Granted Patent B2

US 12,243,764 · App. 17/304,749 · Granted Mar 4, 2025

Inventors: Hiroshi Takebayashi (Handa, JP); Yuma Iwata (Ichinomiya, JP)

Assignee: NGK INSULATORS, LTD.

H01L21/6833

Abstract

Claims (35)

1. An electrostatic chuck comprising:

a ceramic plate having a wafer placement surface;

a plurality of through holes which penetrate the plate in a thickness direction; and

a pair of positive and negative electrodes provided in the plate to generate an electrostatic force,

wherein the plate has division areas virtually divided, which are equal in number to a number of the through holes,

the pair of positive and negative electrodes have pairs of positive and negative helical electrode portions, and for each of the division areas, one of the pairs of positive and negative helical electrode portions is provided in parallel to each other so as to cover an entirety of the division area from each of a positive electrode start point and a negative electrode start point, and wherein the positive electrode start point and the negative electrode start point for each division area are proximate to the through hole for the division area and with the through hole for each division area located between the positive electrode start point and the negative electrode start point in a circumferential direction of the plate,

the positive electrode of the pair of positive and negative electrodes is such that the positive helical electrode portions of the division areas are connected via either one of a triangular shaped connection portion provided at a central portion and an annular shaped connection portion provided at outer circumferential portions of the plate, and

the negative electrode of the pair of positive and negative electrodes is such that the negative helical electrode portions of the division areas are connected via the other of the triangular shaped connection portion provided at the central portion and the annular shaped connection portion provided at the outer circumferential portions of the plate.

2. The electrostatic chuck according to claim 1 ,

wherein a diameter of the plurality of through holes is greater than an interelectrode distance between the positive electrode and the negative electrode adjacent to each other.

3. The electrostatic chuck according to claim 2 , wherein a linewidth of the positive electrode is equal to a linewidth of the negative electrode.

4. The electrostatic chuck according to claim 3 ,

wherein the plate is circular,

the plurality of through holes are provided equally spaced on a circle concentric with the plate, and

the division areas are such that the plate is equally divided by line segments in a radial direction of the plate into the division areas which are equal in number to a number of the plurality of through holes.

5. The electrostatic chuck according to claim 2 ,

wherein the plate is circular,

the plurality of through holes are provided equally spaced on a circle concentric with the plate, and

the division areas are such that the plate is equally divided by line segments in a radial direction of the plate into the division areas which are equal in number to a number of the plurality of through holes.

6. The electrostatic chuck according to claim 1 ,

wherein the plate is circular,

the plurality of through holes are provided equally spaced on a circle concentric with the plate, and

the division areas are such that the plate is equally divided by line segments in a radial direction of the plate into the division areas which are equal in number to a number of the plurality of through holes.

7. The electrostatic chuck according to claim 1 , wherein a diameter of the plurality of through holes is less than an interelectrode distance between the positive electrode and the negative electrode adjacent to each other.

8. The electrostatic chuck according to claim 1 , wherein the plate is circular, and wherein the plurality of through holes are provided at positions deviated from a circle concentric with the plate.

9. The electrostatic chuck according to claim 1 , wherein the helical shape of the helical electrode portions is substantially similar to a sector of the division area.

10. An electrostatic chuck comprising:

a ceramic plate having a wafer placement surface;

a plurality of through holes which penetrate the plate in a thickness direction; and

a pair of positive and negative electrodes provided in the plate to generate an electrostatic force,

wherein the plate has division areas virtually divided, which are equal in number to a number of the through holes,

the pair of positive and negative electrodes have pairs of positive and negative helical electrode portions, and for each of the division areas, one of the pairs of positive and negative helical electrode portions is provided in parallel to each other so as to cover an entirety of the division area from each of a positive electrode start point and a negative electrode start point, and wherein the positive electrode start point and the negative electrode start point for each division area are proximate to the through hole for the division area and with the through hole for each division area located between the positive electrode start point and the negative electrode start point in a circumferential direction of the plate,

the positive electrode of the pair of positive and negative electrodes is such that the positive helical electrode portions of the division areas are connected via either one of a central portion and outer circumferential portions of the plate, and

the negative electrode of the pair of positive and negative electrodes is such that the negative helical electrode portions of the division areas are connected via the other of the central portion and the outer circumferential portions of the plate, and

wherein the helical shape of the helical electrode portions is substantially similar to a sector of the division area.

Assignments (1)

Priority Claims (1)

Continuity (2)

References Cited (19)