Laminate and insulated glazing
A laminate includes a transparent substrate having a first surface, and a laminated film provided on the first surface of the transparent substrate, wherein the laminated film includes, in a descending order of closeness to the first surface, a first dielectric layer including silicon nitride or zinc oxide or including silicon nitride and zinc oxide, a first layer including titanium oxide and provided on or above the first dielectric layer, a first barrier layer including nickel and chromium and provided on or above the first layer, and a silver-containing metal layer provided directly on the first barrier layer.
1. A laminate consisting of:
a transparent substrate having a first surface; and
a laminated film provided on the first surface of the transparent substrate,
wherein the laminated film consists of, in a descending order of closeness to the first surface:
a first dielectric layer comprising silicon nitride;
a first layer comprising titanium oxide and provided on or above the first dielectric layer;
an optional second layer comprising titanium oxide or titanium and provided on or above the first layer;
a first barrier layer comprising nickel and chromium and provided on or above the first layer;
a metal layer comprising silver and provided directly on the first barrier layer;
a second barrier layer comprising nickel and chromium and provided on or above the first barrier layer; and
a second dielectric layer comprising silicon nitride.
2. The laminate according to claim 1 , wherein the first layer consists of titanium oxide.
3. The laminate according to claim 1 , wherein a ratio of a thickness of the first layer to a thickness of the first barrier layer is in a range of 0.1 to 2.5.
4. The laminate according to claim 1 , wherein the first layer directly contacts the first barrier layer.
5. The laminate according to claim 1 , wherein the second layer is provided between and in contact with the first layer and the first barrier layer.
6. The laminate according to claim 5 , wherein a ratio of a thickness of the second layer to a thickness of the first barrier layer is in a range of 0.02 to 10.
7. The laminate according to claim 1 , wherein
the laminated film consists of:
the first dielectric layer consisting of SiAlN and having a thickness from 10 nm to 60 nm;
the first layer consisting of TiO 2 and having a thickness from 1 nm to 20 nm;
the second layer consisting of TiO 2 or titanium and having a thickness from 0.1 nm to 10 nm;
the first barrier layer consisting of NiCr and having a thickness from 1 nm to 8 nm;
the metal layer consisting of silver and having a thickness from 7 nm to 25 nm;
the second barrier layer consisting of NiCr and having a thickness from 0.1 nm to 10 nm; and
the second dielectric layer consisting of Si x Al y N z O w , in which 0≤y/(x+y)≤0.5, 0≤w<z, 0.8<z/(x+y)<1.5, and 0≤w/(x+y)≤0.2, and having a thickness from 20 nm to 60 nm.
8. The laminate according to claim 1 , wherein
the laminated film consists of:
the first dielectric layer consisting of SiAlN and having a thickness from 10 nm to 60 nm;
the first layer consisting of TiO 2 and having a thickness from 1 nm to 20 nm;
the first barrier layer consisting of NiCr and having a thickness from 1 nm to 8 nm;
the metal layer consisting of silver and having a thickness from 7 nm to 25 nm;
the second barrier layer consisting of NiCr and having a thickness from 0.1 nm to 10 nm; and
the second dielectric layer consisting of Si x Al y N z O w , in which 0≤y/(x+y)≤0.5, 0≤w<z, 0.8<z/(x+y)<1.5, and 0≤w/(x+y)≤0.2, and having a thickness from 20 nm to 60 nm.
9. An insulated glazing comprising a first glass substrate and a second glass substrate arranged in parallel to each other,
wherein the first glass substrate or the second glass substrate is constituted by the laminate of claim 1 , or the first glass substrate and the second glass substrate are constituted by the laminate of claim 1 .