IP Library › Granted Patent US 12,318,499
Granted Patent B2
US 12,318,499 · App. 17/193,648 · Granted Jun 3, 2025

Methods and systems for medical plasma treatment and generation of plasma activated media

Inventor: Peter F. Vandermeulen (Newburyport, MA)
A61L2/14A61L2/0094A61N1/44H01J37/32192A61L2202/11A61L2202/14A61L2202/15A61L2202/21H01J37/02
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Quick Facts
Patent No.
US 12,318,499
App. No.
17/193,648
Granted
Jun 3, 2025
Kind
B2
Abstract

A membrane plate assembly is disclosed for use with a cold atmospheric plasma applicator to expose a medium to plasma beams from the plasma applicator. The membrane plate assembly includes a membrane plate stack configured to receive the plasma beams from the plasma applicator. The membrane plate stack includes a plurality of membrane-covered structures facing each other in a generally parallel arrangement and being spaced apart to define a channel therebetween through which the plasma beams are directed. Each membrane-covered structure includes a structure and a membrane covering outer surfaces of the structure with a gap therebetween through which the medium is flowed.

Claims (26)

1. A plasma deposition system, comprising:

a microwave generator; and

a plurality of interchangeable waveguide conduit apparatuses, each configured to be separately coupled and used with the microwave generator, each waveguide conduit apparatus comprising:

a waveguide conduit that can be connected to and disconnected from the microwave generator, the waveguide conduit having a slot located at a first side thereof;

a primary plunger moveably positioned in the waveguide conduit for creating a primary standing microwave in the waveguide conduit;

an ejector apparatus disposed on a second side of the waveguide conduit opposite the slot on the first side thereof, the ejector apparatus including (1) an electrically conductive sleeve extending partially into the waveguide conduit, (2) a secondary plunger located concentrically around the electrically conductive sleeve for creating a secondary standing microwave in the ejector apparatus, and (3) an electrically insulating pipe connected to a gas supply source and positioned concentrically within the electrically conductive sleeve, the electrically insulating pipe having a tapered distal tip extending through the slot for discharging plasma to be deposited on a surface;

wherein the ejector apparatus is circular-shaped and is configured to discharge a narrow beam of plasma to be deposited on a spot of the surface;

wherein at least some of the plurality of waveguide conduit apparatuses further comprise one or more additional ejector apparatuses configured to discharge multiple beams of plasma to be deposited on an area of the surface.

2. The system of claim 1 , further comprising a plasma diffuser chamber receiving the plasma from the electrically insulating pipe of a waveguide conduit apparatus connected to the microwave generator, the plasma diffuser chamber generating a shower of plasma beams to be applied on the surface.

3. The system of claim 2 , further comprising a membrane plate stack configured to receive the plasma beams from the plasma diffuser chamber, the membrane plate stack comprising a plurality of membrane-covered structures facing each other in a generally parallel arrangement and being spaced apart to define a channel therebetween exposed to the plasma beams, each membrane-covered structure comprising a structure and a membrane covering outer surfaces of the structure with a gap therebetween through which a medium intended to be injected into a tissue is flowed.

4. The system of claim 2 , wherein the plasma is directed towards a liquid bath containing a medium.

5. The system of claim 1 , wherein the waveguide conduits of at least some of the plurality of waveguide conduit apparatuses are flexible.

6. The system of claim 1 , wherein the waveguide conduits of at least some of the plurality of waveguide conduit apparatuses are bent to conform to a curved surface.

7. A plasma deposition system, comprising:

a microwave generator; and

a plurality of interchangeable waveguide conduit apparatuses, each configured to be separately coupled and used with the microwave generator, each waveguide conduit apparatus comprising:

a waveguide conduit that can be connected to and disconnected from the microwave generator, the waveguide conduit having a slot located at a first side thereof;

a primary plunger moveably positioned in the waveguide conduit for creating a primary standing microwave in the waveguide conduit;

an ejector apparatus disposed on a second side of the waveguide conduit opposite the slot on the first side thereof, the ejector apparatus including (1) an electrically conductive sleeve extending partially into the waveguide conduit, (2) a secondary plunger located concentrically around the electrically conductive sleeve for creating a secondary standing microwave in the ejector apparatus, and (3) an electrically insulating pipe connected to a gas supply source and positioned concentrically within the electrically conductive sleeve, the electrically insulating pipe having a tapered distal tip extending through the slot for discharging plasma to be deposited on a surface;

wherein the ejector apparatus is oblong-shaped and is configured to discharge a flat beam of plasma to be deposited on an area of the surface;

wherein at least some of the plurality of waveguide conduit apparatuses further comprise one or more additional ejector apparatuses configured to discharge multiple beams of plasma to be deposited on an area of the surface.

8. The system of claim 7 , further comprising a plasma diffuser chamber receiving the plasma from the electrically insulating pipe of a waveguide conduit apparatus connected to the microwave generator, the plasma diffuser chamber generating a shower of plasma beams to be applied on the surface.

9. The system of claim 8 , further comprising a membrane plate stack configured to receive the plasma beams from the plasma diffuser chamber, the membrane plate stack comprising a plurality of membrane-covered structures facing each other in a generally parallel arrangement and being spaced apart to define a channel therebetween exposed to the plasma beams, each membrane-covered structure comprising a structure and a membrane covering outer surfaces of the structure with a gap therebetween through which a medium intended to be injected into a tissue is flowed.

10. The system of claim 8 , wherein the plasma is directed towards a liquid bath containing a medium.

11. The system of claim 7 , wherein the waveguide conduits of at least some of the plurality of waveguide conduit apparatuses are flexible.

12. The system of claim 7 , wherein the waveguide conduits of at least some of the plurality of waveguide conduit apparatuses are bent to conform to a curved surface.

Continuity (2)
Provisional Application 62989053 · Mar 13, 2020
Related Publication 20210283290A1 · Sep 16, 2021
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