IP Library › Granted Patent US 12,473,205
Granted Patent B2
US 12,473,205 · App. 17/636,474 · Granted Nov 18, 2025

Beryllium solution production method, beryllium production method, beryllium hydroxide production method, beryllium oxide production method, solution production device, beryllium production system, and beryllium

Inventors: Masaru Nakamichi (Chiba, JP); Jaehwan Kim (Chiba, JP); Yoshiaki Akatsu (Chiba, JP); Suguru Nakano (Chiba, JP)
Assignee: NATIONAL INSTITUTES FOR QUANTUM SCIENCE AND TECHNOLOGY
C01F3/00C01F3/02C22B35/00C25C3/02
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Quick Facts
Patent No.
US 12,473,205
App. No.
17/636,474
Granted
Nov 18, 2025
Kind
B2
Abstract

This invention has an object to provide a method for producing a beryllium solution, the method being novel and having high energy efficiency. The method (M 10 ) for producing a beryllium solution includes a main heating step (S 13 ) of dielectrically heating an acidic solution containing a starting material so as to generate a beryllium solution, the starting material being beryllium or a substance containing beryllium.

Claims (28)

1 . A method for producing a beryllium solution, comprising:

a main heating step of dielectrically heating an acidic solution containing a starting material so as to produce a beryllium solution, the starting material being at least one of beryllium, an intermetallic compound containing beryllium, beryllium having a surface on which an oxidized layer is formed, and an intermetallic compound having a surface on which an oxidized layer is formed and containing beryllium, wherein the method further comprises:

a pre-heating step of dielectrically heating a basic solution containing the starting material, the pre-heating step being carried out before the main heating step.

2 . The method as set forth in claim 1 , further comprising:

a first impurity removing step of removing, with use of an organic compound that adsorbs a first element, the first element from the beryllium solution obtained through the main heating step, the first impurity removing step being carried out after the main heating step.

3 . The method as set forth in claim 2 , wherein

in the first impurity removing step,

the organic compound is dissolved in an organic solvent, and

the beryllium solution is acidic.

4 . The method as set forth in claim 1 , further comprising:

a second impurity removing step of adjusting a polarity of the beryllium solution from acidity to basicity so as to remove a second element from the beryllium solution, the beryllium solution having been obtained through the main heating step, the second impurity removing step being carried out after the main heating step.

5 . The method as set forth in claim 1 , wherein

the main heating step dielectrically heats the acidic solution containing the starting material by applying a microwave to the acidic solution.

6 . The method as set forth in claim 1 , wherein

the beryllium solution is a beryllium chloride solution.

7 . A method for producing beryllium hydroxide, comprising:

each step included in the method recited in claim 1 ; and

a neutralizing step of neutralizing, with a base, the beryllium solution so as to generate beryllium hydroxide.

8 . A method for producing beryllium oxide, comprising:

each step included in the method recited in claim 1 ; and

a third heating step of heating the beryllium solution so as to generate beryllium oxide.

9 . A method for producing beryllium, comprising:

each step included in the method recited in claim 1 ;

an anhydrization step of carrying out anhydrization of the beryllium solution so as to generate beryllium salt; and

an electrolyzing step of carrying out molten salt electrolysis of the beryllium salt so as to generate beryllium.

10 . The method as set forth in claim 9 , wherein

the beryllium solution is a beryllium chloride solution, and

the anhydrization step heats beryllium chloride hydrate contained in the beryllium chloride solution in a vacuum at a temperature of not lower than 80° C. and not higher than 110° C.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 2, 2022
From: NAKAMICHI, MASARU; KIM, JAEHWAN; AKATSU, YOSHIAKI; NAKANO, SUGURU
To: NATIONAL INSTITUTES FOR QUANTUM SCIENCE AND TECHNOLOGY
Reel/Frame 059306/0011 →
Priority Claims (1)
JP 2019-158618 · Aug 30, 2019 · national
Continuity (1)
Related Publication 20220315438A1 · Oct 6, 2022
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Cited By (1)
US 12,683,050