IP Library › Granted Patent US 12,382,196
Granted Patent B2
US 12,382,196 · App. 18/449,966 · Granted Aug 5, 2025

Device for detecting overflow of charges for backside illumination pixel

Inventors: François Ayel (Grenoble, FR); Olivier Saxod (Grenoble, FR)
Assignee: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES
H04N25/707G01S7/4816G01S17/894H04N25/47H04N25/77
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Quick Facts
Patent No.
US 12,382,196
App. No.
18/449,966
Granted
Aug 5, 2025
Kind
B2
Abstract

An image sensor provided with a pixel including a photosensitive region formed in a semiconductor substrate and surrounded by a peripheral isolation trench; a sense node formed on a charge collecting region; a charge transfer gate around the sense node; a well; the pixel being provided with a so-called “detection acceleration” transistor configured to, during a so-called “charge overflow detection” operation, be switched on so as to weaken a potential barrier generated by the transfer gate and thus to favour an overflow of photogenerated charges to the sense node of the photosensitive region and to accelerate detection of this overflow.

Claims (27)

1. An image sensor comprising one or more pixels, each pixel including:

a photosensitive region formed in a semiconductor substrate;

a peripheral isolation trench extending vertically in the semiconductor substrate and laterally delimiting the photosensitive region;

a sense node including a region for collecting photogenerated charges arranged at a top face of the substrate, the charge-collecting region being doped and having a first p conductivity type;

a charge-transfer gate extending vertically in the semiconductor substrate around the charge-collecting region; and

a well interposed between the peripheral isolation trench and the charge-transfer gate, and arranged around the sense node, the well being doped and having a second n conductivity type, opposite to the first conductivity type, the photosensitive region being formed by a first doped region that is of the first p conductivity type, and which extends under the charge-collecting region and under the well and forms a diode with the well,

the sensor being provided with at least one pixel integrating a detection acceleration transistor, the detection acceleration transistor having a gate arranged on said top face of the substrate and which is connected to the sense node, the detection acceleration transistor being configured to, during a charge overflow detection operation during which a biasing of the charge-transfer gate is applied so as to form a potential barrier then maintained and following an illumination of the photosensitive region during said operation causing a transfer of photogenerated charges from the photosensitive region to the sense node and a variation in potential at this sense node, be switched on, the switched-on detection acceleration transistor weakening the potential barrier and favoring a transfer of photogenerated charges to the sense node of the photosensitive region, the detection acceleration transistor including a channel region formed in a doped part of the substrate having the first conductivity type and belonging to said first region.

2. The image sensor according to claim 1 , wherein said channel region of the detection acceleration transistor extends at a top face of the semiconductor substrate between a region of said well, forming a source region of said detection acceleration transistor, and another region having the second conductivity type, and forming a drain region of said detection acceleration transistor.

3. The image sensor according to claim 2 , wherein said other region has the second conductivity type and has a doping of n+ type, greater than the doping of said region of said well.

4. The image sensor according to claim 2 , wherein an isolation block is arranged between the peripheral isolation trench and said other region having the second conductivity type.

5. The image sensor according to claim 1 , comprising a control circuit configured to apply, during said operation of detecting overflow of charges, a potential to the charge-transfer gate so as to maintain said potential barrier during said operation of detecting overflow of charges.

6. The image sensor according to claim 5 , wherein the control circuit is configured to, during said operation of detecting overflow of charges:

in a first phase, apply, to the gate of said detection acceleration transistor, a first initialisation potential so as to keep the transistor switched off, then

in a second phase, put the sense node and the gate of the detection acceleration transistor in high impedance.

7. The image sensor according to claim 6 , wherein the control circuit is configured to,

in said first phase: apply, to a source region of the detection acceleration transistor, a second initialisation potential lower than a given potential applied to a drain region of the detection acceleration transistor, then

in said second phase: put a region of said well at high impedance while maintaining said given potential on said drain region.

8. The image sensor according to claim 6 , wherein the control circuit is configured to, following said variation in potential on the sense node, reset the sense node to the first initialisation potential and said region of said well to the second initialisation potential.

9. The image sensor according to claim 5 , wherein the control circuit is provided with:

a first stage provided with at least one gate implementing a NOR logic function, comprising a first input designed to receive a signal triggering the start of a detection operation and a second input coupled to the sense node and to the detection acceleration transistor gate,

a first coupling switch controlled by the output signal of the first stage and which is designed to, when it is switched on, couple the sense node to a first initialisation potential and, when it is switched off, set the sense node to high impedance, and

a second coupling switch controlled by an output signal of the first stage and which is designed to, when it is switched on, couple the well to a second initialisation potential and, when it is switched off, to set the well to high impedance.

10. The image sensor according to claim 5 , wherein the transistor belongs to a circuit indicating charge overflow formed by an indicator stage, provided with a comparator or with a logic gate, such as a logic gate fulfilling a YES function or a NO function, configured to produce, following said variation in potential on the sense node, a signal indicating said overflow.

11. The image sensor according to claim 10 , wherein the overflow indicator circuit is associated with a counter configured to be incremented at each reception of said overflow indicator signal.

12. The image sensor according to claim 5 , wherein the pixels are arranged in a given level of a device including a plurality of superimposed levels of components and wherein the control circuit is arranged in another level of the device, distinct from said given level, said given level and said other level being superimposed.

13. A time-of-flight image capture device comprising the image sensor according to claim 1 .

14. An image capture device based on the detection of events, comprising the image sensor according to claim 1 .

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 20, 2023
From: AYEL, FRANÇOIS; SAXOD, OLIVIER
To: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES
Reel/Frame 065620/0543 →
Priority Claims (1)
FR 22 08346 · Aug 17, 2022 · national
Continuity (1)
Related Publication 20240064426A1 · Feb 22, 2024
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