Large-particle monitoring with laser power control for defect inspection
A semiconductor wafer is inspected using a main laser beam and a secondary laser beam. The secondary laser beam leads the main laser beam and has lower power than the main laser beam. Using the secondary laser beam, a particle is detected on the semiconductor wafer having a size that satisfies a threshold. In response to detecting the particle, the power of the main laser beam and the power of the secondary laser beam are reduced. The particle passes through the main laser beam with the main laser beam at reduced power. After the particle has passed through the main laser beam with the main laser beam at the reduced power, the power of the main laser beam and the power of the secondary laser beam are restored in a controlled manner that is slower than a single step.
1. A method, comprising:
inspecting a semiconductor wafer using a main laser beam and a secondary laser beam, wherein the secondary laser beam leads the main laser beam and has lower power than the main laser beam;
detecting, using the secondary laser beam, a particle on the semiconductor wafer having a size that satisfies a threshold;
in response to detecting the particle, reducing the power of the main laser beam and the power of the secondary laser beam, wherein the particle passes through the main laser beam with the main laser beam at reduced power; and
after the particle has passed through the main laser beam with the main laser beam at the reduced power, restoring the power of the main laser beam and the power of the secondary laser beam in a controlled manner that is slower than a single step.
2. The method of claim 1 , wherein restoring the power of the main laser beam and the power of the secondary laser beam in the controlled manner comprises restoring the power of the main laser beam and the power of the secondary laser beam in a series of steps.
3. The method of claim 2 , wherein the series of steps consists of three to seven steps.
4. The method of claim 2 , wherein the series of steps comprises at least three steps.
5. The method of claim 1 , wherein restoring the power of the main laser beam and the power of the secondary laser beam in the controlled manner comprises ramping up the power of the main laser beam and the power of the secondary laser beam in a substantially smooth curve.
6. The method of claim 1 , wherein restoring the power of the main laser beam and the power of the secondary laser beam in the controlled manner comprises ramping up the power of the main laser beam and the power of the secondary laser beam in a substantially linear ramp.
7. The method of claim 1 , further comprising splitting a third laser beam into the main laser beam and the secondary laser beam, wherein:
reducing the power of the main laser beam and the power of the secondary laser beam comprises reducing the power of the third laser beam; and
restoring the power of the main laser beam and the power of the secondary laser beam in the controlled manner comprises restoring the power of the third laser beam in the controlled manner.
8. The method of claim 7 , wherein splitting the third laser beam comprises providing the third laser beam to a diffractive optical element that splits the third laser beam into the main laser beam and the secondary laser beam.
9. The method of claim 7 , further comprising generating the third laser beam, wherein generating the third laser beam comprises converting a portion of a fourth laser beam into the third laser beam using a harmonic generator, the third laser beam being a harmonic of the fourth laser beam.
10. The method of claim 9 , wherein:
reducing the power of the third laser beam comprises reducing the power of the fourth laser beam; and
restoring the power of the third laser beam in the controlled manner comprises restoring the power of the fourth laser beam in the controlled manner.
11. The method of claim 10 , wherein restoring the power of the fourth laser beam in the controlled manner comprises restoring the power of the fourth laser beam in a series of steps.
12. The method of claim 11 , wherein the series of steps consists of three to seven steps.
13. The method of claim 11 , wherein the series of steps comprises at least three steps.
14. The method of claim 10 , wherein restoring the power of the fourth laser beam in the controlled manner comprises ramping up the power of the fourth laser beam in a substantially smooth curve.
15. The method of claim 10 , wherein restoring the power of the fourth laser beam in the controlled manner comprises ramping up the power of the fourth laser beam in a substantially linear ramp.
16. The method of claim 10 , further comprising asserting a signal in response to detecting the particle, wherein:
reducing the power of the fourth laser beam comprises increasing radio-frequency (RF) power provided to an acousto-optic modulator (AOM) in the path of the fourth laser beam; and
restoring the power of the fourth laser beam in the controlled manner comprises reducing the RF power provided to the AOM.
17. A system, comprising:
optics to provide a main laser beam and a secondary laser beam to a semiconductor wafer, wherein the secondary laser beam is to lead the main laser beam and has lower power than the main laser beam; and
a detector to detect, using the secondary laser beam, a particle on the semiconductor wafer having a size that satisfies a threshold;
wherein the optics comprise a modulator to cause, in response to detecting the particle:
the power of the main laser beam and the power of the secondary laser beam to be reduced when the particle passes through the main laser beam, and
the power of the main laser beam and the power of the secondary laser beam to be restored in a controlled manner that is slower than a single step after the particle has passed through the main laser beam.
18. The system of claim 17 , wherein the modulator is to restore the power of the main laser beam and the power of the secondary laser beam in a series of steps.
19. The system of claim 18 , wherein the series of steps consists of three to seven steps.
20. The system of claim 18 , wherein the series of steps comprises at least three steps.
21. The system of claim 17 , wherein the modulator is to restore the power of the main laser beam and the power of the secondary laser beam by ramping up the power of the main laser beam and the power of the secondary laser beam in a substantially smooth curve.
22. The system of claim 17 , wherein the modulator is to restore the power of the main laser beam and the power of the secondary laser beam in a substantially linear ramp.
23. The system of claim 17 , wherein:
the detector is to assert a signal in response to detecting the particle; and
the system further comprises a controller to receive the signal, wherein:
in response to assertion of the signal, the controller is to cause the power of the main laser beam and the power of the secondary laser beam to be reduced when the particle passes through the main laser beam; and
the controller is to cause the power of the main laser beam and the power of the secondary laser beam to be restored in the controlled manner after the particle has passed through the main laser beam.
24. The system of claim 23 , further comprising a beam splitter to split a third laser beam into the main laser beam and the secondary laser beam, wherein:
in response to assertion of the signal, the controller is to cause the power of the third laser beam to be reduced when the particle passes through the main laser beam; and
the controller is to cause the power of the third laser beam to be restored in the controlled manner after the particle has passed through the main laser beam.
25. The system of claim 24 , wherein the beam splitter comprises a diffractive optical element.
26. The system of claim 24 , further comprising a harmonic generator to convert a portion of a fourth laser beam into the third laser beam, the third laser beam being a harmonic of the fourth laser beam, wherein:
in response to assertion of the signal, the controller is to cause the power of the fourth laser beam to be reduced when the particle passes through the main laser beam; and
the controller is to cause the power of the fourth laser beam to be restored in the controlled manner after the particle has passed through the main laser beam.
27. The system of claim 26 , wherein:
the modulator is an acousto-optic modulator (AOM);
the system further comprises a radio-frequency (RF) driver, coupled between the controller and the AOM, to provide RF power to the AOM;
in response to assertion of the signal, the controller is to cause the power of the fourth laser beam to be reduced when the particle passes through the main laser beam by causing the RF driver to increase the RF power provided to the AOM when the particle passes through the main laser beam; and
the controller is to cause the power of the fourth laser beam to be restored in the controlled manner after the particle has passed through the main laser beam by causing the RF driver to reduce the RF power provided to the AOM after the particle has passed through the main laser beam.
28. The system of claim 27 , wherein the controller is to cause the power of the fourth laser beam to be restored in a series of steps.
29. The system of claim 28 , wherein the series of steps consists of three to seven steps.
30. The system of claim 28 , wherein the series of steps comprises at least three steps.
31. The system of claim 27 , wherein the controller is to cause the power of the fourth laser beam to be restored in a substantially smooth curve.
32. The system of claim 27 , wherein the controller is to cause the power of the fourth laser beam to be restored in a substantially linear ramp.