Apparatus for smoothly exhausting the atmosphere in a processing space when rotating a substrate with liquid
An apparatus for processing a substrate includes a first processing unit configured to have a first processing container having a first inner space and a first support unit supporting and rotating the substrate in the first inner space; a second processing unit configured to have a second processing container having a second inner space and a second support unit supporting and rotating the substrate in the second inner space; an exhaust unit configured to exhaust the first and the second inner space; a first exhaust pipe configured to have a first exhaust port for introducing atmosphere of the first inner space and exhaust the atmosphere introduced through the first exhaust port to the integrated duct; and a second exhaust pipe configured to have a second exhaust port for introducing atmosphere of the second inner space and exhaust the atmosphere introduced through the second exhaust port to the integrated duct.
1. An apparatus for processing a substrate comprising:
a first processing unit comprising a first processing container configured to have a first inner space and a first support unit, wherein the first support unit supports, and rotates the substrate within the first inner space;
a second processing unit comprising a second processing container configured to have a second inner space and a second support unit, wherein the second support unit supports, and rotates the substrate within the second inner space;
wherein the first processing unit and the second processing unit are arranged in a unit arrangement direction; and
an exhaust unit configured to exhaust the first inner space and the second inner space, wherein the exhaust unit comprises:
an integrated duct having a portion positioned in a Y axial direction when the unit arrangement direction is in an X axis, wherein a longitudinal direction of the integrated duct is substantially parallel with the unit arrangement direction;
a first exhaust pipe configured to have a first exhaust port for introducing the atmosphere of the first inner space to the integrated duct and exhaust the atmosphere of the first inner space to the integrated duct; and
a second exhaust pipe configured to have a second exhaust port for introducing the atmosphere of the second inner space and exhaust the atmosphere of the second inner space to the integrated duct,
wherein the integrated duct comprises a first wall member configured to partition a first exhaust path in the integrated duct,
wherein the first wall member starts between a first position where the first exhaust pipe is connected with the integrated duct and a second position where the second exhaust pipe is connected with the integrated duct and, the first wall member extends along an exhaust direction of the first exhaust path,
wherein the first wall member partitions a first exhaust path in connection with the first exhaust pipe and a second exhaust path in connection with the second exhaust pipe,
wherein the first position is downstream from the second position in the exhaust direction of each of the first exhaust path and the second exhaust path,
wherein the atmosphere of the first interior space exhausted through the first exhaust path and the atmosphere of the second interior space exhausted through the second exhaust path join downstream of the first wall member, and
wherein the first wall member has a first part and a second part, and
wherein the first part is in contact with an inner wall of the integrated duct and is disposed inclined with respect to the longitudinal direction of the integrated duct, and the second part extends from the first part and is disposed parallel to the longitudinal direction of the integrated duct, wherein the second part extends parallel to an outer wall of the exhaust unit in the exhaust direction of the first exhaust path and the second exhaust path.
2. The apparatus for processing the substrate of claim 1 ,
wherein the first wall member extends downstream of the first position according to the exhaust direction of the first position.
3. The apparatus for processing the substrate of claim 2 ,
wherein at the end of the first wall member, the cross-sectional areas of the first exhaust path and the second exhaust path are equally provided.
4. The apparatus for processing the substrate of claim 1 , further comprising:
a third processing unit comprising a third processing container configured to have a third inner space and a third support unit, wherein the third support unit supports, rotates, and processes the substrate within the third inner space,
wherein the third processing unit is arranged in a line with the first processing unit and the second processing unit,
wherein the exhaust unit further comprises a third exhaust pipe configured to further exhaust the third inner space, have a third exhaust port for introducing the atmosphere of the third inner space, and exhaust the atmosphere introduced through the third exhaust port to the integrated duct,
wherein the integrated duct further comprises a second wall member configured to partition the second exhaust path in the integrated duct; and
wherein the second wall member starts between the second position and a third position where the second exhaust pipe is connected with the integrated duct and extend along the exhaust direction of the second exhaust path, and
wherein the second wall member partitions a third exhaust path provided to be in circulation with the second exhaust pipe and the third exhaust pipe.
5. The apparatus for processing the substrate of claim 4 ,
wherein the first wall member and the second wall member extends downstream of the first position according to the exhaust direction of the first position.
6. The apparatus for processing the substrate of claim 5 ,
wherein at the ends of the first wall member and the second wall member, the cross-sectional areas of the first exhaust path, the second exhaust path, and the third exhaust path are equally provided.
7. The apparatus for processing the substrate of claim 1 ,
wherein the first exhaust pipe is coupled to a bottom wall of the first processing container, and
wherein the second exhaust pipe is coupled to a bottom wall of the second processing container.
8. The apparatus for processing the substrate of claim 1 , further comprising:
a liquid supplier configured to supply a processing liquid onto the substrate supported by the first support unit or the second support unit.
9. The apparatus for processing the substrate of claim 1 ,
wherein a decompression member is provided downstream the first position of the integrated duct, the decompression member being a pump or a fan.
10. The apparatus for processing the substrate of claim 1 , further comprising:
a liquid supply unit configured to eject the processing liquid to the substrate,
wherein the liquid supply unit comprises
nozzles; and
a nozzle driver configured to move the nozzles to a first process position facing the first support unit or a second process position facing the second support unit so that the nozzles eject the liquid to a substrate selected from the substrate supported by the first support unit and the substrate supported by the second support unit.
11. The apparatus for processing the substrate of claim 10 ,
wherein the processing liquid is a photoresist.
12. The apparatus for processing the substrate of claim 11 , further comprising:
a first fan filter unit located above the first processing unit and configured to include a fan for introducing external air to the first inner space and a filter for filtering the external air; and
a second fan filter unit located above the second processing unit and configured to include a fan for introducing external air to the second inner space and a filter for filtering the external air.
13. The apparatus for processing the substrate of claim 1 ,
wherein the first exhaust pipe and the second exhaust pipe are sequentially arranged along the arrangement direction of the first processing unit and the second processing unit.
14. The apparatus for processing the substrate of claim 4 ,
wherein the first exhaust pipe, the second exhaust pipe, and the third exhaust pipe are sequentially arranged along the arrangement direction of the first processing unit, the second processing unit, and the third processing unit.
15. The apparatus for processing the substrate of claim 1 ,
wherein the first wall member is configured to be moved in a +Y direction or a −Y direction to vary the cross-sectional area of the first exhaust path.
16. The apparatus for processing the substrate of claim 1 , wherein the first exhaust path is circularly connected to the first exhaust pipe and the second exhaust pipe.