IP Library › Granted Patent US 12,235,585
Granted Patent B2
US 12,235,585 · App. 17/764,865 · Granted Feb 25, 2025

Radiation conduit

Inventors: Remco Johannes Elisa Heijmans (Neeritter, NL); Gerrit Van Der Straaten (Oisterwijk, NL); Ivo Vanderhallen (Leende, NL); Jan Steven Christiaan Westerlaken (Heesch, NL)
Assignee: ASML Netherlands B.V.
G03F7/70033G03F7/70166H05G2/003
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 12,235,585
App. No.
17/764,865
Granted
Feb 25, 2025
Kind
B2
Abstract

A radiation source for an EUV lithography apparatus is disclosed. The radiation source comprises a chamber comprising a plasma formation region, a radiation collector arranged in the chamber and configured to collect radiation emitted at the plasma formation region and to direct the collected radiation towards an intermediate focus region, and a radiation conduit disposed between the radiation collector and the intermediate focus region. The radiation conduit comprises at least one outlet on an inner surface of a wall of the radiation conduit for directing a protective gas flow, and at least one guide portion extending from the inner surface of the wall of the radiation conduit and configured to redirect the protective gas flow. Also disclosed is a method of reducing debris and/or vapor deposition in the radiation conduit by providing a protective gas flow to the at least one outlet of the radiation conduit.

Claims (21)

1. A radiation source for an EUV lithography apparatus, the radiation source comprising:

a chamber comprising a plasma formation region;

a radiation collector configured in the chamber and configured to collect radiation emitted at the plasma formation region and to direct the collected radiation towards an intermediate focus region; and

a radiation conduit disposed between the radiation collector and the intermediate focus region,

wherein the radiation conduit comprises at least one outlet on an inner surface of a wall of the radiation conduit for directing a protective gas flow, and at least one guide portion extending from the inner surface of the wall of the radiation conduit and configured to redirect the protective gas flow, and

wherein the radiation source comprises magnets for generating a magnetic field within the chamber, the magnets being configured to trap charged particles radiating from the plasma formation region.

2. The radiation source of claim 1 , wherein the at least one guide portion is configured to redirect the protective gas flow from a first direction substantially away from the inner surface of the wall of the radiation conduit to a second direction substantially along the inner surface of the wall of the radiation conduit.

3. The radiation source of claim 2 , wherein the second direction is substantially towards the plasma formation region.

4. The radiation source of claim 1 , wherein the at least one guide portion is configured to redirect the protective gas flow to form a protective gas curtain flow directed substantially along the inner surface of the wall of the radiation conduit.

5. The radiation source of claim 1 , wherein the inner surface of the wall tapers inwardly from an entrance aperture distal to the intermediate focus region to an exit aperture proximal to the intermediate focus region.

6. The radiation source of claim 1 , wherein the radiation conduit is disposed proximal to the intermediate focus region.

7. The radiation source of claim 1 , wherein the at least one guide portion and the radiation conduit are formed as a monolithic structure.

8. The radiation source of claim 1 , wherein the at least one guide portion extends circumferentially and/or continuously around the inner surface of the wall of the radiation conduit.

9. The radiation source of claim 1 , wherein a surface of the at least one guide portion forms a channel between the inner surface of the wall of the radiation conduit and the at least one guide portion.

10. The radiation source of claim 9 , wherein the at least one outlet on the inner surface of the wall of the radiation conduit is disposed in the channel.

11. The radiation source of claim 1 , wherein the inner surface of the wall of the radiation conduit is defined by at least one of: a smooth surface; ridged surfaces; a stepped surface; undulating surfaces; and/or vane surfaces.

12. The radiation source of claim 9 , wherein the channel is angled relative to the inner surface of the wall such that the protective gas flow is redirected away from a ridge, undulation, or vane of the radiation conduit.

13. A radiation conduit for the radiation source of claim 1 , the radiation conduit comprising:

at least one outlet on an inner surface of a wall of the radiation conduit for directing a protective gas flow; and

at least one guide portion extending from the inner surface of the wall of the radiation conduit and configured to redirect the protective gas flow.

14. A method of reducing debris and/or vapor deposition in the radiation conduit of claim 13 , the method comprising providing a protective gas flow to the at least one outlet of the radiation conduit, such that the protective gas flow is redirected by the at least one guide portion.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 12, 2024
From: NEERITTER, REMCO JOHANNES ELISA; VAN DER STRAATEN, GERRIT; VANDERHALLEN, IVO; WESTERLAKEN, JAN STEVEN CHRISTIAAN
To: ASML NETHERLANDS B.V.
Reel/Frame 069566/0160 →
Priority Claims (1)
EP 19200480 · Sep 30, 2019 · regional
Continuity (1)
Related Publication 20220390852A1 · Dec 8, 2022
References Cited (22)
US 9795023B2 · Ershov et al. · 2017 [cited by applicant]
US 10034362B2 · Kuritsyn et al. · 2018 [cited by applicant]
US 20050269525A1 · Terken et al. · 2005 [cited by applicant]
US 20090073396A1 · Gabriel Van De Vijver et al. · 2009 [cited by applicant]
US 20130001442A1 · Schepers et al. · 2013 [cited by applicant]
US 20150008335A1 · Bykanov et al. · 2015 [cited by applicant]
US 20190128317A1 · Giannakopoulos · 2019 [cited by applicant]
US 20190146350A1 · Wahlisch · 2019 [cited by applicant]
US 20200185212A1 · Ueda et al. · 2020 [cited by applicant]
US 20240085796A1 · Labetski et al. · 2024 [cited by applicant]
CN 110169206A · 2019 [cited by applicant]
DE 102014222674B3 · 2016 [cited by applicant]
EP 2533078A1 · 2012 [cited by applicant]
JP 2010539700A · 2010 [cited by applicant]
JP 2018500601A · 2018 [cited by applicant]
TW 201907753A · 2019 [cited by applicant]
WO WO2014001071A2 · 2014 [cited by applicant]
WO WO2016071175A1 · 2016 [cited by applicant]
WO WO2018127565A2 · 2018 [cited by applicant]
International Search Report and Written Opinion of the International Searching Authority directed to related International Patent Application No. PCT/EP2020/075034, mailed Dec. 15, 2020, 9 pages. [cited by applicant]
International Preliminary Report on Patentability directed to related International Patent Application No. PCT/EP2020/075034, issued Apr. 5, 2022, 7 pages. [cited by applicant]
Taiwanese Office Action directed to Taiwanese Patent Application No. 109133214, mailed Jun. 5, 2024; 14 pages. [cited by applicant]