Wafer processing apparatus and wafer processing method
A wafer processing apparatus of the present invention includes a suction nozzle configured to suction sludge from a cup housing, a flow line connected to the suction nozzle such that the sludge and a chemical solution flow therein, a suction tank connected to the flow line such that the sludge and the chemical solution flow thereto, and an ejector installed on a flow line to generate suction pressure in the suction nozzle and the flow line.
1. A wafer processing apparatus comprising:
a suction nozzle that suctions sludge from a cup housing;
a flow line connected to the suction nozzle such that the sludge and a chemical solution flow therein;
a suction tank connected to the flow line such that the sludge and the chemical solution flow thereto; and
an ejector installed on a flow line and that generates suction pressure in the suction nozzle and the flow line, wherein
the suction tank includes:
a suction tank body; and
a filter disposed inside the suction tank body and that filters the sludge discharged from the flowline.
2. The wafer processing apparatus of claim 1 , wherein the ejector includes:
an ejector body into which the sludge and the chemical solution suctioned into the flow line flow; and
a gas supply unit connected to the ejector body and that supplies a gas to the ejector body.
3. The wafer processing apparatus of claim 1 , wherein the suction tank further includes:
a drain connected to the suction tank body and that discharges the chemical solution filtered by the filter.
4. The wafer processing apparatus of claim 3 , wherein:
the filter is one of a plurality of filters stacked between the flow line and the drain; and
the plurality of filters have meshes which become smaller toward the drain.
5. The wafer processing apparatus of claim 3 , further comprising an overflow line connected to the suction tank body and the drain.
6. The wafer processing apparatus of claim 5 , wherein the overflow line is connected to a portion above the filter in the suction tank.
7. The wafer processing apparatus of claim 5 , further comprising an overflow detector that detects that the chemical solution of the suction tank body flows into the overflow line.
8. The wafer processing apparatus of claim 1 , further comprising a discharge line connected to the suction tank and that discharges a chemical fume and a gas from the suction tank.
9. The wafer processing apparatus of claim 1 , further comprising a spray nozzle that sprays the chemical solution onto a substrate in the cup housing,
wherein, when the spray nozzle sprays the chemical solution onto the substrate, the suction nozzle suctions the sludge floating in the chemical solution.
10. The wafer processing apparatus of claim 1 , further comprising a controller wherein, after a substrate processing process is ended, the ejector is controlled to generate suction pressure in the suction nozzle and the flow line for a preset time.