Polarization selection metrology system, lithographic apparatus, and methods thereof
An inspection system, a lithographic apparatus, and a method are provided. The inspection system includes an illumination system, an optical system, a shutter system, an objective system and a detector. The illumination system is configured to generate an illumination beam. The optical system is configured to split the illumination beam into a first sub-beam and a second sub-beam. The shutter system is configured to independently control a transmittance of the first sub-beam and the second subbeam. The objective system is configured to receive the first sub-beam and the second beam from the optical system and direct the first sub-beam and the second sub-beam towards a substrate having a target structure. The detector is configured to receive an image or a diffracted image of the target structure.
1. A system comprising:
an illumination system configured to generate an illumination beam;
an optical system configured to split the illumination beam into a first sub-beam and a second sub-beam,
wherein the optical system comprises a prism system comprising a first frustrated total internal reflection (FTIR) switch surface, a second FTIR switch surface, and a polarizing beam splitter (PBS), and
wherein the first and the second FTIR switch surfaces are disposed in parallel on opposite sides on the PBS;
a shutter system configured to independently control a transmittance of the first sub-beam and the second sub-beam, wherein the first sub-beam and the second sub-beam are recombined after the first and second sub-beams have passed through the shutter system;
an objective system configured to receive the recombined first and second sub-beams from the optical system and to direct the recombined first and second sub-beams towards a substrate having a target structure; and
a detector configured to receive an image or a diffracted image of the target structure.
2. The system of claim 1 , wherein the shutter system comprises:
a first optical element and a second optical element configured to frustrate the first FTIR switch surface and/or the second FTIR switch surface, the first optical element being positioned near the first FTIR switch surface and the second optical element being positioned near the second FTIR switch surface.
3. The system of claim 2 , wherein the first optical element and the second optical element are controlled via piezo actuators to control a first distance between the first optical element and the first FTIR switch surface and a second distance between the second optical element and the second FTIR switch surface.
4. The system of claim 3 , further comprising:
a controller configured to control the piezo actuators to frustrate the first FTIR switch surface and/or the second FTIR switch surface.
5. The system of claim 1 , wherein the shutter system is further configured to rotate a polarization of either the first sub-beam and/or the second sub-beam.
6. The system of claim 1 , wherein the shutter system comprises an electro-optical element.
7. The system of claim 6 , wherein the electro-optical element comprises a liquid crystal waveplate.
8. The system of claim 1 , wherein the shutter system comprises an electro-mechanical shutter.
9. The system of claim 8 , wherein the electro-mechanical shutter comprises a bistable solenoid switch.
10. A lithography apparatus comprising:
an illumination apparatus configured to illuminate a pattern of a patterning device;
a projection system configured to project an image of the pattern onto a substrate; and
a metrology system comprising the system of claim 1 .