Detection apparatus, lithography apparatus, and article manufacturing method
A detection apparatus that detects a position deviation between an original and a substrate is provided. The apparatus includes an illumination optical system configured to illuminate a first diffraction grating arranged on the original and a second diffraction grating arranged on the substrate, and a detection optical system configured to detect interference light formed by diffracted light diffracted by the first diffraction grating and diffracted light diffracted by the second diffraction grating. The illumination optical system performs dipole illumination by light including two poles in a pupil plane of the illumination optical system, and polarization directions of light beams emitted from the two poles, respectively, and incident on the substrate are orthogonal to each other.
1. A detection apparatus that detects a position deviation between an original and a substrate, comprising:
an illumination optical system configured to illuminate a first diffraction grating arranged on the original and a second diffraction grating arranged on the substrate; and
a detection optical system configured to detect interference light formed by diffracted light diffracted by the first diffraction grating and diffracted light diffracted by the second diffraction grating,
wherein the illumination optical system performs dipole illumination by light including two poles in a pupil plane of the illumination optical system, and polarization directions of light beams emitted from the two poles, respectively, and incident on the substrate are orthogonal to each other, and
illumination by the illumination optical system and detection by the detection optical system are performed in a state in which a surface position of the substrate is defocused.
2. The apparatus according to claim 1 , wherein
the polarization directions of the light beams emitted from the two poles, respectively, form a combination of P polarization and S polarization.
3. The apparatus according to claim 1 , wherein
the polarization directions of the light beams emitted from the two poles, respectively, form a combination of +45° polarization and −45° polarization.
4. The apparatus according to claim 1 , wherein
the polarization directions of the light beams emitted from the two poles, respectively, form a combination of counterclockwise circular polarization and clockwise circular polarization.
5. The apparatus according to claim 1 , wherein
measurement of a position deviation in a first direction and measurement of a position deviation in a second direction intersecting the first direction are simultaneously performed.
6. The apparatus according to claim 5 , wherein
the illumination optical system comprises an optical element including a first region which forms illumination light for illuminating a first portion of the substrate, and a second region which forms illumination light for illuminating a second portion different from the first portion of the substrate.
7. The apparatus according to claim 6 , wherein the optical element is a diffraction optical element.
8. A lithography apparatus that forms a pattern on a substrate using an original, comprising:
a detection apparatus defined in claim 1 , configured to detect a position deviation between the original and the substrate; and
a controller configured to control a position of the substrate based on a detection result obtained by the detection apparatus.
9. An article manufacturing method comprising:
forming a pattern on a substrate using a lithography apparatus defined in claim 8 ; and
processing the substrate on which the pattern has been formed in the forming,
wherein an article is manufactured from the substrate processed in the processing.
10. A detection apparatus that detects a position deviation between an original and a substrate, comprising:
an illumination optical system configured to illuminate a first diffraction grating arranged on the original and a second diffraction grating arranged on the substrate; and
a detection optical system configured to detect interference light formed by diffracted light diffracted by the first diffraction grating and diffracted light diffracted by the second diffraction grating,
wherein the illumination optical system comprises a fiber including a plurality of fiber element wires each of which guides light from a light source, and is configured such that an image of an exit end of the fiber is formed in a pupil plane of the illumination optical system, and
the illumination optical system performs dipole illumination by light including two poles in the pupil plane, barycenters of the two poles being shifted from each other, and light beams passing through the two poles, respectively, have not passed through the same fiber element wire among the plurality of fiber element wires, and
illumination by the illumination optical system and detection by the detection optical system are performed in a state in which a surface position of the substrate is defocused.
11. A detection apparatus that detects a position deviation between an original and a substrate, comprising:
an illumination optical system configured to illuminate a first diffraction grating arranged on the original and a second diffraction grating arranged on the substrate; and
a detection optical system configured to detect interference light formed by diffracted light diffracted by the first diffraction grating and diffracted light diffracted by the second diffraction grating,
wherein the illumination optical system performs dipole illumination by light including two poles in a pupil plane of the illumination optical system, and
illumination by the illumination optical system and detection by the detection optical system are performed in a state in which a surface position of the substrate is defocused.