IP Library › Granted Patent US 12,351,710
Granted Patent B2
US 12,351,710 · App. 17/140,504 · Granted Jul 8, 2025

Method for preparing polyvinyl butyral resin composition, and glass-adhesive film comprising same

Inventors: Hyejin Kim (Suwon-si, KR); Jooyoung Jung (Pyeongtaek-si, KR); Jiyeon Ryu (Suwon-si, KR); Jewon Yeon (Suwon-si, KR)
Assignee: SK microworks Co., Ltd.
C08L29/14B32B17/10036B32B17/10605B32B17/10761C08K5/092B32B2250/03B32B2250/40B32B2307/412B32B2329/06B32B2605/006B32B2605/08C08L2203/16
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 12,351,710
App. No.
17/140,504
Granted
Jul 8, 2025
Kind
B2
Abstract

The method of producing a polyvinyl butyral resin of the present disclosure enable manufacture of a film of which yellow index is low and durability is enhanced, when a film for lamination is manufactured, by advancing acetalization reaction of a polyvinyl alcohol resin and a butanal in the presence of a hydroxy butyric acid.

Claims (13)

1. A method of producing a polyvinyl butyral resin comprising:

a reaction step of reacting i) a polyvinyl alcohol resin, ii) a butanal, and iii) a hydroxy butyric acid, thereby producing a polyvinyl butyral resin composition of which butyral conversion rate is 77% or more.

2. The method of producing a polyvinyl butyral resin of claim 1 ,

wherein the reaction step comprises a preparation process of preparing a composition for reaction comprising i) the polyvinyl alcohol resin, ii) the butanal, and iii) the hydroxy butyric acid; and

an acetalization process of preparing the polyvinyl butyral resin composition by advancing acetalization reaction of the composition for reaction.

3. The method of producing a polyvinyl butyral resin of claim 2 ,

wherein the composition for reaction comprises the hydroxy butyric acid in an amount of 0.1 to 5 parts by weight based on the butanal in an amount of 10 parts by weight.

4. The method of producing a polyvinyl butyral resin of claim 2 ,

wherein the amount of residual butanal is decreased by 5 mol % or more compared to producing polyvinyl butyral resin with a composition for reaction not comprising a hydroxy butyric acid.

5. The method of producing a polyvinyl butyral resin of claim 1 ,

wherein the hydroxy butyric acid is any one selected from the group consisting of beta-hydroxy butyric acid, gamma-hydroxy butyric acid, and compositions thereof.

6. The method of producing a polyvinyl butyral resin of claim 1 , further comprising a washing step after the reaction step, and the washing step is once or more washing with a washing solution having a weight ratio of 5 to 10 with respect to the polyvinyl butyral resin,

wherein the polyvinyl butyral resin composition after the washing step comprises a hydroxy butyric acid in an amount of 0.01 wt % or less.

Assignments (3)
CHANGE OF NAME Recorded Jan 21, 2026
From: SK MICROWORKS CO., LTD.
To: MICROWORKS CO., LTD.
Reel/Frame 073532/0116 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 13, 2023
From: SKC CO., LTD.
To: SK MICROWORKS CO., LTD.
Reel/Frame 063931/0273 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 4, 2021
From: KIM, HYEJIN; JUNG, JOOYOUNG; RYU, JIYEON; YEON, JEWON
To: SKC CO., LTD.
Reel/Frame 054799/0577 →
Priority Claims (1)
KR 10-2018-0095766 · Aug 16, 2018 · national
Continuity (2)
Continuation PCTKR2019002701 · Mar 8, 2019
Related Publication 20210130599A1 · May 6, 2021
References Cited (21)
US 5384346A · Gutweiler et al. · 1995 [cited by applicant]
US 5573842A · Gutweiler · 1996 [cited by applicant]
US 8722194B2 · Asanuma et al. · 2014 [cited by applicant]
US 20030059371A1 · Matson · 2003 [cited by examiner]
US 20040157987A1 · Miyake · 2004 [cited by examiner]
US 20120244468A1 · Asai · 2012 [cited by examiner]
US 20160271911A1 · Kusudou · 2016 [cited by examiner]
US 20170334173A1 · Yui · 2017 [cited by examiner]
US 20190322855A1 · Hiura · 2019 [cited by examiner]
CN 1638959A · 2005 [cited by applicant]
CN 103467897A · 2013 [cited by applicant]
CN 107108350A · 2017 [cited by applicant]
JP 5060496B2 · 2012 [cited by applicant]
JP 5588091B2 · 2014 [cited by applicant]
JP 5926602B2 · 2016 [cited by applicant]
KR 1020080034150A · 2008 [cited by applicant]
KR 101492549B1 · 2015 [cited by applicant]
KR 1020150133817A · 2015 [cited by applicant]
KR 1020150135428A · 2015 [cited by applicant]
KR 1020160077138A · 2016 [cited by applicant]
International Search Report issued on Jul. 8, 2019 in counterpart International Patent Application No. PCT/KR2019/002701 (2 pages in English and 2 pages in Korean). [cited by applicant]