IP Library Granted Patent US 12,290,967
Granted Patent B2
US 12,290,967 · App. 17/440,146 · Granted May 6, 2025

Combination of mold and release film, release film, mold, and method for manufacturing molded article

Inventors: Keisuke Sakai (Matsudo, JP); Nanae Tanaka (Matsudo, JP); Kenji Miyashita (Tokyo, JP); Go Kobayashi (Tokyo, JP)
Assignee: KOBAYASHI & CO., LTD.
B29C33/68B29C33/42B29C43/18B29C43/50B29C45/02B29C45/14754B29C45/40B29K2027/18
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 12,290,967
App. No.
17/440,146
Granted
May 6, 2025
Kind
B2
Abstract

An object of the invention is to provide a method for conditioning a surface of a molded article. The present invention relates to a combination of a mold used for curing a thermosetting resin and a release film placed between the thermosetting resin and the mold during the curing. The release film comprises a base layer formed of a thermoplastic resin and a surface layer formed of a particle-containing fluororesin and laminated to the face which is placed during the curing on the side of the thermosetting resin among the two faces of the base layer. The mold has an irregularity formed on the face brought into contact with the release film during the curing.

Claims (27)

1. A combination, comprising:

a mold used for curing a thermosetting resin, and

a release film placed between the thermosetting resin and the mold during curing, wherein:

the release film comprises:

a base layer formed of a thermoplastic resin, and

a surface layer formed of a particle-containing fluororesin and having a surface shape attributable to particles contained in the surface layer,

the fluororesin of the surface layer comprises an isocyanate curing agent and a tetrafluoroethylene resin,

said isocyanate curing agent is a combination of an isocyanurate-type polyisocyanate and an adduct-type polyisocyanate having a mass ratio of 10:6 to 10:10,

the surface layer is laminated to a face of the base layer,

the face is placed on a side of the thermosetting resin during the curing,

the particles are inorganic particles, and an average particle size of the particles determined by laser diffraction particle size analysis is 1 μm to 10 μm,

the mold has an irregularity formed on the face that is brought into contact with the release film during the curing, and

a surface roughness Ra of the face of the mold is 1 μm to 4 μm.

2. The combination according to claim 1 , wherein the particles are silicon dioxide.

3. The combination according to claim 1 , wherein the thermoplastic resin of the base layer is a polyethylene terephthalate resin.

4. The combination according to claim 1 , wherein the thermosetting resin is an epoxy resin.

5. The combination according to claim 1 , which is used in a method of manufacturing a molded article that has an irregularity on a surface of the molded article, the method comprising:

a placing step for placing the release film in the mold used for curing the thermosetting resin,

a curing step, after the placing step, for curing the thermosetting resin, while being in contact with the release film, in the mold to form the molded article, and

a releasing step, after the curing step, for releasing the molded article from the mold thereby obtaining the molded article.

6. The combination according to claim 5 , wherein the irregularity formed on the surface of the molded article is different from the irregularity of the mold.

7. The combination according to claim 5 , wherein the method is transfer molding process or compression molding process.

8. The combination according to claim 5 , wherein in the method, semiconductor devices are sealed in the molded article.

9. The combination according to claim 5 , wherein the molded article has a surface whose glossiness at an incidence angle of 60 degrees is 3 to 50.

10. The combination according to claim 1 , wherein the tensile breaking strength of the release film is 40 MPa to 200 MPa, as determined at 175° C. in accordance with JIS K7127.

11. The combination according to claim 1 , wherein the tensile elongation at break of the release film is 200% to 500%, as determined at 175° C. in accordance with JIS K7127.

12. The combination according to claim 1 , wherein the particle on the surface layer of the molded body side are present in an amount of 16 parts by mass or less per 100 parts by mass of fluorinated resin.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 17, 2021
From: SAKAI, KEISUKE; TANAKA, NANAE; MIYASHITA, KENJI; KOBAYASHI, GO
To: KOBAYASHI & CO.,LTD.
Reel/Frame 057516/0292 →
Priority Claims (1)
JP 2019-052290 · Mar 20, 2019 · national
Continuity (1)
Related Publication 20220152882A1 · May 19, 2022
References Cited (51)
US 6344162B1 · Miyajima · 2002 [cited by applicant]
US 11220028B1 · Cardenas · 2022 [cited by examiner]
US 20130189387A1 · Bravet · 2013 [cited by applicant]
US 20210253815A1 · Sakai · 2021 [cited by examiner]
US 20210257228A1 · Sakai · 2021 [cited by examiner]
US 20220396011A1 · Sakai · 2022 [cited by examiner]
US 20230054528A1 · Sakai · 2023 [cited by examiner]
DE 3918389A1 · 1990 [cited by examiner]
EP 0971401A2 · 2000 [cited by applicant]
JP H02305827A · 1990 [cited by applicant]
JP H0386729A · 1991 [cited by applicant]
JP H03110124A · 1991 [cited by applicant]
JP H04028510A · 1992 [cited by applicant]
JP 2000210987A · 2000 [cited by applicant]
JP 2000299335A · 2000 [cited by applicant]
JP 2003026427A · 2003 [cited by examiner]
JP 200417483A · 2004 [cited by applicant]
JP 201138985A · 2011 [cited by applicant]
JP 2011138985A · 2011 [cited by applicant]
JP 2012256925A · 2012 [cited by applicant]
JP 2014065218A · 2014 [cited by applicant]
JP 2014188746A · 2014 [cited by applicant]
JP 2014225619A · 2014 [cited by applicant]
JP 2015074201A · 2015 [cited by applicant]
JP 2016092272A · 2016 [cited by applicant]
JP 2018202834A · 2018 [cited by applicant]
JP 2020002287A · 2020 [cited by examiner]
JP 2020004896A · 2020 [cited by examiner]
JP 2020007458A · 2020 [cited by examiner]
JP 2020152101A · 2020 [cited by examiner]
JP 2021062606A · 2021 [cited by examiner]
KR 20160032105A · 2016 [cited by examiner]
SG 11201810343T · 2017 [cited by applicant]
SG 11202012852T · 2019 [cited by applicant]
WO WO2018079596A1 · 2018 [cited by examiner]
WO WO2018173682A1 · 2018 [cited by applicant]
Machine translation of DE3918389A1, Dec. 20, 1990 (Year: 1990). [cited by examiner]
Machine translation of JP2014188746A, Oct. 6, 2014 (Year: 2014). [cited by examiner]
Machine translation of JP2016092272A, May 23, 2016 (Year: 2016). [cited by examiner]
Machine translation of WO2018173682A1, Sep. 27, 2018 (Year: 2018). [cited by examiner]
Machine translation of WO-2018079596-A1, May 3, 2018 (Year: 2018). [cited by examiner]
Office Action mailed on Feb. 8, 2023, issued to counterpart Singapore Application No. 11202110143Q. [cited by applicant]
International Search Report mailed Nov. 5, 2019, issued to International Application No. PCT/JP2019/037198. [cited by applicant]
First Office Action mailed Oct. 15, 2019, issued to corresponding Japanese Application No. 2019-052290. [cited by applicant]
Final Office Action mailed Nov. 25, 2019, issued to corresponding Japanese Application No. 2019-052290. [cited by applicant]
Notice of Reasons for Refusal dated Dec. 20, 2022, issued by the Japanese Patent Office in corresponding application JP2020-021299. [cited by applicant]
Chinese Office Action mailed Jun. 21, 2024, issued to corresponding Chinese Application No. 201980094335.5. [cited by applicant]
Office Action mailed Jan. 31, 2024, issued to corresponding Singapore Application No. 11202110143Q. [cited by applicant]
VDI 3400 Surface Finishes Definition, VDI 3400 Depth. Oct. 15, 2018 (see Table that indicates surface roughness that can be achieved by using EDM) Citation not enclosed due to copyright restrictions. A copy may be obtai… [cited by applicant]
Office Action mailed Mar. 5, 2024, issued to corresponding Chinese Application No. 201980094335.5. [cited by applicant]
Indonesia Office Action mailed Oct. 18, 2024, issued to Indonesia Application No. P00202307302. [cited by applicant]