Granted Patent B2

US 12,443,066 · App. 18/924,816 · Granted Oct 14, 2025

Inventors: Sangyong Woo (Paju-si, KR); Hyunji Son (Paju-si, KR); Sooyoung Choi (Paju-si, KR); Hyejung Jin (Paju-si, KR); Dahee Lee (Paju-si, KR)

Assignee: LG Display Co., Ltd.

G02F1/13338G02F1/13439G02F1/136209G02F1/136295G06F3/0412G06F3/0445H10D30/6723H10D86/0231H10D86/441H10D86/60G02F1/133345G02F1/1368G02F2201/121G06F2203/04103

Abstract

Claims (21)

1. A manufacturing method of a display device, the manufacturing method comprising:

forming a light blocking layer on a substrate using a first mask, the substrate including an opening area and a non-opening area that surrounds the opening area;

forming an active layer on the light blocking layer using a second mask;

forming a gate line that extends in a row direction in the non-opening area using a third mask;

forming an interlayer-insulating layer that covers the gate line;

forming a first contact hole that exposes one region of the active layer using a fourth mask;

forming a data line that extends in a column direction that is perpendicular to the row direction in the non-opening area and a touch sensing line that extends in the column direction across the opening area using a fifth mask, the data line applying a data signal of an image;

forming a pixel electrode in the opening area using a sixth mask; forming a thin film transistor including a source electrode that is connected to the data line and a drain electrode that is connected to the pixel electrode; and wherein the opening area has a shape in which a length of the opening area in the row direction is longer than a length of the opening area in the column direction, wherein the touch sensing line is formed on a same layer as the data line, the source electrode, and the drain electrode with the data line located between the source electrode and the drain electrode on the same layer in at least one region, and the touch sensing line is non-overlapping with the data line.

2. The manufacturing method of the display device of claim 1 , wherein forming the gate line includes forming a gate electrode of a transistor that overlaps a channel region of the active layer, and

wherein forming the data line and the touch sensing line includes forming a drain electrode and a source electrode of the transistor that overlap the first contact hole.

3. The manufacturing method of the display device of claim 2 further including:

forming a passivation layer that covers the pixel electrode;

forming a second contact hole exposing one region of the drain electrode using a seventh mask; and

forming a common electrode having at least one region overlapping the pixel electrode using an eighth mask, the common electrode connected to the drain electrode through the second contact hole.

4. The manufacturing method of the display device of claim 3 , wherein the pixel electrode has a rectangular shape in which a length of the pixel electrode in the row direction is longer than a length of the pixel electrode in the column direction.

5. The manufacturing method of the display device of claim 3 , wherein the common electrode is formed by patterning to include:

a plurality of branch portions that extend in the row direction in the opening area, the plurality of branch portions disposed in the column direction at equal intervals such that a distance between each pair of adjacent branch portions from the plurality of branch portions is a same; and

a stem portion connecting together the plurality of branch portions, the stem portion extending in the column direction.

6. The manufacturing method of the display device of claim 3 , further including

forming a color filter in the opening area; and

forming a black matrix around the color filter and overlapping the touch sensing line.

Assignments (1)

Priority Claims (1)

Continuity (2)

References Cited (34)