IP Library Granted Patent US 12,364,964
Granted Patent B2
US 12,364,964 · App. 18/139,881 · Granted Jul 22, 2025

System and process with assisted gas flow inside a reaction chamber

Inventors: Yan Wang (Sunnyvale, CA); Lu Yang (Fremont, CA); Liang-Yuh Chen (Saratoga, CA)
B01J19/26B01J10/00B01J19/0013C01B13/34B01J2219/00076C01P2006/40
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Quick Facts
Patent No.
US 12,364,964
App. No.
18/139,881
Granted
Jul 22, 2025
Kind
B2
Abstract

A processing system and method of producing a particulate material are provided. The processing system includes a system inlet connected to one or more gas lines to deliver one or more gases into the processing system, a buffer chamber, a dispersion chamber, a heating assembly, a reaction chamber and a system outlet for delivering particulate material out of the processing system. The method includes delivering one or more gases via a system inlet into a buffer chamber of a processing system, jetting a liquid mixture into one or more streams of droplets using one or more power jet modules into the processing system, delivering flows of one or more heated gases via a heating assembly, forming a reaction mixture and processing the reaction mixture at a reaction temperature into a product material inside the reaction chamber.

Claims (50)

1. A processing system of producing a product material, comprising:

one or more first gas lines;

a system inlet connected to the one or more first gas lines to deliver one or more first gas flows into the processing system;

one or more power jet modules adapted to jet the liquid mixture into one or more streams of droplets and to jet the one or more streams of droplets into the processing system;

a dispersion chamber adapted to be connected to the one or more power jet modules and to disperse the one or more streams of droplets with the one or more first gas flows into a gas-liquid mixture;

a reaction chamber adapted to process a reaction mixture into the product material; and

a heating assembly comprising:

a second gas line being connected to an opening of a chamber wall of the reaction chamber for delivering one or more second gas flows into the reaction chamber; and

a gas delivery element being connected to the second gas line and positioned inside the reaction chamber, wherein the gas delivery element of the heating assembly is positioned upwardly inside the reaction chamber, wherein the reaction mixture comprises:

the one or more first gas flows;

the one or more second gas flows; and

the one or more streams of droplets.

2. The processing system of claim 1 , wherein the one or more first gas flows and the one or more streams of droplets are flowed into each other at a dispersion angle (α) of between zero degree and about 180 degrees.

3. The processing system of claim 1 , wherein the gas delivery element is positioned inside the reaction chamber to reach an entry region of the reaction chamber where the entry region is connected to the dispersion chamber of the processing system.

4. The processing system of claim 1 wherein the one or more second gas flows are delivered by the gas delivery element to mix with one or more flows of the gas-liquid mixture at each other at an angle (β) of between zero degrees and about 180 degrees inside the reaction chamber.

5. The processing system of claim 4 , wherein the dispersion angle (β) is 180 degrees.

6. The processing system of claim 1 , wherein the processing system further comprises an electronic control center.

7. The processing system of claim 1 , wherein the one or more first gas flows delivered through the one or more first gas lines are maintained at a first temperature, and the one or more second gas flows delivered through the gas delivery element of the heating assembly is maintained at a second temperature, and wherein the second temperature is higher than the first temperature.

8. The processing system of claim 7 , wherein the first temperature of the one or more first gas flows is maintained between 20° C. and 400° C.

9. The processing system of claim 7 , wherein the second temperature is maintained at a temperature of between 100° C. and 1400° C.

10. A processing system of producing a product material, comprising:

one or more first gas lines;

a system inlet connected to the one or more first gas lines to deliver one or more first gas flows into the processing system;

one or more power jet modules adapted to jet the liquid mixture into one or more streams of droplets and to jet the one or more streams of droplets into the processing system;

a dispersion chamber adapted to be connected to the one or more power jet modules and to disperse the one or more streams of droplets with the one or more first gas flows into a gas-liquid mixture, wherein the one or more first gas flows and the one or more streams of droplets are flowed into each other at an dispersion angle (α) of between zero degree and about 180 degree;

a reaction chamber adapted to process a reaction mixture into the product material; and

a heating assembly comprising:

a second gas line being connected to an opening of a chamber wall of the reaction chamber for delivering one or more second gas flows into the reaction chamber; and

a gas delivery element being connected to the second gas line and positioned inside the reaction chamber, wherein the gas delivery element of the heating assembly is positioned upwardly inside the reaction chamber,

wherein the reaction mixture comprises the one or more first gas flows, the one or more second gas flows, and the one or more streams of droplets, and

wherein the one or more second gas flows are delivered by the gas delivery element to mix with one or more flows of the gas-liquid mixture at each other at an angle (β) of between zero degree and about 180 degree inside the reaction chamber.

11. The processing system of claim 10 , wherein the one or more first gas flows delivered through the one or more first gas lines are maintained at a first temperature, and the one or more second gas flows delivered through the gas delivery element of the heating assembly is maintained at a second temperature, and wherein the second temperature is higher than the first temperature.

12. The processing system of claim 11 , wherein the first temperature is maintained at a temperature of between 20° C. and 400° C.

13. The processing system of claim 11 , wherein the second temperature is maintained at a temperature of between 100° C. and 1400° C.

14. A processing system of producing a product material, comprising:

one or more first gas lines;

a system inlet connected to the one or more first gas lines to deliver one or more first gas flows into the processing system;

one or more power jet modules adapted to jet the liquid mixture into one or more streams of droplets and to jet the one or more streams of droplets into the processing system;

a dispersion chamber adapted to be connected to the one or more power jet modules and to disperse the one or more streams of droplets with the one or more first gas flows into a gas-liquid mixture;

a reaction chamber adapted to process a reaction mixture into the product material; and

a heating assembly comprising:

a second gas line being connected to an opening of a chamber wall of the reaction chamber for delivering one or more second gas flows into the reaction chamber; and

a gas delivery element being connected to the second gas line and positioned inside the reaction chamber, wherein the gas delivery element of the heating assembly is positioned upwardly inside the reaction chamber, wherein the one or more first gas flows and the one or more streams of droplets are flowed into each other at a dispersion angle (α) of between zero degree and about 180 degrees, and wherein the reaction mixture comprises:

the one or more first gas flows;

the one or more second gas flows; and

the one or more streams of droplets.

15. The processing system of claim 14 , wherein the gas delivery element is positioned at an angle between zero degree to 90 degree to a chamber body of the reaction chamber.

16. The processing system of claim 14 , wherein the gas delivery element is positioned inside the reaction chamber to reach an entry region of the reaction chamber where the entry region is connected to the dispersion chamber of the processing system.

17. The processing system of claim 16 , wherein the gas-liquid mixture and the one or more second gas flows collide with each other near the entry region inside the reaction chamber.

18. The processing system of claim 14 , wherein the one or more second gas flows are delivered by the gas delivery element to mix with one or more flows of the gas-liquid mixture at each other at an angle (β) of between zero degree and about 180 degrees inside the reaction chamber.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 8, 2025
From: WANG, YAN, DR.; YANG, LU, DR.; CHEN, LIANG-YUH, DR.
To: EJOULE, INC.
Reel/Frame 069789/0705 →
Continuity (3)
Continuation 16914458 · Jun 28, 2020
Provisional Application 62868843 · Jun 28, 2019
Related Publication 20240075451A1 · Mar 7, 2024
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