RF sputtering of multiple electrodes with optimized plasma coupling through the implementation of capacitive and inductive components
An apparatus comprises a vacuum chamber configured to produce a substantially atmospheric vacuum environment for plasma processing; a radio frequency (RF) power supply located outside of the vacuum chamber; an RF matching network operatively coupled to the RF power supply; and a plurality of electrodes mounted within the vacuum chamber, the plurality of electrodes configured to receive RF power signals from the RF power supply through the RF matching network. The RF power signals are simultaneously delivered to the plurality of electrodes during a sputtering operation. The plurality of electrodes and a set of electrical components are operative to manage the inductive and capacitive reactance for coupling the RF power signals to provide more desirable plasma coupling during the sputtering operation.
1. An apparatus, comprising:
a vacuum chamber configured to produce a substantially atmospheric vacuum environment for plasma processing;
a radio frequency (RF) power supply located outside of the vacuum chamber;
an RF matching network operatively coupled to the RF power supply; and
a plurality of magnetrons mounted within the vacuum chamber, the plurality of magnetrons configured to receive RF power signals from the RF power supply through the RF matching network;
wherein the RF power signals are simultaneously delivered to the plurality of magnetrons during a sputtering operation;
wherein the plurality of magnetrons and a set of electrical components are operative to manage inductive and capacitive reactance for coupling the RF power signals to provide more desirable plasma coupling during the sputtering operation.
2. The apparatus of claim 1 , wherein the plurality of magnetrons each comprise a rotary magnetron assembly that includes a rotatable target cylinder that houses a magnetron.
3. The apparatus of claim 1 , wherein the plurality of magnetrons each comprise a planar magnetron assembly.
4. The apparatus of claim 1 , wherein the plurality of magnetrons comprise a first rotary magnetron assembly and a second rotary magnetron assembly, mounted in series within the vacuum chamber.
5. The apparatus of claim 4 , wherein:
the first rotary magnetron assembly includes a first coupling end and an opposing second coupling end; and
the second rotary magnetron assembly includes a first coupling end and an opposing second coupling end.
6. The apparatus of claim 5 , further comprising:
a first coupling device in electrical communication with the first coupling end of the first rotary magnetron assembly;
a second coupling device in electrical communication with the second coupling end of the first rotary magnetron assembly;
a third coupling device in electrical communication with the first coupling end of the second rotary magnetron assembly; and
a fourth coupling device in electrical communication with the second coupling end of the second rotary magnetron assembly.
7. The apparatus of claim 6 , wherein:
the first coupling device comprises a first end-block, and
the second coupling device comprises a second end-block;
wherein the first and second coupling ends of the first rotary magnetron assembly are respectively connected to the first and second end-blocks, through respective vacuum seal arrangements.
8. The apparatus of claim 7 , wherein:
the third coupling device comprises a third end-block, and
the fourth coupling device comprises a fourth end-block;
wherein the first and second coupling ends of the second rotary magnetron assembly are respectively connected to the third and fourth end-blocks, through respective vacuum seal arrangements.
9. The apparatus of claim 8 , wherein the RF matching network is operatively coupled to the first rotary magnetron assembly through the first end-block to provide the RF power signals to the first rotary magnetron assembly.
10. The apparatus of claim 9 , further comprising a first electrical component coupled between the second end-block and the fourth end-block, such that the RF power signals are simultaneously delivered to the second rotary magnetron assembly.
11. The apparatus of claim 10 , further comprising a second electrical component coupled between the third end-block and a ground connection within the vacuum chamber.
12. The apparatus of claim 1 , further comprising a set of low frequency or direct current (DC) power supplies, located outside of the vacuum chamber, and respectively coupled to each of the plurality of magnetrons.
13. The apparatus of claim 12 , further comprising a set of filters respectively coupled to outputs of the set of low frequency or DC power supplies.
14. An apparatus, comprising:
a vacuum chamber configured to produce a substantially atmospheric vacuum environment for plasma processing;
a radio frequency (RF) power supply located outside of the vacuum chamber;
an RF matching network operatively coupled to the RF power supply;
a set of low frequency or direct current (DC) power supplies located outside of the vacuum chamber; and
a plurality of magnetron electrodes rotatably mounted within the vacuum chamber, the plurality of magnetron electrodes configured to receive RF power signals from the RF power supply through the RF matching network, and low frequency or DC power signals through the low frequency or DC power supplies;
wherein the RF power signals, and the low frequency or DC power signals, are simultaneously delivered to the plurality of magnetron electrodes during a sputtering operation;
wherein for coupling the RF power signals, and the low frequency or DC power signals, the plurality of magnetron electrodes and a set of electrical components are operative to manage inductive and capacitive reactance for coupling the RF power signals to provide optimized plasma coupling during the sputtering operation.
15. The apparatus of claim 14 , wherein the plurality of magnetron electrodes comprise a first rotary magnetron assembly and a second rotary magnetron assembly, mounted in series within the vacuum chamber.
16. The apparatus of claim 15 , wherein:
the first rotary magnetron assembly includes a first coupling end and an opposing second coupling end; and
the second rotary magnetron assembly includes a first coupling end and an opposing second coupling end.
17. The apparatus of claim 16 , further comprising:
a first coupling device in electrical communication with the first coupling end of the first rotary magnetron assembly;
a second coupling device in electrical communication with the second coupling end of the first rotary magnetron assembly;
a third coupling device in electrical communication with the first coupling end of the second rotary magnetron assembly; and
a fourth coupling device in electrical communication with the second coupling end of the second rotary magnetron assembly.
18. The apparatus of claim 17 , wherein the RF matching network is operatively coupled to the first rotary magnetron assembly through the first coupling device to provide the RF power signals to the first rotary magnetron assembly.
19. The apparatus of claim 18 , wherein the low frequency or DC power supplies comprise:
a first low frequency or DC power supply in operative communication with the first rotary magnetron assembly through the second coupling device; and
a second low frequency or DC power supply in operative communication with the second rotary magnetron assembly through the fourth coupling device.
20. The apparatus of claim 19 , further comprising:
a first lowpass filter coupled to an output of the first low frequency or DC power supply; and
a second lowpass filter coupled to an output of the second low frequency or DC power supply.