Single-photon detection pixel and single-photon detection pixel array including the same
A single-photon detection pixel includes a substrate, a first well provided in the substrate, a pair of heavily doped regions provided on the first well, and a contact provided between the pair of heavily doped regions, wherein the substrate and the pair of heavily doped regions have a first conductivity type, and the first well and the contact have a second conductivity type that is different from the first conductivity type.
1. A single-photon detection pixel comprising:
a substrate;
a first well provided in the substrate and having a first conductivity type;
a plurality of heavily doped regions provided in an upper portion of the first well, having a second conductivity type different from the first conductivity type, and located separately;
a plurality of contacts having the first conductivity type, surrounding the plurality of heavily doped regions, respectively, and interconnected with each other; and,
an isolation region including an insulating material, extending along an edge of the first well to form a pixel area therein, and surrounding the plurality of heavily doped regions and the plurality of contacts, the isolation region being located only along the boundary of the pixel area.
2. The single-photon detection pixel of claim 1 , wherein a voltage is applied to the plurality of contacts and the plurality of heavily doped regions to form a plurality of depletion regions in each of regions adjacent to boundaries between the plurality of heavily doped regions and the first well.
3. The single-photon detection pixel of claim 1 , further comprising a plurality of buffer regions having the first conductivity type, extending along the plurality of contacts between the first well and the plurality of contacts.
4. The single-photon detection pixel of claim 1 , wherein the plurality of contacts is shaped in circular rings, octagonal rings or quadrangular rings.
5. The single-photon detection pixel of claim 1 , further comprising a plurality of guard rings having the second conductivity type, surrounding the plurality of heavily doped regions, respectively.
6. The single-photon detection pixel of claim 5 , further comprising a first additional isolation region including an insulating material, provided between the plurality of guard rings.
7. The single-photon detection pixel of claim 5 , further comprising a second additional isolation region including an insulating material, passing through a region where the plurality of guard rings face each other between the plurality of guard rings.
8. The single-photon detection pixel of claim 1 , further comprising a plurality of second wells having the second conductivity type, provided between the first well and the plurality of heavily doped regions, respectively.
9. A single-photon detection pixel comprising:
a substrate;
a first well provided in the substrate and having a first conductivity type;
a plurality of heavily doped regions provided in an upper portion of the first well, having a second conductivity type different from the first conductivity type, and located separately;
a contact having the first conductivity type and having a single ring shape surrounding the plurality of heavily doped regions; and
an isolation region including an insulating material, extending along the contact to form a pixel area therein, and surrounding the plurality of heavily doped regions and the contact, the isolation region being located only along the boundary of the pixel area.
10. The single-photon detection pixel of claim 9 , wherein the single ring shape is an octagonal ring shape or a quadrangular ring shape.
11. The single-photon detection pixel of claim 9 , wherein a voltage is applied to the contact and the plurality of heavily doped regions to form a plurality of depletion regions in regions adjacent to boundaries between the plurality of heavily doped regions and the first well.
12. The single-photon detection pixel of claim 9 , further comprising a plurality of guard rings having the second conductivity type, surrounding the plurality of heavily doped regions, respectively.
13. The single-photon detection pixel of claim 12 , further comprising a first additional isolation region including an insulating material, provided between the plurality of guard rings.
14. The single-photon detection pixel of claim 12 , further comprising a second additional isolation region including an insulating material, passing through a region between the plurality of guard rings where the plurality of guard rings face each other.
15. The single-photon detection pixel of claim 12 , wherein the plurality of guard rings are interconnected between the plurality of heavily doped regions.
16. The single-photon detection pixel of claim 15 , further comprising a first additional isolation region including an insulating material, provided between the plurality of heavily doped regions.
17. The single-photon detection pixel of claim 9 , further comprising a plurality of second wells having the second conductivity type, provided between the first well and the plurality of heavily doped regions, respectively.
18. The single-photon detection pixel of claim 17 , further comprising a first additional isolation region including an insulating material, provided between the plurality of second wells.
19. The single-photon detection pixel of claim 17 , further comprising a second additional isolation region including an insulating material, surrounding the plurality of second wells, respectively, and interconnected between the plurality of second wells.
20. A single-photon detection pixel array comprising:
a plurality of single-photon detection pixels; and
an isolation region provided between the plurality of single-photon detection pixels,
wherein each of the plurality of single-photon detection pixels includes a substrate, a first well provided in the substrate and having a first conductivity type, a plurality of heavily doped regions provided in an upper portion of the first well having a second conductivity type different from the first conductivity type, and located separately, and a plurality of contacts having the first conductivity type, surrounding the plurality of heavily doped regions, respectively, and interconnected with each other,
wherein the isolation region including an insulating material, extending along an edge of the first well to form a pixel area therein, and surrounding the plurality of heavily doped regions and the plurality of contacts, the isolation region being located only along the boundary of the pixel area.