Substrate cleaning apparatus, polishing apparatus, buffing apparatus, substrate cleaning method, substrate processing apparatus, and machine learning apparatus
The invention relates to a substrate cleaning apparatus, a polishing apparatus, a buffing apparatus, a substrate processing apparatus, a machine learning apparatus used for any of these apparatuses, and a substrate cleaning method, with improved performance and throughput. The substrate cleaning apparatus includes: a cleaning tool configured to clean a substrate held by a substrate holder; a surface-property measuring device configured to obtain surface data of the cleaning tool; and a controller configured to determine a replacement time of the cleaning tool based on the surface data. The surface-property measuring device is configured to obtain surface data of the cleaning tool at at least two measurement points of the cleaning tool each time a predetermined number of substrates are scrubbed, and the controller is configured to determine the replacement time of the cleaning tool based on a difference in the surface data obtained.
1 . A substrate cleaning apparatus comprising:
a substrate holder configured to hold and rotate a substrate;
a cleaning tool configured to clean the substrate by rubbing the rotating substrate in a presence of a cleaning liquid;
a surface-property measuring device configured to obtain surface data in a non-contact manner, the surface data being indicative of a surface property which corresponds to a degree of deterioration and a degree of contamination of the cleaning tool; and
a controller coupled to the surface-property measuring device and configured to determine a replacement time of the cleaning tool based on the surface data,
wherein the surface-property measuring device is configured to obtain surface data of the cleaning tool at at least two measurement points of the cleaning tool each time a predetermined number of substrates are scrubbed, and
the controller is configured to determine the replacement time of the cleaning tool based on a comparison between a difference in the surface data obtained at the at least two measurement points and a predetermined threshold value for the difference in the surface data stored in advance.
2 . The substrate cleaning apparatus according to claim 1 , wherein the controller is configured to determine that the cleaning tool has reached the replacement time when the difference has reached the predetermined threshold value.
3 . The substrate cleaning apparatus according to claim 1 , wherein the surface-property measuring device includes an imaging device configured to obtain the surface data and a camera-moving mechanism configured to move the imaging device.
4 . The substrate cleaning apparatus according to claim 1 , further comprising a cleaning-tool moving unit configured to move the cleaning tool between a cleaning position where the cleaning tool contacts a surface of the substrate and a retreat position where the cleaning tool is away from the surface of the substrate,
wherein the surface-property measuring device is configured to obtain the surface data of the cleaning tool that has been moved to the retreat position.
5 . The substrate cleaning apparatus according to claim 1 , wherein the controller is configured to perform a break-in check operation after replacement of the cleaning tool with a new cleaning tool,
wherein the break-in check operation includes:
obtaining surface data of the new cleaning tool at at least two measurement points of the new cleaning tool using the surface-property measuring device, each time a predetermined number of dummy substrates are scrubbed with the new cleaning tool; and
determining completion of break-in of the new cleaning tool based on a comparison between a difference in the surface data obtained at the at least two measurement points and a predetermined threshold value for the difference in the surface data stored in advance in the controller.
6 . The substrate cleaning apparatus according to claim 1 , wherein the surface data is one of bipolar image data, spectrum pattern of infrared absorption spectrum, strain image data, three-dimensional image data, spectral image data, hyperspectral image data, and polarization image data.
7 . The substrate cleaning apparatus according to claim 6 , wherein the surface data is a graph of spectral intensity converted from the hyperspectral image data, and the controller is configured to determine that the cleaning tool has reached the replacement time when a difference in the spectral intensity at a predetermined wavelength is larger than a predetermined threshold value.
8 . The substrate cleaning apparatus according to claim 7 , wherein the controller is configured to further determine that the cleaning tool has reached the replacement time when an amount of change in a slope of a tangential line at an inflection point of the graph of the spectral intensity is equal to or less than a predetermined threshold value.