Optical filter and method for manufacturing same
Provided is an optical filter capable of reducing the dependency on the angle of light incidence. An optical filter 1 includes a hydrogenated silicon-containing film 4 , wherein in a Raman spectrum of the hydrogenated silicon-containing film 4 measured by Raman spectroscopy a ratio (SiH/SiH 2 ) obtained from a ratio between an area of a peak derived from SiH and an area of a peak derived from SiH 2 is 0.7 or more.
1. An optical filter comprising a hydrogenated silicon-containing film, wherein in a Raman spectrum of the hydrogenated silicon-containing film measured by Raman spectroscopy a ratio (SiH/SiH 2 ) obtained from a ratio between an area of a peak derived from SiH and an area of a peak derived from SiH 2 is 0.7 or more.
2. The optical filter according to claim 1 , comprising:
a transparent substrate; and
a filter portion provided on one of both principal surfaces of the transparent substrate and made of a multi-layer including a high-refractive index film with a relatively high refractive index and a low-refractive index film with a relatively low refractive index,
wherein the high-refractive index film is the hydrogenated silicon-containing film.
3. The optical filter according to claim 2 , wherein the low-refractive index film is a silicon oxide-containing film.
4. The optical filter according to claim 2 , further comprising an antireflection film provided on the other principal surface of the transparent substrate and containing hydrogenated silicon.
5. A method for manufacturing the optical filter according to claim 1 , the method comprising the steps of:
depositing a silicon film by sputtering; and
hydrogenating the silicon film after the step of depositing the silicon film.
6. An optical filter comprising a hydrogenated silicon-containing film, wherein a ratio (H/Si) between a content of hydrogen atoms in the hydrogenated silicon-containing film measured by hydrogen forward scattering spectroscopy and a content of silicon atoms in the hydrogenated silicon-containing film measured by Rutherford backscattering spectroscopy is 0.4 or less.