Single crystal metal oxide plasma chamber component
A component of a plasma processing chamber having at least one plasma facing surface of the component comprises single crystal metal oxide material. The component can be machined from a single crystal metal oxide ingot. Suitable single crystal metal oxides include spinel, yttrium oxide, and yttrium aluminum garnet (YAG). A single crystal metal oxide can be machined to form a gas injector of a plasma processing chamber.
1. A component of a plasma processing chamber, wherein at least one plasma facing surface of the component comprises single crystal metal oxide material, wherein the single crystal metal oxide material is single crystal spinel.
2. The component of claim 1 , wherein the at the least one plasma facing surface of the component is machined from a single crystal metal oxide ingot.
3. The component of claim 1 , wherein the at least one plasma facing surface comprises a layer of the single crystal metal oxide material bonded to a body of the component.
4. The component of claim 1 , wherein the component is a gas injector, wherein the nose of the gas injector comprises the single crystal metal oxide material, wherein the nose is a portion of the gas injector that is exposed to plasma in the plasma processing chamber.
5. A component of a plasma processing chamber, wherein at least one plasma facing surface of the component comprises single crystal metal oxide material, wherein the component is a gas injector, wherein the nose of the gas injector comprises the single crystal metal oxide material, wherein the nose is a portion of the gas injector that is exposed to plasma in the plasma processing chamber, and wherein the nose is diffusion bonded to a body of the component, wherein the body is formed of a material that is different from the single crystal metal oxide material.
6. The component of claim 5 , wherein the body is formed of a polycrystalline material.
7. A gas injector of a plasma processing chamber, comprising:
a body; and
at least one plasma facing surface comprising a single crystal metal oxide material, wherein the single crystal metal oxide material is single crystal spinel.
8. The gas injector of claim 7 , wherein the gas injector is machined from a single crystal metal oxide ingot.
9. A gas injector of a plasma processing chamber, comprising:
a body; and
at least one plasma facing surface comprising a single crystal metal oxide material, wherein the gas injector is machined from a single crystal metal oxide ingot and wherein the single crystal metal oxide ingot is annealed before being machined.
10. The gas injector of claim 9 , wherein the single crystal metal oxide material is single crystal YAG.
11. The gas injector of claim 9 , further comprising a central passage machined through the body and a plurality of smaller passages machined through the body, wherein the plurality of smaller passages surround the central passage and wherein each of the plurality of smaller passages feeds into a side gas injector hole and each of the plurality of smaller passages has a portion that is oriented at an angle within the gas injector to feed into the side gas injector hole.