IP Library › Granted Patent US 12,296,317
Granted Patent B2
US 12,296,317 · App. 17/620,286 · Granted May 13, 2025

Silicon-based solid amine sorbent for CO

Inventors: Zuotai Zhang (Shenzhen, CN); Chunyan Li (Shenzhen, CN); Feng Yan (Shenzhen, CN); Xuehua Shen (Shenzhen, CN); Fan Qu (Shenzhen, CN)
Assignee: DeCarbon Technology (Shenzhen) Co., Ltd.
B01J20/22B01D3/36B01D53/02B01J20/28061B01J20/28064B01J20/28076B01J20/3078B01J20/3204B01J20/3244B01J20/3248B01D2253/20B01D2257/504
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Quick Facts
Patent No.
US 12,296,317
App. No.
17/620,286
Granted
May 13, 2025
Kind
B2
Abstract

A silicon-based solid amine sorbent for CO 2 and the making method thereof including: providing a silicon source liquid which is a silicate solution or a liquid organosilicate, wherein the silicate solution comprises water and a first silicate dissolved in the water; mixing the silicon source liquid with a precipitant to perform a precipitation reaction to obtain a product liquid containing a precipitate, wherein the precipitate is a second silicate or silicic acid; filtering out the precipitate and washing the precipitate with water; mixing the precipitate filtrated out but not dried yet with an organic alcohol and then performing an azeotropic distillation to obtain a dehydrated precipitate; calcining the dehydrated precipitate to obtain a silicon-based support, wherein the silicon-based support is a powder of the second silicate powder or a silica powder; and impregnating the silicon-based support with an organic amine solution and then drying to obtain the silicon-based amine-containing solid sorbent for CO 2 .

Claims (24)

1. A making method of a silicon-based solid amine sorbent for CO 2 , comprising:

providing a silicon source liquid which is a silicate solution or a liquid organosilicate, wherein the silicate solution comprises water and a first silicate dissolved in the water;

mixing the silicon source liquid with a precipitant to perform a precipitation reaction to obtain a product liquid containing a precipitate, wherein the precipitate is a second silicate or silicic acid;

filtering out the precipitate and washing the precipitate with water;

mixing the precipitate filtrated out but not dried yet with an organic alcohol and then performing an azeotropic distillation to obtain a dehydrated precipitate;

calcining the dehydrated precipitate to obtain a silicon-based support, wherein the silicon-based support is a powder of the second silicate powder or a silica powder; and

impregnating the silicon-based support with an organic amine solution and then drying the silicon-based support impregnated with the organic amine solution to obtain the silicon-based solid amine sorbent for CO 2 .

2. The making method according to claim 1 , wherein the silicon source liquid is the silicate solution, and the first silicate is Na 2 SiO 3 or K 2 SiO 3 .

3. The making method according to claim 2 , wherein a concentration of the first silicate in the silicate solution is 5 g/L to 100 g/L.

4. The making method according to claim 2 , wherein the precipitant is a CO 2 -containing gas or a Ca(OH) 2 solution.

5. The making method according to claim 4 , wherein a concentration of CO 2 in the CO 2 -containing gas is 15 vol. % to 40 vol. %, and a flow rate of the CO 2 -containing gas is 400 mL/min to 2000 mL/min per liter of the silicate solution.

6. The making method according to claim 4 , wherein a concentration of Ca(OH) 2 in the Ca(OH) 2 solution is 0.05 mol/L to 1 mol/L.

7. The making method according to claim 1 , wherein the silicon source liquid is the liquid organosilicate, and the liquid organosilicate is selected from ethyl orthosilicate, methyl orthosilicate, and a combination thereof.

8. The making method according to claim 7 , wherein the precipitant is a mixed liquid of n-butyraldehyde, cetyl trimethyl ammonium bromide, and ammonium hydroxide.

9. The making method according to claim 8 , wherein the mixed liquid is prepared by a method comprising:

mixing n-butyraldehyde, cetyl trimethyl ammonium bromide, and water uniformly to obtain a premixed liquid; and

mixing ammonium hydroxide with the premixed liquid uniformly to obtain the mixed liquid.

10. The making method according to claim 9 , wherein a ratio of n-butyraldehyde, cetyl trimethyl ammonium bromide, water, and ammonium hydroxide in the mixed liquid is (5 ml-20 ml):(0.5 g-10 g):(10 ml-150 ml):(5 ml-100 ml), and a mass fraction of ammonium hydroxide is 25% to 28%.

11. The making method according to claim 10 , wherein a volume ratio of the mixed liquid to the liquid organosilicate is 5:1 to 20:1.

12. The making method according to claim 1 , wherein a temperature of the precipitation reaction between the silicon source liquid and the precipitant is 25° C. to 80° C.

13. The making method according to claim 1 , wherein the organic alcohol is selected from ethanol, propanol, n-butanol, isobutanol, and any combination thereof.

14. The making method according to claim 1 , wherein a temperature of the calcining is 400° C. to 600° C.

15. The making method according to claim 1 , wherein the organic amine solution comprises an organic solvent and an organic amine dissolved in the organic solvent, the organic amine is selected from polyethyleneimine, diethylenetriamine, tetraethylenepentamine, pentaethylenehexamine, and any combination thereof, and the organic solvent is selected from methanol, ethanol, acetone, and any combination thereof.

16. The making method according to claim 1 , wherein a concentration of the organic amine in the organic amine solution is 4 g/L to 200 g/L, and a ratio of the silicon-based support to the organic amine solution is 10 g/L to 100 g/L.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 7, 2022
From: SOUTHERN UNIVERSITY OF SCIENCE AND TECHNOLOGY
To: DECARBON TECHNOLOGY (SHENZHEN) CO., LTD
Reel/Frame 061676/0064 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 17, 2021
From: ZHANG, ZUOTAI; LI, CHUNYAN; YAN, FENG; SHEN, XUEHUA; QU, FAN
To: SOUTHERN UNIVERSITY OF SCIENCE AND TECHNOLOGY
Reel/Frame 058420/0738 →
Continuity (1)
Related Publication 20240123423A1 · Apr 18, 2024
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