Semiconductor DRAM device structure and method for forming same
The embodiments of the disclosure provide a semiconductor structure and a method for forming the same. The method includes that: a substrate is provided; bit line contact holes arranged at intervals, a bit line contact in partial contact with the bit line contact hole and a bit line structure are formed on the substrate; a first insulating layer is formed on surfaces of the substrate, the bit line contact hole, the bit line contact and the bit line structure, the first insulating layer not completely filling the bit line contact holes; a second insulating layer is formed on a surface of the first insulating layer located on the surface of the bit line contact and part of the surface of the bit line structure; and a third insulating layer covering the first insulating layer and the second insulating layer is formed.
1. A method for forming a semiconductor structure, comprising:
providing a substrate;
forming bit line contact holes arranged at intervals, a bit line contact in partial contact with the bit line contact hole and a bit line structure on the substrate;
forming a first insulating layer on a surface of the substrate, a surface of the bit line contact hole, a surface of the bit line contact, and a surface of the bit line structure, wherein the first insulating layer does not completely fill the bit line contact hole;
forming a second insulating layer on a surface of the first insulating layer located on the surface of the bit line contact and part of the surface of the bit line structure; and
forming a third insulating layer covering the first insulating layer and the second insulating layer;
forming a storage node contact between adjacent third insulating layers; and
etching part of the bit line structure, part of the first insulating layer, part of the second insulating layer and part of the third insulating layer, to enable remaining part of the first insulating layer, remaining part of the second insulating layer and remaining part of the third insulating layer to form an insulating layer;
forming a metal layer on surfaces of the insulating layer and the storage node contact; and
etching part of the metal layer to expose part of the insulating layer, and to enable remaining part of the metal layer to form a landing pad in electrical connection with the storage node contact;
etching the exposed part of the insulating layer along a first direction, wherein an etching stop location is higher than the storage node contact, so as to form an opening, wherein the first direction is a direction in which the bit line structure points towards the bit line contact;
etching the remaining part of the second insulating layer to form a first air gap and a second air gap connected with the opening; and
forming an isolation structure in the opening in the second air gap and on the surface of the landing pad.
2. The method of claim 1 , further comprising:
forming an isolation structure between adjacent landing pads and on surfaces of the landing pads.
3. The method of claim 1 , wherein the isolation structure comprises a first filling layer and a second filling layer, wherein the formation of the isolation structure in the opening in the second air gap and on the surface of the landing pad comprises:
depositing the first filling layer at a sidewall of the opening, at an interface of the opening connected with the second air gap, and on the surface of the landing pad, wherein the first filling layer seals the opening of the second air gap to make the second air gap sealed; and
depositing the second filling layer on a surface of the first filling layer.
4. The method of claim 1 , before forming the storage node contact between adjacent third insulating layers, further comprising:
forming a fourth insulating layer on a surface of the third insulating layer; and
etching the fourth insulating layer, the third insulating layer located on the surface of the substrate and part of the substrate to expose the substrate.
5. The method of claim 1 , wherein the formation of the second insulating layer on the surface of the first insulating layer located on the surface of the bit line contact and the surface of the bit line structure comprises:
forming an initial second insulating layer on the surface of the first insulating layer; and
etching the initial second insulating layer on the surface of the first insulating layer and a top surface of the bit line structure located on the substrate, to enable remaining part of the initial second insulating layer located on the surface of the bit line contact and the part of the surface of the bit line structure to form the second insulating layer.
6. The method of claim 1 , wherein the bit line structure at least comprises a diffusion barrier layer, a conductive layer, and an insulating capping layer, wherein the diffusion barrier layer is located between the bit line contact and the conductive layer, and the insulating capping layer is located on the conductive layer.
7. The method of claim 6 , wherein the etching part of the bit line structure comprises:
etching part of the insulating capping layer.
8. The method of claim 1 , wherein a material of the first insulating layer comprises a nitride, a material of the second insulating layer comprising an oxide, and a material of the third insulating layer is same as the material of the first insulating layer.
9. The method of claim 4 , wherein a material of the fourth insulating layer is same as a material of the third insulating layer.