IP Library › Granted Patent US 12,399,134
Granted Patent B2
US 12,399,134 · App. 18/382,046 · Granted Aug 26, 2025

Substrate inspection apparatus and substrate treatment system including the same

Inventors: Jeong Hoon Han (Gyeonggi-do, KR); Oh Yeol Kwon (Chungcheongnam-do, KR); Jun Hyun Lim (Seoul, KR); Dong Min Park (Gyeonggi-do, KR)
Assignee: SEMES C0., LTD.
G01N21/9501G01N21/8806G01N21/8851H01L22/24G01N2201/061
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Quick Facts
Patent No.
US 12,399,134
App. No.
18/382,046
Granted
Aug 26, 2025
Kind
B2
Abstract

A substrate inspection apparatus inspecting substrates using a vision system, which includes a camera module and an illumination module, and a substrate treatment system including the substrate inspection apparatus are provided. The substrate treatment system includes: a first substrate treatment apparatus; a second substrate treatment apparatus; a transfer unit transporting a container with a plurality of substrates accommodated therein from the first substrate treatment apparatus to the second substrate treatment apparatus; and a substrate inspection apparatus inspecting the substrates, wherein the substrate inspection apparatus includes an illumination module, which illuminates in a direction where the substrates are located, a camera module, which acquires images related to the substrates when the substrates are illuminated, and a control module, which inspects the substrates based on the images.

Claims (46)

1. A substrate treatment system comprising:

a first substrate treatment apparatus;

a second substrate treatment apparatus;

a transfer unit transporting a container with a plurality of substrates accommodated therein from the first substrate treatment apparatus to the second substrate treatment apparatus; and

a substrate inspection apparatus inspecting the substrates,

wherein the substrate inspection apparatus includes an illumination module, which illuminates in a direction where the substrates are located, a camera module, which acquires images related to the substrates when the substrates are illuminated, and a control module, which inspects the substrates based on the images.

2. The substrate treatment system of claim 1 , wherein the control module determines at least one of the presence, quantity, installation status, and inclination of the substrates based on a result of the inspection of the substrates.

3. The substrate treatment system of claim 2 , wherein the control module determines the presence of the substrates based on whether the substrates are positioned on a chuck within the container.

4. The substrate treatment system of claim 2 , wherein the control module determines the installation status of the substrates based on whether the substrates are inserted into their respective pairs of slot grooves within the container that face the substrates.

5. The substrate treatment system of claim 2 , wherein the control module determines the inclination of the substrates based on whether the substrates are inserted into both of their respective pairs of slot grooves within the container.

6. The substrate treatment system of claim 2 , wherein the control module determines the inclination of the substrates based on spacings between the substrates within the container.

7. The substrate treatment system of claim 2 , wherein the control module determines the inclination of the substrates based on angles of width directions of the substrates with respect to a length direction of a chuck.

8. The substrate treatment system of claim 1 , wherein the control module processes the images by extracting regions of interest (ROIs) from the images, binarizing the ROIs, classifying the binarized ROIs into binary large objects (BLOBs), and excluding all the BLOBs except for those associated with reflected light.

9. The substrate treatment system of claim 8 , wherein the control module inspects the substrates based on a number of BLOBs.

10. The substrate treatment system of claim 8 , wherein the control module inspects the substrates based on a result of calculation of long-axis lengths of the BLOBs.

11. The substrate treatment system of claim 8 , wherein the control module inspects the substrates based on a result of measurement of distances between the BLOBs.

12. The substrate treatment system of claim 1 , wherein a plurality of illumination modules are provided on either side of the camera module.

13. The substrate treatment system of claim 1 , wherein the camera module acquires the image based on reflected light from the surfaces of the plurality of substrates, which is caused by the illumination module.

14. The substance treatment system of claim 1 , wherein the substrate inspection apparatus inspects the substrates when the transfer unit transports the container.

15. The substrate treatment system of claim 1 , wherein

the first substrate treatment apparatus is batch-type equipment, and

the second substrate treatment apparatus is single-type equipment.

16. The substrate treatment system of claim 1 , wherein

the first substrate treatment apparatus is equipment that etches or rinses the substrates with a substrate treatment liquid, and

the second substrate treatment apparatus is equipment that dries the substrates using a spin-drying process or a supercritical drying process.

17. A substrate treatment system comprising:

a first substrate treatment apparatus;

a second substrate treatment apparatus;

a transfer unit transporting a container with a plurality of substrates accommodated therein from the first substrate treatment apparatus to the second substrate treatment apparatus; and

a substrate inspection apparatus inspecting the substrates,

wherein

the substrate inspection apparatus includes an illumination module, which illuminates in a direction where the substrates are located, a camera module, which acquires images related to the substrates when the substrates are illuminated, and a control module, which inspects the substrates based on the images,

the first substrate treatment apparatus is batch-type equipment,

the second substrate treatment apparatus is single-type equipment,

the substrate inspection apparatus inspects the substrates when the transfer unit transports the container, and

the control module processes the images by extracting regions of interest (ROIs) from the images, binarizing the ROIs, classifying the binarized ROIs into binary large objects (BLOBs), and excluding all the BLOBs except for those associated with reflected light, and inspects the substrates based on a number of BLOBs, which is obtained as a result of the processing of the images, a result of calculation of long-axis lengths of the BLOBs, and a result of measurement of distances between the BLOBs.

18. A substrate inspection apparatus comprising:

an illumination module illuminating in a direction where a plurality of substrates accommodated in a container are located;

a camera module acquiring images related to the substrates when the substrates are illuminated; and

a control module inspecting the substrates based on the images,

wherein

the control module inspects the substrates when the transfer unit transports the container from a first substrate treatment apparatus to a second substrate treatment apparatus,

the first substrate treatment apparatus is batch-type equipment, and

the second substrate treatment apparatus is single-type equipment.

19. The substrate inspection apparatus of claim 18 , wherein the control module determines at least one of the presence, quantity, installation status, and inclination of the substrates based on a result of the inspection of the substrates.

20. The substrate inspection apparatus of claim 18 , wherein the control module processes the images by extracting regions of interest (ROIs) from the images, binarizing the ROIs, classifying the binarized ROIs into binary large objects (BLOBs), and excluding all the BLOBs except for those associated with reflected light, and inspects the substrates based on a number of BLOBs, which is obtained as a result of the processing of the images, a result of calculation of long-axis lengths of the BLOBs, and a result of measurement of distances between the BLOBs.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 6, 2025
From: HAN, JEONG HOON; KWON, OH YEOL; LIM, JUN HYUN; PARK, DONG MIN
To: SEMES CO., LTD.
Reel/Frame 071036/0623 →
Priority Claims (1)
KR 10-2022-0141690 · Oct 28, 2022 · national
Continuity (1)
Related Publication 20240142389A1 · May 2, 2024
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Cited By (1)
US 12,740,368