IP Library › Granted Patent US 12,300,666
Granted Patent B2
US 12,300,666 · App. 18/597,684 · Granted May 13, 2025

Microelectronic assemblies with communication networks

Inventors: Adel A. Elsherbini (Tempe, AZ); Amr Elshazly (Hillsboro, OR); Arun Chandrasekhar (Chandler, AZ); Shawna M. Liff (Scottsdale, AZ); Johanna M. Swan (Scottsdale, AZ)
Assignee: Intel Corporation
H01L25/0652H01L23/49822H01L25/50
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Quick Facts
Patent No.
US 12,300,666
App. No.
18/597,684
Granted
May 13, 2025
Kind
B2
Abstract

Microelectronic assemblies, and related devices and methods, are disclosed herein. For example, in some embodiments, a microelectronic assembly may include a package substrate, a first die coupled to the package substrate with first interconnects, and a second die coupled to the first die with second interconnects, wherein the second die is coupled to the package substrate with third interconnects, a communication network is at least partially included in the first die and at least partially included in the second die, and the communication network includes a communication pathway between the first die and the second die.

Claims (51)

1. A microelectronic assembly, comprising:

a first redistribution layer;

a first die above the redistribution layer, the first die having a top side and a bottom side, and a first sidewall and a second sidewall between the top side and the bottom side, the second sidewall laterally opposite the first sidewall, and the first die comprising a plurality of through substrate vias;

a first conductive pillar laterally spaced apart from the first sidewall of the first die;

a second conductive pillar laterally spaced apart from the second sidewall of the first die;

a mold material on the first redistribution layer and laterally adjacent to the first die, the first conductive pillar, and the second conductive pillar, the mold material in contact with the first conductive pillar and the second conductive pillar;

a second redistribution layer having a top surface and a bottom surface, the bottom surface on the first conductive pillar, on the second conductive pillar, on the mold material, and over the first die;

a second die coupled to the top surface of the second redistribution layer, the second die vertically over the first die; and

a third die coupled to the top surface of the second redistribution layer, the third die vertically over the first die, and the third die laterally spaced apart from the second die, wherein the first die electrically couples the second die to the third die.

2. The microelectronic assembly of claim 1 , wherein the first die comprises silicon.

3. The microelectronic assembly of claim 1 , wherein the second redistribution layer couples the second die to the first die, and the second redistribution layer couples the third die to the first die.

4. The microelectronic assembly of claim 1 , wherein the second die is coupled to the first conductive pillar.

5. The microelectronic assembly of claim 4 , wherein the third die is coupled to the second conductive pillar.

6. The microelectronic assembly of claim 1 , wherein the second die is vertically over the first conductive pillar.

7. The microelectronic assembly of claim 6 , wherein the third die is vertically over the second conductive pillar.

8. A method of fabricating a microelectronic assembly, the method comprising:

forming a first package substrate portion;

providing a first component above the package substrate portion, the first component having a top side and a bottom side, and a first sidewall and a second sidewall between the top side and the bottom side, the second sidewall laterally opposite the first sidewall, and the first component comprising a plurality of through substrate vias;

forming a first conductive pillar laterally distanced apart from the first sidewall of the first component;

forming a second conductive pillar laterally distanced apart from the second sidewall of the first component;

forming a mold material on the first package substrate portion and laterally adjacent to the first component, the first conductive pillar, and the second conductive pillar, the mold material in contact with the first conductive pillar and the second conductive pillar;

forming a second package substrate portion having a top surface and a bottom surface, the bottom surface on the first conductive pillar, on the second conductive pillar, on the mold material, and over the first component;

providing a second component coupled to the top surface of the second package substrate portion, the second component vertically over the first component; and

providing a third component coupled to the top surface of the second package substrate portion, the third component vertically over the first component, and the third component laterally distanced apart from the second component, wherein the first component electrically couples the second component to the third component.

9. The method of claim 8 , wherein the first component comprises silicon.

10. The method of claim 8 , wherein the second package substrate portion couples the second component to the first component, and the second package substrate portion couples third component to the first component.

11. The method of claim 8 , wherein the second component is coupled to the first conductive pillar.

12. The method of claim 11 , wherein the third component is coupled to the second conductive pillar.

13. The method of claim 8 , wherein the second component is vertically over the first conductive pillar.

14. The method of claim 13 , wherein the third component is vertically over the second conductive pillar.

15. An electrical device, comprising:

a board; and

a microelectronic assembly coupled to the board, the microelectronic assembly comprising:

a first redistribution layer;

a first die above the redistribution layer, the first die having a top side and a bottom side, and a first sidewall and a second sidewall between the top side and the bottom side, the second sidewall laterally opposite the first sidewall, and the first die comprising a plurality of through substrate vias;

a first conductive pillar laterally spaced apart from the first sidewall of the first die;

a second conductive pillar laterally spaced apart from the second sidewall of the first die;

a mold material on the first redistribution layer and laterally adjacent to the first die, the first conductive pillar, and the second conductive pillar, the mold material in contact with the first conductive pillar and the second conductive pillar;

a second redistribution layer having a top surface and a bottom surface, the bottom surface on the first conductive pillar, on the second conductive pillar, on the mold material, and over the first die;

a second die coupled to the top surface of the second redistribution layer, the second die vertically over the first die; and

a third die coupled to the top surface of the second redistribution layer, the third die vertically over the first die, and the third die laterally spaced apart from the second die, wherein the first die electrically couples the second die to the third die.

16. The electrical device of claim 15 , further comprising:

a memory coupled to the board.

17. The electrical device of claim 15 , further comprising:

a processing device coupled to the board.

18. The electrical device of claim 15 , further comprising:

a communication chip coupled to the board.

19. The electrical device of claim 15 , further comprising:

a battery coupled to the board.

20. The electrical device of claim 15 , further comprising:

a display device coupled to the board.

Continuity (5)
Continuation 17956773 · Sep 29, 2022
Continuation 17706156 · Mar 28, 2022
Continuation 17128558 · Dec 21, 2020
Continuation 16648464
Related Publication 20240213216A1 · Jun 27, 2024
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