Laterally-gated transistors and lateral Schottky diodes with integrated lateral field plate structures
Laterally-gated transistors and lateral Schottky diodes are disclosed. The FET includes a substrate, source and drain electrodes, channel, a gate electrode structure, and a dielectric layer. The gate electrode structure includes an electrode in contact with the channel and a lateral field plate adjacent to the electrode. The dielectric layer is disposed between the lateral field plate and the channel. The lateral field plate contacts the dielectric layer and to modulate an electric field proximal to the gate electrode proximal to the drain or source electrodes. Also disclosed is a gate electrode structure with lateral field plates symmetrically disposed relative to the gate electrode. Also disclosed in a substrate with dielectric structures buried in the substrate remote from the gate electrode structure. A lateral Schottky diode having an anode structure includes an anode (A), cathodes (C) and lateral field plates located between the anode and the cathodes.
1. A field-effect transistor (FET), comprising:
a substrate;
a source electrode and a drain electrode disposed on the substrate;
a channel layer;
a gate electrode structure comprising:
a gate electrode in contact with the channel layer;
a first lateral field plate adjacent to one side of the gate electrode; and
a second lateral field plate adjacent to an opposite side of the gate electrode;
wherein the first and second lateral field plates are disposed in a symmetrical arrangement relative to the gate electrode; and
a first dielectric layer disposed between the first and second lateral field plates and the channel layer; and
wherein the first and second lateral field plates are in contact with the first dielectric layer and are configured to modulate an electric field proximal to the gate electrode proximal to at least one of the drain electrode or the source electrode, or both the drain electrode and the source electrode, and
wherein the gate electrode and the first and second lateral field plates comprise top portions and bottom portions, wherein the bottom portions of the gate electrode and the first and second lateral field plates are buried in an aperture defined in the substrate to a depth extending to the channel layer and the top portions of the gate electrode and the first and second lateral field plates extend above a surface of the substrate.
2. The FET of claim 1 , wherein the gate electrode and the first and second lateral field plates are disposed on a surface of the substrate.
3. The FET of claim 1 , wherein a thickness of the first dielectric layer determines a pinch-off voltage in a field plate region proximal to the gate electrode structure.
4. The FET of claim 1 , wherein the aperture defines sidewalls and the first dielectric layer is disposed on the sidewalls except in lateral gaps disposed in the first dielectric layer configured to receive the bottom portions of the gate electrode such that the gate electrode is in lateral contact with the channel layer.
5. The FET of claim 4 , wherein the first dielectric layer is further disposed on sidewalls defined by the bottom portion of the gate electrode in a lateral direction along a width (W) of the substrate.
6. A field-effect transistor (FET), comprising:
a substrate;
a source electrode and a drain electrode disposed on the substrate;
a channel layer;
a gate electrode structure comprising:
a gate electrode in contact with the channel layer;
a first lateral field plate adjacent to one side of the gate electrode; and
a second lateral field plate adjacent to an opposite side of the gate electrode;
a third lateral field plate disposed adjacent to the first lateral field plate; and
a fourth lateral field plate disposed adjacent to the second lateral field plate;
wherein the first and second lateral field plates are disposed in a symmetrical arrangement relative to the gate electrode; and
a first dielectric layer disposed between the first and second lateral field plates and the channel layer; and
wherein the first and second lateral field plates are in contact with the first dielectric layer and are configured to modulate an electric field proximal to the gate electrode proximal to at least one of the drain electrode or the source electrode, or both the drain electrode and the source electrode, and
wherein the gate electrode and the first and second lateral field plates comprise top portions and bottom portions, wherein the bottom portions of the gate electrode and the first and second lateral field plates are buried in an aperture defined in the substrate to a depth extending to the channel layer and the top portions of the gate electrode and the first and second lateral field plates extend above a surface of the substrate.
7. The FET of claim 6 , wherein the gate electrode and the first and second lateral field plates are disposed on a surface of the substrate.
8. The FET of claim 6 , wherein a thickness of the first dielectric layer determines a pinch-off voltage in a field plate region proximal to the gate electrode structure.
9. The FET of claim 6 , wherein the aperture defines sidewalls and the first dielectric layer is disposed on the sidewalls except in lateral gaps disposed in the first dielectric layer configured to receive the bottom portions of the gate electrode such that the gate electrode is in lateral contact with the channel layer.
10. The FET of claim 6 wherein the first dielectric layer defines sidewalls, and wherein the FET further comprises a second dielectric layer disposed on the sidewalls of the first dielectric layer.
11. The FET of claim 10 , wherein the first, second, third, and fourth lateral field plates contact the second dielectric layer.
12. The FET of claim 6 , wherein the third and fourth lateral field plates are arranged symmetrically relative to the gate electrode.
13. A field-effect transistor (FET), comprising:
a substrate;
a source electrode and a drain electrode disposed on the substrate;
a channel layer;
an aperture defined in the substrate to a depth extending to the channel layer, wherein the aperture defines sidewalls;
a gate electrode structure comprising:
a gate electrode in contact with the channel layer;
a first lateral field plate adjacent to one side of the gate electrode; and
a second lateral field plate adjacent to an opposite side of the gate electrode;
wherein the first and second lateral field plates are disposed in a symmetrical arrangement relative to the gate electrode; and
a first dielectric layer disposed on the sidewalls except in lateral gaps disposed in the first dielectric layer configured to receive a bottom portion of the gate electrode such that the gate electrode is in lateral contact with the channel layer; and
wherein the first and second lateral field plates are in contact with the first dielectric layer and are configured to modulate an electric field proximal to the gate electrode proximal to at least one of the drain electrode or the source electrode, or both the drain electrode and the source electrode, and
wherein the gate electrode and the first and second lateral field plates comprise top portions and bottom portions, wherein the bottom portions of the gate electrode and the first and second lateral field plates are buried in an aperture defined in the substrate to a depth extending to the channel layer and the top portions of the gate electrode and the first and second lateral field plates extend above a surface of the substrate.
14. The FET of claim 13 , wherein the gate electrode further comprises:
a third lateral field plate disposed adjacent to the first lateral field plate; and
a fourth lateral field plate disposed adjacent to the second lateral field plate.
15. The FET of claim 14 , wherein the first dielectric layer defines sidewalls, and wherein the FET further comprises a second dielectric layer disposed on the sidewalls of the first dielectric layer.
16. The FET of claim 15 , wherein the first, second, third, and fourth lateral field plates contact the second dielectric layer.
17. The FET of claim 13 , wherein the gate electrode and the first and second lateral field plates are disposed on a surface of the substrate.
18. The FET of claim 14 , wherein the third and fourth lateral field plates comprise top portions and bottom portions, wherein the bottom portions of the gate electrode and the third and fourth lateral field plates are buried in the aperture defined in the substrate and the top portions of the gate electrode and the third and fourth lateral field plates extend above a surface of the substrate.