of claim 1 , wherein a material of the anti-reflection layer comprises a black metal oxide.
6. The array substrate of claim 5 , wherein the black metal oxide is tungsten oxide (WO x ) or molybdenum oxide (MoO x ).
7. The array substrate of claim 5 , wherein a material of the reflective electrode layer comprises any one of silver or aluminum.
8. The array substrate of claim 1 , further comprising a display structure and a color filter layer on a side of the display structure away from the substrate, wherein
the display structure comprises:
the reflective electrode layer;
a light emitting layer on a side of the reflective electrode layer and the pixel defining layer away from the substrate; and
a transparent electrode layer on a side of the light emitting layer away from the substrate, and
the color filter layer comprises:
the black matrix; and
a color filter in an area defined by the black matrix.
9. The array substrate of claim 8 , wherein the first protective layer is between the reflective electrode layer and the light emitting layer.
10. The array substrate of claim 1 , further comprising: a second protective layer between the reflective electrode layer and the substrate.
11. The array substrate of claim 10 , wherein the second protective layer is made of indium tin oxide.
12. The array substrate of claim 1 , further comprising: a third protective layer between the reflective electrode layer and the anti-reflection layer, wherein the orthographic projection of the reflective electrode layer on the substrate is within an orthographic projection of the third protective layer on the substrate.
13. A display panel, comprising the array substrate of claim 1 .
14. A method for fabricating an array substrate, comprising:
forming a reflective electrode layer on a substrate;
forming an anti-reflection layer and a pixel defining layer on a side of the reflective electrode layer away from the substrate, wherein the anti-reflection layer is configured to absorb light from outside and is formed between the reflective electrode layer and the pixel defining layer; an orthographic projection of the reflective electrode layer on the substrate overlaps with an orthographic projection of the pixel defining layer on the substrate; an orthographic projection of the anti-reflection layer on the substrate is within an overlapping portion between the orthographic projection of the reflective electrode layer on the substrate and the orthographic projection of the pixel defining layer on the substrate; and
forming a black matrix on a side of the pixel defining layer away from the substrate, wherein an orthographic projection of at least a portion of the anti-reflection layer on the substrate does not overlap with an orthographic projection of the black matrix on the substrate,
wherein the method further comprises forming a first protective layer on the side of the reflective electrode layer away from the substrate, wherein the first protective layer and the anti-reflection layer are formed from a same black metal oxide layer, and a light transmittance of a portion of the black metal oxide layer serving as the first protective layer is greater than a light transmittance of a portion of the black metal oxide layer serving as the anti-reflection layer.
15. The method of claim 14 , wherein forming the anti-reflection layer and the pixel defining layer on the side of the reflective electrode layer away from the substrate comprises:
forming an anti-reflection material layer on the side of the reflective electrode layer away from the substrate;
forming the pixel defining layer on a side of the anti-reflection material layer away from the substrate; and
processing the anti-reflection material layer by using the pixel defining layer as a mask to form the anti-reflection layer.
16. The method of claim 15 , wherein processing the anti-reflection material layer by using the pixel defining layer as the mask to form the anti-reflection layer comprises:
etching the anti-reflection material layer by using the pixel defining layer as the mask to remove a portion of the anti-reflection material layer exposed by the pixel defining layer.
17. The method of claim 15 , wherein processing the anti-reflection material layer by using the pixel defining layer as the mask to form the anti-reflection layer comprises:
modifying the anti-reflection material layer by using the pixel defining layer as the mask to make a portion of the anti-reflection material layer exposed by the pixel defining layer become light-transmissive.
18. The method of claim 14 , wherein a material of the anti-reflection layer comprises a black metal oxide.
19. The method of claim 14 , further comprising:
forming a light emitting layer on a side of the reflective electrode layer and the pixel defining layer away from the substrate; and
forming a transparent electrode layer on a side of the light emitting layer away from the substrate, wherein a light transmittance of the transparent electrode layer ranges from 40% to 60%.