IP Library Granted Patent US 12,328,962
Granted Patent B2
US 12,328,962 · App. 18/386,859 · Granted Jun 10, 2025

SPAD pixel

Inventors: Francois Guyader (Montbonnot, GB); Sara Pellegrini (Edinburgh, GB); Bruce Rae (Edinburgh, GB)
Assignees: STMicroelectronics (Crolles 2) SAS; STMicroelectronics (Research &Development) Limited
H10F39/8033G01J1/44H04N25/70H10F30/225H10F39/809G01J2001/4466
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 12,328,962
App. No.
18/386,859
Granted
Jun 10, 2025
Kind
B2
Abstract

An electronic device includes a stack of a first level having a SPAD, a second level having a quench circuit for said SPAD, and a third level having a circuit for processing data generated by said SPAD. A method for making the device includes: a) forming of the first level; b) bonding, on the first level, by molecular bonding, of a stack of layers including a semiconductor layer; and c) forming the quench circuit of the second level in the semiconductor layer.

Claims (18)

1. An electronic device, comprising:

a processing circuit level comprising a first semiconductor substrate, first transistors formed in and on top of the first semiconductor substrate, a first insulating layer covering the first transistors, a first stack of insulating layers with conductive tracks over the first insulating layer, first vias passing through the first insulating layer to electrically connect the first transistors to the conductive tracks of the first stack of insulating layers, and first metal pads at an upper surface of the first stack of insulating layers and electrically connected to the conductive tracks of the first stack of insulating layers;

a quench circuit level comprising a layer with plural semiconductor regions insulated from one another by insulating regions, second transistors formed in and on top of the plural semiconductor regions, a second insulating layer covering the second transistors, a third insulating layer covering a side of the layer opposite the second insulating layer, a second stack of insulating layers with conductive tracks over the second insulating layer, second vias passing through the second insulating layer to electrically connect the second transistors to the conductive tracks of the second stack of insulating layers, and second metal pads at an upper surface of the second stack of insulating layers and electrically connected to the conductive tracks of the second stack of insulating layers;

wherein a hybrid bond is made between the first metal pads and the upper surface of the first stack of insulating layers and the second metal pads and the upper surface of the second stack of insulating layers;

a SPAD circuit level comprising a second semiconductor substrate with a photodiode region;

wherein a bond is made between the second insulating layer and the SPAD circuit level; and

wherein a third via extends through the second insulating layer, the insulating regions and the third insulating layer to electrically connect the photodiode region to the conductive tracks of the second stack of insulating layers.

2. The electronic device of claim 1 , wherein the layer of the quench circuit level further includes a ground plane positioned between the third insulating layer and each semiconductor region of the plural semiconductor regions.

3. The electronic device of claim 2 , wherein the layer of the quench circuit level further includes an insulating region positioned between each ground plane and each semiconductor region of the plural semiconductor regions.

4. The electronic device of claim 2 , further comprising a connection via that electrically connects each ground plane to the conductive tracks of the second stack of insulating layers.

5. The electronic device of claim 1 , wherein the first transistors formed in and on top of the first semiconductor substrate comprise digital processing circuit transistors.

6. The electronic device of claim 1 , wherein the second transistors formed in and on top of the semiconductor regions comprise transistors for a quench circuit electrically connected to the photodiode region.

7. The electronic device of claim 6 , wherein the second transistors formed in and on top of the semiconductor regions further comprise transistors for a SPAD disabling circuit electrically connected to the photodiode region.

8. The electronic device of claim 1 , wherein the second semiconductor substrate further comprises a pull-up diode electrically connected to the photodiode region.

9. The electronic device of claim 1 , wherein the SPAD circuit level further comprises a fourth insulating layer over the second semiconductor substrate, and wherein the bond between the second insulating layer and the SPAD circuit level comprises a molecular bond between the third and fourth insulating layers.

10. The electronic device of claim 1 , wherein the SPAD circuit level comprises a single SPAD.

11. The electronic device of claim 1 , wherein the SPAD circuit level comprises no electronic component other than a SPAD.

12. The electronic device according to claim 1 , wherein the quench circuit level only comprises circuitry for providing a quench function for a SPAD in the SPAD circuit level.

Priority Claims (1)
FR 2010400 · Oct 12, 2020 · national
Continuity (2)
Continuation 17498286 · Oct 11, 2021
Related Publication 20240063235A1 · Feb 22, 2024
References Cited (17)
US 10204950B1 · Yamashita · 2019 [cited by applicant]
US 20170186798A1 · Yang et al. · 2017 [cited by applicant]
US 20180084238A1 · Chossat et al. · 2018 [cited by applicant]
US 20180090526A1 · Mandai et al. · 2018 [cited by applicant]
US 20180308881A1 · Hynecek · 2018 [cited by examiner]
US 20190131478A1 · Wang et al. · 2019 [cited by applicant]
US 20190191067A1 · Vaillant et al. · 2019 [cited by applicant]
US 20200035561A1 · Batude et al. · 2020 [cited by applicant]
CN 106920808A · 2017 [cited by applicant]
CN 109564930A · 2019 [cited by applicant]
CN 109585468A · 2019 [cited by applicant]
CN 217306505U · 2022 [cited by applicant]
EP 3104402A1 · 2016 [cited by applicant]
INPI Search Report and Written Opinion for FR 2010400 dated May 17, 2021 (8 pages). [cited by applicant]
First Office Action and Search Report for counterpart CN Appl. No. 202111185973.3, report dated May 14, 2024, 9 pgs. [cited by applicant]
CN Second Office Action and Search Report for counterpart CN Appl. No. 202111185973.3, report dated Nov. 24, 2024, 9 pgs. [cited by applicant]
CN Notice of Allowance from counterpart CN Appl. No. 202111185973.3, report dated Mar. 24, 2025, 7 pgs. [cited by applicant]