Ultrathin silicon oxynitride interface material, tunnel oxide passivated structure and preparation methods and applications thereof
An ultrathin silicon oxynitride interface material, a tunnel oxide passivated structure and preparation methods and applications thereof are provided. The ultrathin silicon oxynitride interface material is an SiON film with a thickness of 1 nm to 4 nm, and the percentage content of N atoms is 1% to 40%. Compared with silicon oxide, the diffusion rate of boron in the SiON film of the present disclosure is low, which effectively reduces the damaging effect of boron, improves the integrity of the SiON film and maintains the chemical passivation effect. The SiON film with high nitrogen concentration can noticeably lower the concentration of boron on the silicon surface so as to lessen the boron-induced defects. Furthermore, the SiON film has an energy band structure approximate to silicon nitride, which increases the hole transport efficiency and hole selectivity, and further improves the passivation quality and reduces the contact resistivity.
1. A preparation method of an ultrathin silicon oxynitride interface material,
wherein the ultrathin silicon oxynitride interface material is a single SiON film with a thickness of 1 nm to 4 nm, and a percentage content of N atoms in the single SiON film ranges from 1% to 40%;
wherein the preparation method comprises:
step S1, growing a layer of an SiO 2 film on a silicon wafer by an ion-free bombardment oxidation method;
step S2, performing a surface nitriding treatment on the SiO 2 film in a plasma enhanced chemical vapor deposition (PECVD) with a nitrogen-containing gas and an oxygen-containing gas filled treatment atmosphere to convert the SiO 2 film to the single SiON film.
2. The preparation method of the ultrathin silicon oxynitride interface material according to claim 1 , wherein in the step S2, the nitrogen-containing gas is NH 3 , and the oxygen-containing gas is N 2 O.
3. The preparation method of the ultrathin silicon oxynitride interface material according to claim 1 , wherein in the step 2, a flow ratio of the nitrogen-containing gas to the oxygen-containing gas ranges from 2:1 to 8:1.
4. The preparation method of the ultrathin silicon oxynitride interface material according to claim 1 , wherein in the step S1, the ion-free bombardment oxidation method is an ozone oxidation method or a nitric acid oxidation method.
5. An ultrathin silicon oxynitride interface material prepared by the preparation method according to claim 1 .
6. A preparation method of a tunnel oxide passivated structure,
wherein the tunnel oxide passivated structure comprises:
a silicon wafer;
a doped polycrystalline silicon layer; and
a passivation tunneling layer, wherein the passivation tunneling layer is located between the silicon wafer and the doped polycrystalline silicon layer, a material of the passivation tunneling layer is a single SiON film with a thickness of 1 nm to 4 nm, and a percentage content of N atoms in the single SiON film ranges from 1% to 40%;
wherein the preparation method comprises:
step S1, growing a layer of an SiO 2 film on the silicon wafer by an ion-free bombardment oxidation method;
step S2, performing a surface nitriding treatment on the SiO 2 film in a PECVD method with a nitrogen-containing gas and an oxygen-containing gas filled treatment atmosphere to convert the SiO 2 film to the single SiON film;
step S3, depositing a boron-doped amorphous silicon film on the single SiON film by the PECVD method;
step S4, performing an annealing treatment to obtain the tunnel oxide passivated structure.
7. The preparation method of the tunnel oxide passivated structure according to claim 6 , wherein in the step S4, an annealing temperature ranges from 820° C. to 1100° C.
8. A tunnel oxide passivated structure prepared by the preparation method according to claim 6 , wherein the tunnel oxide passivated structure is applied to N-type or P-type tunnel oxide passivated contact solar cells.