Apparatus for treating substrate and method of coupling support unit
The present invention provides an apparatus for treating a substrate, including: a process chamber including a first body and a second body which are combined with each other to form a treatment space for treating a substrate is treated therein; a driver which moves the process chamber to an open position or a close position; a support unit which supports a substrate within the treatment space; and a fluid supply unit which supplies a fluid to the treatment space, in which the support unit includes: a support pin coupled to the first body or the second body; and a guide member which is coupled to the support pin and extends in a lateral direction of the support pin to support the substrate.
1. An apparatus for treating a substrate, the apparatus comprising:
a process chamber including a first body and a second body which are combined with each other to form a treatment space therein for treating a substrate;
a driver configured to move the process chamber to an open position or a close position;
a support unit configured to support a substrate within the treatment space; and
a fluid supply unit configured to supply a fluid to the treatment space,
wherein the support unit includes:
a support pin coupled to the first body or the second body, the support pin including a body portion and a recess portion; and
a guide member coupled to the support pin and extending in a lateral direction of the support pin to support the substrate,
wherein the guide member is fixed to the body portion of the support pin by a ring member which is coupled to the recess portion of the support pin and prevents the guide member from being separated.
2. The apparatus of claim 1 , wherein the support pin is coupled to the first body or the second body by welding.
3. The apparatus of claim 1 , wherein the guide member is fitted to the support pin.
4. The apparatus of claim 1 , wherein the guide member includes a contact portion which is in contact with a bottom surface of the substrate placed on the support unit and is shaped like a protrusion, and the contact portion is made of a material that is possible to be polished.
5. The apparatus of claim 4 , wherein the contact portion is provided in plurality, and each of the contact portions is polished so that the substrate placed on the support unit becomes horizontal.
6. The apparatus of claim 4 , wherein the contact portion is made of any one of a resin based on polyimide (PI), polyetheretherketone (PEEK), and polytetrafluoroethylene (PTFE), and ceramic.
7. The apparatus of claim 1 , wherein the support pin is coupled to the first body, and the first body is provided on an upper portion of the second body.
8. The apparatus of claim 1 , wherein treating the substrate includes drying the substrate by using a supercritical fluid inside the treatment space.
9. An apparatus for treating a substrate, the apparatus comprising:
a support unit which is provided in a process chamber and supports a substrate;
a support pin coupled to the process chamber, the support pin including a body portion and a recess portion; and
a guide member coupled to the support pin and extending in a lateral direction of the support pin to support the substrate,
wherein the guide member is fixed to the body portion of the support pin by a ring member which is coupled to the recess portion of the support pin and prevents the guide member from being separated.
10. The apparatus of claim 9 , wherein the support pin is coupled to the process chamber by welding.
11. The apparatus of claim 9 , wherein the guide member is fitted to the support pin.
12. The apparatus of claim 9 , wherein the guide member includes a contact portion which is in contact with a bottom surface of the substrate placed on the support unit and is shaped like a protrusion, and
the contact portion is made of a material that is possible to be polished.
13. The apparatus of claim 12 , wherein the contact portion is provided in plurality, and each of the contact portions is polished so that the substrate placed on the support unit becomes horizontal.
14. The apparatus of claim 12 , wherein the contact portion is made of any one of a resin based on polyimide (PI), polyetheretherketone (PEEK), and polytetrafluoroethylene (PTFE), and ceramic.