Apparatus and method for treating substrate
A substrate treatment apparatus including a chamber; a lower electrode in the chamber, wherein the substrate is on the lower electrode; an upper electrode in the chamber, and above the lower electrode; a pulse signal generator configured to generate a pulse signal; and a bias power supply configured to generate bias power having a pulsed non-sinusoidal waveform using the pulse signal, and supply the generated bias power to the lower electrode, wherein the bias power supply includes a DC power generator configured to receive the pulse signal and generate a direct-current (DC) voltage subjected to feedforward compensation based on the pulse signal; and a modulator configured to generate a power signal having a non-sinusoidal waveform using the DC voltage, and filter the power signal using the pulse signal to generate the bias power having the pulsed non-sinusoidal waveform.
1. An apparatus for treating a substrate, the apparatus comprising:
a chamber;
a lower electrode in the chamber, wherein the substrate is configured to be on the lower electrode;
an upper electrode above the lower electrode;
a pulse signal generator configured to generate a pulse signal; and
a bias power supply configured to
generate bias power having a pulsed non-sinusoidal waveform using the pulse signal, and
supply the generated bias power to the lower electrode,
wherein the bias power supply includes
a DC power generator configured to
receive the pulse signal and
generate a direct-current (DC) voltage subjected to feedforward compensation based on the pulse signal; and
a modulator configured to
generate a power signal having a non-sinusoidal waveform using the DC voltage, and
filter the power signal using the pulse signal to generate the bias power having the pulsed non-sinusoidal waveform.
2. The apparatus of claim 1 , wherein
the DC power generator is configured to store a feedforward compensation amount, corresponding to each of a plurality of command voltages, in a lookup table, and
the generating a DC voltage subjected to feedforward compensation is performed based on the feedforward compensation amount in the lookup table.
3. The apparatus of claim 2 , wherein
the feedforward compensation amount is a digital value, and
a digital to analog converter is configured to convert the feedforward compensation amount to a feedforward signal as an analog signal.
4. The apparatus of claim 3 , wherein the DC power generator includes:
a power switch configured to be turned on and off based on the pulse signal; and
an operational (OP) amplifier configured to multiply a node voltage controlled by the power switch by the feedforward signal to generate a feedforward compensation signal.
5. The apparatus of claim 3 , wherein
the DC voltage is configured to be subjected to the feedforward compensation and feedback compensation, and
a feedback compensation amount is determined based on a difference between a feedback signal as the DC voltage as fed back and a command voltage.
6. The apparatus of claim 5 , wherein the DC power generator includes:
a power switch configured to be turned on and off based on the pulse signal,
a first operational (OP) amplifier configured to multiply a node voltage controlled by the power switch by the feedforward signal to generate a feedforward compensation signal; and
a second OP amplifier configured to generate a feedback compensation signal based on the difference between the feedback signal and the command voltage.
7. The apparatus of claim 6 , wherein the DC power generator further includes a third OP amplifier configured to generate a control signal, based on the feedforward compensation signal and the feedback compensation signal.
8. The apparatus of claim 1 , wherein the apparatus further comprises a source power supply configured to
generate a source power having a pulsed high-frequency waveform using the pulse signal, and
supply the source power to the upper electrode or the lower electrode.
9. The apparatus of claim 8 , wherein the source power supply includes:
a high-frequency signal generator configured to
generate a high-frequency signal, and
filter the high-frequency signal using the pulse signal to generate the source power having the pulsed high-frequency waveform; and
a matcher configured to match an impedance of the source power.
10. The apparatus of claim 9 , wherein the matcher is configured to receive the pulse signal, and a position of a capacitance in the matcher is controlled based on the pulse signal.
11. The apparatus of claim 8 , wherein the bias power is configured to be shifted relative to the source power.
12. An apparatus for treating a substrate, the apparatus comprising:
a DC voltage supply unit configured to generate a DC voltage, based on a feedforward compensation signal and a feedback compensation signal;
a feedforward operator configured to
receive a pulse signal and a feedforward signal, and
generate the feedforward compensation signal based on the pulse signal and the feedforward signal;
a feedback operator configured to receive a feedback signal as the DC voltage as fed back thereto and a command voltage, and to generate the feedback compensation signal based on a difference between the feedback signal and the command voltage; and
a modulator configured to
generate a power signal having a non-sinusoidal waveform using the DC voltage, and
filter the power signal using the pulse signal to generate a bias power having a pulsed non-sinusoidal waveform.
13. The apparatus of claim 12 , wherein
the apparatus is configured to store a feedforward compensation amount, corresponding to each of a plurality of command voltages, in a lookup table,
the feedforward compensation amount is a digital value, and
a digital to analog converter is configured to convert the feedforward compensation amount to the feedforward signal as an analog signal.
14. The apparatus of claim 13 , wherein the feedforward operator and the feedback operator are analog circuits.
15. The apparatus of claim 12 , wherein the feedforward operator includes:
a power switch configured to be turned on and off based on the pulse signal;
a first OP amplifier configured to multiply a node voltage controlled by the power switch by the feedforward signal to generate the feedforward compensation signal; and
a second OP amplifier configured to generate the feedback compensation signal based on a difference between the feedback signal and the command voltage.
16. The apparatus of claim 15 , wherein the DC voltage supply unit includes:
a third OP amplifier configured to generate a first control signal based on the feedforward compensation signal and the feedback compensation signal;
a DC power control integrated circuit (IC) configured to generate a second control signal whose a duty ratio is controlled based on the first control signal; and
a DC power main circuit configured to generate the DC voltage based on the second control signal.
17. An apparatus for treating a substrate, the apparatus comprising:
a chamber;
a lower electrode in the chamber, wherein the substrate is seated on the lower electrode;
an upper electrode above the lower electrode;
a pulse signal generator configured to generate a pulse signal;
a bias power supply configured to
generate bias power having a pulsed non-sinusoidal waveform using the pulse signal, and
supply the generated bias power to the lower electrode; and
a source power supply configured to generate source power having a pulsed high-frequency waveform using the pulse signal and supply the source power to the upper electrode,
wherein the bias power supply includes
a power switch configured to be turned on and off based on a pulse signal;
a first operational (OP) amplifier configured to multiply a node voltage controlled by the power switch by a feedforward signal to generate a feedforward compensation signal;
a second OP amplifier configured to generate a feedback compensation signal based on a difference between a feedback signal as a DC voltage fed back thereto and a command voltage;
a third OP amplifier configured to generate a first control signal based on the feedforward compensation signal and the feedback compensation signal;
a DC power control integrated circuit (IC) configured to generate a second control signal whose a duty ratio is controlled based on the first control signal; and
a DC power main circuit configured to generate the DC voltage based on the second control signal.