Integrated transistors having gate material passing through a pillar of semiconductor material, and methods of forming integrated transistors
Some embodiments include an integrated assembly having a pillar of semiconductor material. The pillar has a base region, and bifurcates into two segments which extend upwardly from the base region. The two segments are horizontally spaced from one another by an intervening region. A conductive gate is within the intervening region. A first source/drain region is within the base region, a second source/drain region is within the segments, and a channel region is within the segments. The channel region is adjacent to the conductive gate and is vertically disposed between the first and second source/drain regions. Some embodiments include methods of forming integrated assemblies.
1. An integrated assembly, comprising:
an arrangement comprising semiconductor pillars extending upwardly from digit lines; the digits lines extending along a first direction;
slits extending partially into the pillars; each of the pillars having an associated one of the slits patterned therein and being configured to have a base region, and to have a pair of segments extending upwardly from the base region, with the segments of said pair being spaced from one another by an intervening gap corresponding to said associated one of the slits;
first insulative material along sidewalls of the slits;
conductive wordlines within the slits, adjacent the first insulative material, and extending along a second direction which crosses the first direction;
first source/drain regions within the base regions of the pillars;
second source/drain regions within the segments of the pillars, and vertically spaced from the first source/drain regions by channel regions;
second insulative material within the slits and over the wordlines; and
conductive interconnects within the slits and over the second insulative material.
2. The integrated assembly of claim 1 wherein the first and second insulative materials are a same composition as one another.
3. The integrated assembly of claim 1 wherein the first and second insulative materials are not a same composition as one another.
4. The integrated assembly of claim 1 wherein the first insulative material is along bottoms of the slits.
5. The integrated assembly of claim 1 further comprising spacers of third insulative material along bottoms of the slits.
6. The integrated assembly of claim 5 wherein the third insulative material is a different composition from the first insulative material.
7. The integrated assembly of claim 5 wherein the third insulative material is a same composition as the first insulative material.
8. The integrated assembly of claim 1 further comprising storage-elements electrically coupled with the conductive interconnects.
9. The integrated assembly of claim 1 wherein each of the slits has a first dimension along a cross-section, and wherein each of the conductive interconnects has a second dimension along the cross-section, with the second dimension being the same as the first dimension.
10. An integrated assembly, comprising:
a pillar of semiconductor material over a digit line, the pillar having a base region of the semiconductor material extending through insulative material, and bifurcating into two segments of the semiconductor material extending upwardly from the base region; the two segments being a first segment and a second segment, and being horizontally spaced from one another by an intervening region, the first and second segments each comprising an interior sidewall along the intervening region and an opposing outer sidewall, the insulative material extending continuously along the base region and the outer sidewall of each of the first and second segments; and
a conductive gate within the intervening region.
11. The integrated assembly of claim 10 further comprising a source/drain region within the base region, and a digit line electrically coupled with the source/drain region.
12. The integrated assembly of claim 11 wherein the source/drain region is a first source/drain region and further comprising:
a second source/drain region within the first and second segments;
a channel region within the first and second segments; and
a storage element electrically coupled with the second source/drain region.
13. The integrated assembly of claim 12 further comprising a conductive interconnect disposed between the first and second segments, the storage element being electrically coupled to the second source/drain region through the conductive interconnect.
14. The integrated assembly of claim 13 further comprising a wordline passing between the first and second segments, the conductive interconnect being disposed above the wordline.
15. The integrated assembly of claim 14 wherein the conductive interconnect is spaced from the wordline by insulative material.