Low leakage thin film capacitors using titanium oxide dielectric with conducting noble metal oxide electrodes
Low leakage thin film capacitors for decoupling, power delivery, integrated circuits, related systems, and methods of fabrication are disclosed. Such thin film capacitors include a titanium dioxide dielectric and one or more noble metal oxide electrodes. Such thin film capacitors are suitable for high voltage applications and provide low current density leakage.
1. A thin film capacitor structure, comprising
a first electrode comprising a first compound of iridium and oxygen, wherein the first electrode is not less than 30% oxygen;
a second electrode comprising a second compound of iridium and oxygen;
a dielectric layer comprising a third compound of titanium and oxygen between the first and second electrodes, wherein the first compound of the first electrode is directly on the third compound of the dielectric layer, and wherein the second compound of the second electrode is directly on the third compound of the dielectric layer;
a first layer comprising titanium on the first electrode;
a copper layer; and
a second layer comprising iridium and substantially absent oxygen between the second electrode and the copper layer.
2. The thin film capacitor structure of claim 1 , wherein the first layer is on a second copper layer.
3. The thin film capacitor structure of claim 1 , wherein the dielectric layer has a thickness in a range of 20 to 100 nm.
4. The thin film capacitor structure of claim 1 , wherein the first compound of the dielectric layer comprises one of nanocrystalline or amorphous titanium oxide.
5. The thin film capacitor structure of claim 1 , further comprising:
a power supply;
an integrated circuit die over a package substrate and coupled to the power supply; and
a thin film capacitor in the package substrate, the thin film capacitor comprising the first electrode, the second electrode, the dielectric layer, the first layer, the copper layer, and the second layer.
6. A thin film capacitor structure, comprising:
a first electrode comprising iridium oxide, wherein the first electrode is not less than 30% oxygen;
a second electrode comprising iridium oxide; and
a dielectric layer comprising titanium oxide between the first and second electrodes, wherein the iridium oxide of the first electrode is directly on the titanium oxide of the dielectric layer, and wherein the iridium oxide of the second electrode is directly on the titanium oxide of the dielectric layer;
a first layer comprising titanium on the first electrode;
a copper layer; and
a second layer comprising iridium and substantially absent oxygen between the second electrode and the copper layer.
7. The thin film capacitor structure of claim 6 , wherein the first layer is on a second copper layer.
8. The thin film capacitor structure of claim 6 , wherein the dielectric layer has a thickness in a range of 20 to 100 nm.
9. The thin film capacitor structure of claim 6 , wherein the titanium oxide of the dielectric layer comprises one of nanocrystalline or amorphous titanium oxide.
10. The thin film capacitor structure of claim 6 , further comprising:
a power supply;
an integrated circuit die over a package substrate and coupled to the power supply; and
a thin film capacitor in the package substrate, the thin film capacitor comprising the first electrode, the second electrode, the dielectric layer, the first layer, the copper layer, and the second layer.
11. A thin film capacitor structure, comprising
a first electrode comprising a first compound of a noble metal and oxygen;
a second electrode comprising a second compound comprising the noble metal or a second noble metal;
a dielectric layer comprising a third compound of titanium and oxygen, wherein the first compound of the first electrode is directly on the third compound of the dielectric layer, and wherein the second compound of the second electrode is directly on the third compound of the dielectric layer;
a first layer comprising titanium on the second electrode;
a copper layer; and
a second layer comprising the noble metal and substantially absent oxygen between the first electrode and the copper layer.
12. The thin film capacitor structure of claim 11 , wherein the noble metal comprises iridium.
13. The thin film capacitor structure of claim 12 , wherein the second electrode comprises a second compound of iridium and oxygen.
14. The thin film capacitor structure of claim 11 , wherein the first layer is on a second copper layer.
15. The thin film capacitor structure of claim 11 , further comprising:
a power supply;
an integrated circuit die over a package substrate and coupled to the power supply; and
a thin film capacitor in the package substrate, the thin film capacitor comprising the first electrode, the second electrode, the dielectric layer, the first layer, the copper layer, and the second layer.
16. A thin film capacitor structure, comprising
a first electrode comprising a noble metal oxide;
a second electrode comprising the noble metal of the noble metal oxide or a second noble metal;
a dielectric layer comprising titanium oxide, wherein the noble metal oxide of the first electrode is directly on the titanium oxide of the dielectric layer, and wherein the second electrode is directly on the titanium oxide of the dielectric layer;
a first layer comprising titanium on the second electrode;
a copper layer; and
a second layer comprising the noble metal of the noble metal oxide and substantially absent oxygen between the first electrode and the copper layer.
17. The thin film capacitor structure of claim 16 , wherein the noble metal of the noble metal oxide comprises iridium.
18. The thin film capacitor structure of claim 17 , wherein the second electrode comprises iridium oxide.
19. The thin film capacitor structure of claim 16 , wherein the first layer is on a second copper layer.
20. The thin film capacitor structure of claim 16 , further comprising:
a power supply;
an integrated circuit die over a package substrate and coupled to the power supply; and
a thin film capacitor in the package substrate, the thin film capacitor comprising the first electrode, the second electrode, the dielectric layer, the first layer, the copper layer, and the second layer.