US 4201444A
· McCartney et al.
· 1980
[cited by applicant]
US 4217030A
· Howarth
· 1980
[cited by applicant]
US 4268115A
· Slemon et al.
· 1981
[cited by applicant]
US 4327964A
· Haesly et al.
· 1982
[cited by applicant]
US 4635875A
· Apple
· 1987
[cited by applicant]
US 4691988A
· Tremblay et al.
· 1987
[cited by applicant]
US 4715675A
· Kevern et al.
· 1987
[cited by applicant]
US 4762389A
· Kaihara
· 1988
[cited by applicant]
US 4787699A
· Moulin
· 1988
[cited by applicant]
US 5076656A
· Briggs et al.
· 1991
[cited by applicant]
US 5212752A
· Stephenson et al.
· 1993
[cited by applicant]
US 5216733A
· Nagase et al.
· 1993
[cited by applicant]
US 5231685A
· Hanzawa et al.
· 1993
[cited by applicant]
US 5245683A
· Belenkiy et al.
· 1993
[cited by applicant]
US 5253315A
· Fentress
· 1993
[cited by examiner]
US 5261019A
· Beard et al.
· 1993
[cited by applicant]
US 5287425A
· Chang
· 1994
[cited by applicant]
US 5452386A
· Van Woesik
· 1995
[cited by applicant]
US 5465313A
· Belenkiy et al.
· 1995
[cited by applicant]
US 5471713A
· Alter et al.
· 1995
[cited by applicant]
US 5524159A
· Turgeon et al.
· 1996
[cited by applicant]
US 5619610A
· King et al.
· 1997
[cited by applicant]
US 5637010A
· Jost et al.
· 1997
[cited by applicant]
US 5640476A
· Womack et al.
· 1997
[cited by applicant]
US 5682541A
· Lee et al.
· 1997
[cited by applicant]
US 5809192A
· Manning et al.
· 1998
[cited by applicant]
US 5862289A
· Walter et al.
· 1999
[cited by applicant]
US 5863083A
· Giebel et al.
· 1999
[cited by applicant]
US 5897393A
· Haftmann
· 1999
[cited by applicant]
US 5898808A
· Morlion et al.
· 1999
[cited by applicant]
US 5915058A
· Clairardin et al.
· 1999
[cited by applicant]
US 5946435A
· Zheng et al.
· 1999
[cited by applicant]
US 5946436A
· Takashi
· 1999
[cited by applicant]
US 5953475A
· Beier et al.
· 1999
[cited by applicant]
US 6019520A
· Lin et al.
· 2000
[cited by applicant]
US 6079881A
· Roth
· 2000
[cited by applicant]
US 6081647A
· Roth et al.
· 2000
[cited by applicant]
US 6151432A
· Nakajima et al.
· 2000
[cited by applicant]
US 6154597A
· Roth
· 2000
[cited by applicant]
US 6245999B1
· Costigan et al.
· 2001
[cited by applicant]
US 6287018B1
· Andrews et al.
· 2001
[cited by applicant]
US 6296399B1
· Halbach et al.
· 2001
[cited by applicant]
US 6325547B1
· Cammons et al.
· 2001
[cited by applicant]
US 6396993B1
· Giebel et al.
· 2002
[cited by applicant]
US 6398422B1
· Szilagyi et al.
· 2002
[cited by applicant]
US 6419399B1
· Loder et al.
· 2002
[cited by applicant]
US 6428215B1
· Nault
· 2002
[cited by applicant]
US 6429373B1
· Scrimpshire et al.
· 2002
[cited by applicant]
US 6540410B2
· Childers et al.
· 2003
[cited by applicant]
US 6550978B2
· De Marchi
· 2003
[cited by applicant]
US 6579014B2
· Melton et al.
· 2003
[cited by applicant]
US 6648520B2
· McDonald et al.
· 2003
[cited by applicant]
US 6672774B2
· Theuerkorn et al.
· 2004
[cited by applicant]
US 6695489B2
· Nault
· 2004
[cited by applicant]
US 6811321B1
· Schmalzigaug et al.
· 2004
[cited by applicant]
US 6899467B2
· McDonald et al.
· 2005
[cited by applicant]
US 6902140B1
· Huang
· 2005
[cited by applicant]
US 6913392B2
· Grzegorzewska et al.
· 2005
[cited by applicant]
US 6935789B2
· Gross, III et al.
· 2005
[cited by applicant]
US 6945704B2
· Yamaguchi
· 2005
[cited by applicant]
US 6960025B2
· Gurreri
· 2005
[cited by applicant]
US 7090406B2
· Melton et al.
· 2006
[cited by applicant]
US 7147384B2
· Hardcastle et al.
· 2006
[cited by applicant]
US 7198409B2
· Smith et al.
· 2007
[cited by applicant]
US 7204016B2
· Roth et al.
· 2007
[cited by applicant]
US 7204644B2
· Barnes et al.
· 2007
[cited by applicant]
US 7226215B2
· Bareel et al.
· 2007
[cited by applicant]
US 7281859B2
· Mudd et al.
· 2007
[cited by applicant]
US 7344317B2
· Krowiak et al.
· 2008
[cited by applicant]
US 7357579B2
· Feldner
· 2008
[cited by applicant]
US 7369738B2
· Larson et al.
· 2008
[cited by applicant]
US 7406241B1
· Opaluch et al.
· 2008
[cited by applicant]
US 7510335B1
· Su et al.
· 2009
[cited by applicant]
US 7530745B2
· Holmquist
· 2009
[cited by applicant]
US 7572065B2
· Lu et al.
· 2009
[cited by applicant]
US 7574095B2
· Lock
· 2009
[cited by examiner]
US 7614797B2
· Lu
· 2009
[cited by examiner]
US 7614799B2
· Bradley et al.
· 2009
[cited by applicant]
US 7676132B1
· Mandry et al.
· 2010
[cited by applicant]
US 7712974B2
· Yazaki et al.
· 2010
[cited by applicant]
US 7744288B2
· Lu et al.
· 2010
[cited by applicant]
US 7775726B2
· Pepin et al.
· 2010
[cited by applicant]
US 7785015B2
· Melton et al.
· 2010
[cited by applicant]
US 7806599B2
· Margolin et al.
· 2010
[cited by applicant]
US 7838775B2
· Montena
· 2010
[cited by applicant]
US 8311378B2
· Niiyama et al.
· 2012
[cited by applicant]
US 8391664B2
· Kowalczyk et al.
· 2013
[cited by applicant]
US 8393803B2
· Hogue
· 2013
[cited by applicant]
US 8439577B2
· Jenkins
· 2013
[cited by applicant]
US 8443488B2
· Zhang
· 2013
[cited by applicant]
US 8480312B2
· Smith et al.
· 2013
[cited by applicant]
US 8548293B2
· Kachmar
· 2013
[cited by applicant]
US 8577199B2
· Pierce et al.
· 2013
[cited by applicant]
US 8647140B2
· Annecke
· 2014
[cited by applicant]
US 8753022B2
· Schroeder et al.
· 2014
[cited by applicant]
US 8821180B2
· Blakborn et al.
· 2014
[cited by applicant]
US 9130303B2
· Anderson et al.
· 2015
[cited by applicant]
US 9182567B2
· Mullaney
· 2015
[cited by applicant]
US 9216530B2
· Vaccaro
· 2015
[cited by applicant]
US 9229173B2
· Yamauchi et al.
· 2016
[cited by applicant]
US 9239441B2
· Melton et al.
· 2016
[cited by applicant]
US 9268102B2
· Daems et al.
· 2016
[cited by applicant]
US 9285559B1
· Stockton et al.
· 2016
[cited by applicant]
US 9297976B2
· Hill et al.
· 2016
[cited by applicant]
US 9383539B2
· Hill et al.
· 2016
[cited by applicant]
US 9417403B2
· Mullaney et al.
· 2016
[cited by applicant]
US 9448370B2
· Xue et al.
· 2016
[cited by applicant]
US 9470847B2
· Grinderslev
· 2016
[cited by applicant]
US 9557496B2
· Irwin et al.
· 2017
[cited by applicant]
US 9684138B2
· Lu
· 2017
[cited by applicant]
US 9739971B2
· Eberle, Jr. et al.
· 2017
[cited by applicant]
US 9804342B2
· Little et al.
· 2017
[cited by applicant]
US 9829649B2
· Liu et al.
· 2017
[cited by applicant]
US 9910224B2
· Liu et al.
· 2018
[cited by applicant]
US 9939591B2
· Mullaney et al.
· 2018
[cited by applicant]
US 9971104B2
· Tong et al.
· 2018
[cited by applicant]
US 20010012428A1
· Nakajima et al.
· 2001
[cited by applicant]
US 20010014197A1
· De Marchi
· 2001
[cited by applicant]
US 20020076165A1
· Childers et al.
· 2002
[cited by applicant]
US 20020106163A1
· Cairns
· 2002
[cited by applicant]
US 20020139966A1
· Griffioen et al.
· 2002
[cited by applicant]
US 20020186934A1
· Hug et al.
· 2002
[cited by applicant]
US 20030063868A1
· Fentress
· 2003
[cited by examiner]
US 20030077045A1
· Fleenor et al.
· 2003
[cited by applicant]
US 20040023598A1
· Zimmel et al.
· 2004
[cited by applicant]
US 20060115219A1
· Mudd et al.
· 2006
[cited by applicant]
US 20070025665A1
· Dean, Jr. et al.
· 2007
[cited by applicant]
US 20070284146A1
· Dower et al.
· 2007
[cited by applicant]
US 20080011990A1
· Kostet et al.
· 2008
[cited by applicant]
US 20080089650A1
· Legler et al.
· 2008
[cited by applicant]
US 20080175540A1
· Zheng
· 2008
[cited by examiner]
US 20080175545A1
· Zheng
· 2008
[cited by examiner]
US 20130058615A1
· Matthew et al.
· 2013
[cited by applicant]
US 20130101258A1
· Hikosaka et al.
· 2013
[cited by applicant]
US 20140219621A1
· Barnette, Jr. et al.
· 2014
[cited by applicant]
US 20150268434A1
· Barnette, Jr. et al.
· 2015
[cited by applicant]
US 20170131509A1
· Xiao et al.
· 2017
[cited by applicant]
CH 681393A5
· 1993
[cited by examiner]
CN 1175002A
· 1998
[cited by applicant]
CN 1333471A
· 2002
[cited by applicant]
CN 1910488A
· 2007
[cited by applicant]
CN 101084460A
· 2007
[cited by applicant]
CN 101084461A
· 2007
[cited by applicant]
CN 101346653A
· 2009
[cited by applicant]
CN 101641627A
· 2010
[cited by applicant]
CN 201527493U
· 2010
[cited by applicant]
CN 201926781U
· 2011
[cited by applicant]
CN 102313934A
· 2012
[cited by applicant]
CN 102360104A
· 2012
[cited by applicant]
CN 102460259A
· 2012
[cited by applicant]
CN 202583527U
· 2012
[cited by applicant]
CN 202815276U
· 2013
[cited by applicant]
CN 202956505U
· 2013
[cited by applicant]
CN 203054267U
· 2013
[cited by applicant]
CN 103353635A
· 2013
[cited by applicant]
CN 103718392A
· 2014
[cited by applicant]
CN 203688854U
· 2014
[cited by applicant]
CN 203786340U
· 2014
[cited by applicant]
CN 203825243U
· 2014
[cited by applicant]
CN 105093420A
· 2015
[cited by applicant]
CN 105093421A
· 2015
[cited by applicant]
EP 0330399A1
· 1989
[cited by applicant]
EP 0429398A2
· 1991
[cited by applicant]
EP 0740174A2
· 1996
[cited by applicant]
EP 2012153A1
· 2009
[cited by applicant]
EP 2128675A1
· 2009
[cited by applicant]
EP 2355286A1
· 2011
[cited by applicant]
EP 2482109A2
· 2012
[cited by applicant]
EP 2031719B1
· 2013
[cited by applicant]
GB 2509532A
· 2014
[cited by applicant]
JP 2001147344A
· 2001
[cited by applicant]
JP 2004126371A
· 2004
[cited by applicant]
JP 2007165235A
· 2007
[cited by applicant]
JP 2008152266A
· 2008
[cited by applicant]
JP 2008299348A
· 2008
[cited by applicant]
WO 0013052A1
· 2000
[cited by applicant]
WO 0140839A1
· 2001
[cited by applicant]
WO 02052310A2
· 2002
[cited by applicant]
WO 2006069092A2
· 2006
[cited by applicant]
WO 2006069093A1
· 2006
[cited by applicant]
WO 2008091720A1
· 2008
[cited by applicant]
WO WO2008089416A2
· 2008
[cited by examiner]
WO 2008094365A1
· 2008
[cited by applicant]
WO 2010118031A1
· 2010
[cited by applicant]
WO 2012037727A1
· 2012
[cited by applicant]
WO 2012125836A2
· 2012
[cited by applicant]
WO 2013077969A1
· 2013
[cited by applicant]
WO 2013126429A2
· 2013
[cited by applicant]
WO 2017106507A1
· 2017
[cited by applicant]
WO 2017106514A1
· 2017
[cited by applicant]
CH 681393 A5 (English Translation) (Year: 1993).
[cited by examiner]
International Search Report and Written Opinion for International Application No. PCT/IB2015/050980 mailed Aug. 18, 2015 (11 pages).
[cited by applicant]
Fabricating with XIAMETER® High Consistency Silicon Rubber, Product Guide, Silicones Simplified XIAMETER® from Dow Corning, 50 pages (2009).
[cited by applicant]
XIAMETER® brand High Consistency Rubber (HCR) Bases—Asia (Excluding Japan) Selection Guide, Silicones Simplified XIAMETER® from Dow Corning, 6 pages (2011).
[cited by applicant]