Granted Patent B2

US 12,291,775 · App. 17/751,071 · Granted May 6, 2025

Inventors: James M. Price (Houston, TX); Michael T. Pelletier (Houston, TX); Jian Li (Houston, TX); William Joseph Soltmann (Houston, TX); Christopher Michael Jones (Houston, TX); Anthony Herman Van Zuilekom (Houston, TX)

Assignee: Halliburton Energy Services, Inc.

C23C16/045C23C16/0227C23C16/45536C23C16/45544C23C16/45555H01J37/32357H01J37/32394

Abstract

Claims (36)

1. A method of coating an interior surface adjacent an interior volume of a housing, the interior volume having an inlet and an outlet, the method comprising: enclosing all or a portion of the interior volume of the housing to yield an enclosed volume by sealingly engaging a first closure to the inlet of the housing and sealingly engaging a second closure to the outlet of the housing to form the enclosed volume; introducing one or more reactant gases, plasma, or both to the enclosed volume via a delivery line directly coupled to the first closure; and forming one or more coating layers on all or a portion of the interior surface adjacent the enclosed interior volume of the housing via reaction of the reactant gases, optionally in the presence of the plasma,

wherein the reaction comprises a chemical vapor deposition (CVD) reaction, an atomic layer deposition (ALD) reaction, or both, such that the one or more coating layers respectively comprise an ALD layer, a CVD layer, or both, and

wherein the housing comprises a formation fluid sampling tool.

2. The method of claim 1 , further comprising: (i) forming the ALD layer by: introducing a first reactant gas into the enclosed volume, such that at least a portion of the first reactant gas chemically bonds with the surface to form a reactive layer; removing unreacted first reactant gas and/or gaseous byproducts from the enclosed volume; introducing a second reactant gas into the enclosed volume, such that at least some of the second reactant gas bonds with the reactive layer to form the ALD layer; and optionally removing unreacted second reactant gas and/or gaseous byproducts from the enclosed volume; (ii) forming the CVD layer by: introducing at least a third reactant gas and optionally a fourth reactant gas into the enclosed volume, such that the at least the third reactant gas chemically reacts with the surface; and optionally removing unreacted third reactant gas and/or optional fourth reactant gas and/or gaseous byproducts from the enclosed volume; or (iii) both forming an ALD layer as set forth in (i) and a CVD layer as set forth in (ii), forming both an ALD layer and a CVD layer including forming an ALD layer on the surface and subsequently forming the CVD layer on the ALD layer or forming the CVD layer on the surface and subsequently forming the ALD layer on the CVD layer.

3. The method of claim 2 , further comprising performing an atomic layer etching (ALE) process to pre-treat the surface prior to the forming of the one or more coating layers on the all or the portion of the interior surface adjacent the interior volume of the housing and/or to reduce a thickness of at least one of the one or more coating layers.

4. The method of claim 3 , wherein ALE comprises: applying an etching gas to a surface in the enclosed volume, such that the surface chemically reacts with and adsorbs the etching gas; purging the etching gas and any gaseous byproducts from the enclosed volume; applying low-energy ions to the portions of the surface that chemically reacted with the etching gas to etch away said portions; and optionally purging byproducts from the enclosed volume.

5. The method of claim 2 , further comprising flowing a topical reagent to at least one coating layer of the one or more coating layers, the topical reagent configured to react with the at least one coating layer and thereby adjust a material characteristic of the at least one coating layer.

6. The method of claim 5 , wherein the flowing of the topical reagent to at least one of the one or more coating layers comprises flowing the topical reagent to a topmost coating layer, the topmost coating layer being one of the one or more coating layers positioned farthest away from the interior surface adjacent the interior volume of the housing.

7. The method of claim 1 , further comprising placing a component within the interior volume of the housing and concurrently coating a surface of the component and the interior surface adjacent the interior volume of the housing.

8. The method of claim 1 , wherein the enclosed volume comprises a fluid flow path within the housing.

9. The method of claim 1 , further comprising forming the one or more coating layers at a worksite at which the housing will subsequently be employed post-coating or has been employed pre-coating.

10. The method of claim 1 , wherein the well tool is a sampling while drilling (SWD) tool, and the interior volume of the well tool including a fluid flow path configured for flow of a formation fluid from an exterior of the well tool through an interior of the well tool.

11. The method of claim 10 , wherein forming the one or more coating layers on all or the portion of the interior surface adjacent the enclosed interior volume of the housing via reaction of the reactant gases, optionally in the presence of the plasma, further comprises actuating the well tool to expose an additional surface in the interior volume of the well tool and coating at least a portion of the additional surface.

12. The method of claim 10 , further comprising placing the well tool in a wellbore and contacting the formation fluid with the coated surface.

13. The method of claim 12 , wherein contacting the formation fluid with the coated surface further comprises taking a formation fluid sample with the well tool.

14. The method of claim 13 , further comprising retrieving the formation fluid sample from the wellbore, performing a composition analysis of the formation fluid sample, and recoating or not recoating all or a portion of the interior volume of the well tool based on the compositional analysis.

15. The method of claim 14 , comprising recoating all or the portion of the interior volume of the well tool based on the compositional analysis.

16. The method of claim 15 further comprising performing atomic layer etching prior to the recoating of the all or the portion of the interior volume of the well tool.

17. A method of coating an interior surface of a housing defining a volume, the method comprising:

positioning a coating device and the housing proximate each other, wherein the housing comprises a formation fluid sampling tool, wherein the coating device comprises a plurality of reactant gas sources including reactant gases for one or more surface coating processes, first and second closures to sealingly engage with an inlet and outlet of the volume of the housing to provide an enclosed volume, a delivery line fluidically coupled to the plurality of reactant gas sources and fluidically directly coupled to the first closure to deliver the reactant gases to the enclosed volume, and an output line fluidically coupled to the second closure to remove one or more reactant gases, byproduct gases, or both from the enclosed volume;

sealingly engaging the first closure to the inlet of the housing and sealingly engaging the second closure to the outlet of the housing to form the enclosed volume;

introducing one or more reactant gases, a plasma, or a combination thereof to the enclosed volume via the delivery line; and

forming one or more coating layers on all or a portion of the interior surface within the enclosed volume by reaction of the one or more reactant gases, the plasma, or the combination thereof, wherein the reaction comprises a chemical vapor deposition (CVD) reaction, an atomic layer deposition (ALD) reaction, or both, such that the one or more coating layers respectively comprise an ALD layer, a CVD layer, or both.

18. A method of coating an interior surface of a housing defining a volume, the method comprising:

enclosing all or a portion of the volume of the housing to yield an enclosed volume, wherein the housing comprises a formation fluid sampling tool;

introducing one or more reactant gases, plasma, or a combination thereof to the enclosed volume via a delivery line fluidically directly coupled to the first closure; and

forming one or more coating layers on all or a portion of an interior surface adjacent the enclosed volume via reaction of the reactant gases, the plasma, or the combination thereof, wherein the reaction comprises a chemical vapor deposition (CVD) reaction, an atomic layer deposition (ALD) reaction, or both, such that the one or more coating layers respectively comprise an ALD layer, a CVD layer, or both.

19. The method of claim 1 , wherein the one or more reactant gases comprise a plurality of reactant gases.

20. The method of claim 19 , wherein the plurality of reactant gases include a reactant gas for an atomic layer deposition (ALD) process and a reactant gas for a chemical vapor deposition (CVD) process.

21. The method of claim 1 , wherein forming the one or more coating layers on all or the portion of the interior surface adjacent the enclosed interior volume of the housing via reaction of the reactant gases further comprises delivering a first reactant gas to the enclosed volume, purging the first reactant gas, and delivering a second reactant gas to the enclosed volume.

22. The method of claim 21 further comprising automating a sequence including steps of delivering the first reactant gas to the enclosed volume, purging the first reactant gas, and delivering the second reactant gas to the enclosed volume.

23. The method of claim 1 , wherein forming the one or more coating layers on all or the portion of the interior surface adjacent the enclosed interior volume of the housing via reaction of the reactant gases further comprises: (i) forming an ALD layer by: introducing a first reactant gas into the enclosed volume, such that at least a portion of the first reactant gas chemically bonds with the surface to form a reactive layer; removing unreacted first reactant gas and/or gaseous byproducts from the enclosed volume; introducing a second reactant gas into the enclosed volume, such that at least some of the second reactant gas bonds with the reactive layer to form the ALD layer; and optionally removing unreacted second reactant gas and/or gaseous byproducts from the enclosed volume; (ii) forming a CVD layer by: introducing at least a third reactant gas and optionally a fourth reactant gas into the enclosed volume, such that the at least the third reactant gas chemically reacts with the surface; and optionally removing unreacted third reactant gas and/or optional fourth reactant gas and/or gaseous byproducts from the enclosed volume; or (iii) both forming an ALD layer as set forth in (i) and a CVD layer as set forth in (ii), forming both an ALD layer and a CVD layer including forming an ALD layer on the surface and subsequently forming the CVD layer on the ALD layer or forming the CVD layer on the surface and subsequently forming the ALD layer on the CVD layer.

24. The method of claim 1 , further comprising actuating the housing to expose an additional surface and coating at least a portion of the additional surface.

25. The method of claim 1 , wherein the housing comprises a focused sampling well tool.

26. The method of claim 25 , wherein the focused sampling well tool is operable to take, into one or more sample chambers, one or more fluid samples having a composition representative of a formation fluid of a formation.

27. The method of claim 26 , wherein the focused sampling tool comprises a sample line; a guard line; a common line; a pump; a discard line; a sampling line; the one or more sample chambers for the one or more fluid samples; one or more fluid sensors positioned on the guard line, the sample line, the common line, or a combination thereof, and a probe that can extend from the focused sampling tool during formation sampling to define a sample zone fluidly connected with a sample line inlet of the sample line, a guard zone fluidly connected with a guard line inlet of the guard line, or both a sample zone fluidly connected with the sample line inlet of the sample line and the guard zone fluidly connected with the guard line inlet of the guard line, wherein the guard zone and the sample zone are in fluid communication with the formation during operation of the focused sampling well tool.

Assignments (1)

Continuity (3)

References Cited (50)