Semiconductor device with decoupling unit
The present application discloses a semiconductor device with a decoupling unit. The semiconductor device includes a first tier structure including conductive features of positioned over a substrate, and a decoupling unit the first tier structure positioned between the conductive features; a first-tier-alignment mark positioned on the decoupling unit, and including a fluorescence material; a second tier structure positioned on the first tier structure and including conductive features positioned over and deviated from the conductive features of the first tier structure, and a decoupling unit of positioned over the first tier structure, and positioned between the conductive features of the second tier structure; and a second-tier-alignment mark positioned on the decoupling unit of the second tier structure, and including a fluorescence material. The decoupling units include a low-k dielectric material and respectively include a bottle-shaped cross-sectional profile.
1. A semiconductor device, comprising:
a first tier structure comprising a plurality of conductive features of the first tier structure positioned over a substrate, and a decoupling unit of the first tier structure positioned between the plurality of conductive features of the first tier structure;
a first set of solid alignment marks comprising a first-tier-alignment mark positioned on the decoupling unit of the first tier structure, and comprising a fluorescence material;
a second tier structure positioned on the first tier structure and comprising a plurality of conductive features of the second tier structure positioned over and deviated from the plurality of conductive features of the first tier structure, and a decoupling unit of the second tier structure positioned over the first tier structure, and positioned between the plurality of conductive features of the second tier structure; and
a first set of spaced alignment marks comprising a second-tier-alignment mark positioned on the decoupling unit of the second tier structure, and comprising a fluorescence material;
wherein the decoupling units of the first tier structure and the second tier structure comprise a low-k dielectric material and respectively comprise a bottle-shaped cross-sectional profile;
wherein the fluorescence material comprises azobenzene;
wherein the first tier structure comprises a first dielectric layer positioned on the substrate;
a second dielectric layer positioned on the first dielectric layer; a middle dielectric layer positioned on the second dielectric layer; a third dielectric layer positioned on the middle dielectric layer; and
a fourth dielectric layer positioned on the third dielectric layer; wherein the decoupling unit of the first tier structure is positioned in the middle dielectric layer and on the second dielectric layer;
wherein the first-tier-alignment mark of the first set of solid alignment marks is positioned along the fourth dielectric layer and the third dielectric layer, extending to the middle dielectric layer, and on the decoupling unit of the first tier structure;
wherein the first dielectric layer and the third dielectric layer comprise the same material;
wherein the second dielectric layer and the fourth dielectric layer comprise the same material;
wherein a sidewall of the first-tier-alignment mark of the first set of solid alignment marks is tapered;
wherein a width of a top surface of the first-tier-alignment mark of the first set of solid alignment marks is greater than a width of the first-tier-alignment mark of the first set of solid alignment marks at an interface between the middle dielectric layer and the third dielectric layer.
2. The semiconductor device of claim 1 , wherein a width between two valleys of a sidewall of the decoupling unit of the first tier structure is greater than a width of a top surface of the first-tier-alignment mark of the first set of solid alignment marks.
3. The semiconductor device of claim 1 , wherein the plurality of conductive features of the first tier structure respectively comprises:
a bottom barrier layer positioned on the second dielectric layer;
a middle conductive layer positioned on the bottom barrier layer;
a top barrier layer positioned on the middle conductive layer; and
a spacer barrier positioned on sidewalls of the bottom barrier layer, the middle conductive layer, and the top barrier layer.
4. The semiconductor device of claim 3 , wherein the bottom barrier layer and the top barrier layer comprises the same material.
5. The semiconductor device of claim 4 , wherein a thickness of the bottom barrier layer and a thickness of the top barrier layer are substantially the same.
6. The semiconductor device of claim 4 , wherein a thickness of the bottom barrier layer and a thickness of the top barrier layer are different.
7. A semiconductor device, comprising:
a first tier structure comprising a plurality of conductive features of the first tier structure positioned over a substrate, and a decoupling unit of the first tier structure positioned between the plurality of conductive features of the first tier structure;
a first set of solid alignment marks comprising a first-tier-alignment mark positioned on the decoupling unit of the first tier structure, and comprising a fluorescence material;
a second tier structure positioned on the first tier structure and comprising a plurality of conductive features of the second tier structure positioned over and deviated from the plurality of conductive features of the first tier structure, and a decoupling unit of the second tier structure positioned over the first tier structure, and positioned between the plurality of conductive features of the second tier structure; and
a first set of spaced alignment marks comprising a second-tier-alignment mark positioned on the decoupling unit of the second tier structure, and comprising a fluorescence material;
wherein the decoupling units of the first tier structure and the second tier structure comprise a low-k dielectric material and respectively comprise a bottle-shaped cross-sectional profile;
wherein the fluorescence material comprises azobenzene;
wherein the first tier structure comprises a first dielectric layer positioned on the substrate;
a second dielectric layer positioned on the first dielectric layer; a middle dielectric layer positioned on the second dielectric layer; a third dielectric layer positioned on the middle dielectric layer; and
a fourth dielectric layer positioned on the third dielectric layer; wherein the decoupling unit of the first tier structure is positioned in the middle dielectric layer and on the second dielectric layer;
wherein the first-tier-alignment mark of the first set of solid alignment marks is positioned along the fourth dielectric layer and the third dielectric layer, extending to the middle dielectric layer, and on the decoupling unit of the first tier structure;
wherein the first dielectric layer and the third dielectric layer comprise the same material;
wherein the second dielectric layer and the fourth dielectric layer comprise the same material;
wherein a sidewall of the first-tier-alignment mark of the first set of solid alignment marks is tapered;
wherein a width of a bottom surface of the first-tier-alignment mark of the first set of solid alignment marks is less than a width of the first-tier-alignment mark of the first set of solid alignment marks at an interface between the middle dielectric layer and the third dielectric layer.