Electronic device and method of fabricating an electronic device
An electronic device including a connection element is provided. The connection element includes a first insulation layer and a second insulation layer. The first insulation layer has a first opening. A sidewall of the first insulation layer at the first opening has roughness different from roughness of a top surface of the first insulation layer. The second insulation layer is disposed on the first insulation layer, and the second insulation layer has a second opening. The sidewall of the first insulation layer at the first opening is exposed by the second opening. A method of fabricating an electronic device is also provided.
1 . A method of fabricating an independent electronic device from an electronic device having a plurality of element areas and a plurality of non-element areas, the plurality of non-element areas includes scribe lines, the method comprising:
providing a panel level glass substrate;
forming a first metal layer only on the plurality of element areas of the panel level glass substrate;
forming a first insulation layer on the panel level glass substrate of both the plurality of element areas and the plurality of non-element areas;
patterning the first insulation layer to form a first opening in the plurality of non-element areas;
forming a second insulation layer on the first insulation layer, wherein the second insulation layer extends to the first opening, and in a cross-sectional view, a width of a lower bottom of the first opening is less than a width of an upper bottom of the first opening; and
patterning the second insulation layer to form a second opening corresponding to the first opening,
wherein the second opening exposes a portion of a surface of the first insulation layer, the first opening and the second opening expose the panel level glass substrate, a width of a lower bottom of the second opening is less than a width of an upper bottom of the second opening and the width of the lower bottom of the second opening is greater than the width of the upper bottom of the first opening; and
cutting the electronic device along the scribe lines to form the independent electronic device.
2 . The method of fabricating the electronic device according to claim 1 , wherein a method of patterning the first insulation layer comprises laser drilling.
3 . The method of fabricating the electronic device according to claim 1 , wherein the first insulation layer covers the first metal layer.
4 . The method of fabricating the electronic device according to claim 3 , wherein a method of patterning the first insulation layer further comprises forming a hole, wherein the first metal layer is exposed by the hole.
5 . The method of fabricating the electronic device according to claim 1 , wherein a method of patterning the first insulation layer to form a hole and the first opening comprises laser drilling.
6 . A method of fabricating an independent electronic device from an electronic device having a plurality of element areas and a plurality of non-element areas, the plurality of non-element areas includes scribe lines, the method comprising:
providing a panel level glass substrate;
providing a plurality of semiconductor chips only on the panel level glass substrate in the plurality of element areas;
forming a first insulation layer on the panel level glass substrate and surrounding the plurality of semiconductor chips;
patterning the first insulation layer to form a first opening in the plurality of non-element areas;
forming a second insulation layer on the first insulation layer;
patterning the second insulation layer to form a second opening corresponding to the first opening, wherein, in a cross-sectional view, the second opening exposes a portion of a surface of the first insulation layer, a width of a lower bottom of the first opening is less than a width of an upper bottom of the first opening, and the width of the upper bottom of the first opening is less than a width of a lower bottom of the second opening; and
cutting the electronic device along the scribe lines to form the independent electronic device,
wherein the first opening and the second opening expose the panel level glass substrate, and the first opening and the second opening do not overlap the plurality of the semiconductor chips.
7 . The method of fabricating the electronic device according to claim 6 , wherein a method of patterning the first insulation layer and a method of patterning the second insulation layer comprise laser drilling.
8 . The method of fabricating the electronic device according to claim 6 , wherein a first metal layer is further formed on the panel level glass substrate, and the first insulation layer covers the first metal layer.
9 . The method of fabricating the electronic device according to claim 8 , wherein a method of patterning the first insulation layer further comprises forming a hole, wherein the first metal layer is exposed by the hole, and a method of forming the hole and a method of forming the first opening comprise laser drilling.