IP Library › Granted Patent US 12,247,296
Granted Patent B2
US 12,247,296 · App. 17/259,609 · Granted Mar 11, 2025

Member for plasma processing device

Inventors: Toshihiko Hanamachi (Kanagawa, JP); Shuhei Morota (Kanagawa, JP); Go Takahara (Kanagawa, JP); Masaru Takimoto (Kanagawa, JP); Hibiki Yokoyama (Kanagawa, JP); Hiroshi Mitsuda (Kanagawa, JP); Yoshihito Araki (Kanagawa, JP); Kengo Ajisawa (Nagano, JP)
Assignees: NHK Spring Co., Ltd.; IZUMI TECHNO INC.
C23C28/04
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Quick Facts
Patent No.
US 12,247,296
App. No.
17/259,609
Granted
Mar 11, 2025
Kind
B2
Abstract

A member for a plasma processing device includes: an aluminum base material; and an oxide film formed on the aluminum base material and having a porous structure, the oxide film including a first oxide film formed on a surface of the aluminum base material, a second oxide film formed on the first oxide film, and a third oxide film formed on the second oxide film, wherein the first oxide film is harder than the second oxide film and the third oxide film, and a hole formed in each of the first oxide film, the second oxide film and the third oxide film is sealed.

Claims (18)

1. A member for a plasma processing device comprising:

an aluminum base material; and

an oxide film formed on the aluminum base material and having a porous structure, the oxide film including

a first anodic oxide coating formed on a surface of the aluminum base material,

a second anodic oxide coating formed on the first anodic oxide coating, and

a third anodic oxide coating formed on the second anodic oxide coating,

wherein the first anodic oxide coating is harder than the second anodic oxide coating and the third anodic oxide coating,

a hole formed in each of the first anodic oxide coating, the second anodic oxide coating and the third anodic oxide coating are sealed, and

the first anodic oxide coating includes: a barrier layer on a part that contacts the aluminum base material; and a film layer on a part that contacts the second anodic oxide coating.

2. The member according to claim 1 , further comprising a ceramic sprayed film formed on the oxide film.

3. The member according to claim 1 , wherein the second anodic oxide coating becomes harder from the third anodic oxide coating toward the first anodic oxide coating.

4. The member according to claim 1 , wherein the oxide film has porosity of 1% to 2%.

5. The member according to claim 1 , wherein

the barrier layer has a thickness of 80 nm to 210 nm.

6. The member according to claim 1 , wherein

the oxide film is sealed by hydrated alumina, and

the hydrated alumina is hydrate of 1.4 to 2.0.

7. The member according to claim 1 , wherein the oxide film has a thickness of 70 μm to 130 μm.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 12, 2021
From: HANAMACHI, TOSHIHIKO; MOROTA, SHUHEI; TAKAHARA, GO; TAKIMOTO, MASARU; YOKOYAMA, HIBIKI; MITSUDA, HIROSHI; ARAKI, YOSHIHITO; AJISAWA, KENGO
To: NHK SPRING CO., LTD.; IZUMI TECHNO INC.
Reel/Frame 054886/0820 →
Priority Claims (1)
JP 2018-135083 · Jul 18, 2018 · national
Continuity (1)
Related Publication 20210292911A1 · Sep 23, 2021
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