IP Library › Granted Patent US 12,505,871
Granted Patent B2
US 12,505,871 · App. 18/518,736 · Granted Dec 23, 2025

Memory cell and method of operating the same

Inventors: Bo-Feng Young (Hsinchu, TW); Sai-Hooi Yeong (Hsinchu, TW); Chao-I Wu (Hsinchu, TW); Chih-Yu Chang (Hsinchu, TW); Yu-Ming Lin (Hsinchu, TW)
Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
G11C11/223G11C11/2273G11C11/2275H10B51/30
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 12,505,871
App. No.
18/518,736
Granted
Dec 23, 2025
Kind
B2
Abstract

A memory cell includes a read word line extending in a first direction, a write transistor, and a read transistor coupled to the write transistor. The read transistor includes a ferroelectric layer, a drain terminal of the read transistor directly connected to the read word line, and a source terminal of the read transistor coupled to a first node. The write transistor is configured to adjust a polarization state of the read transistor, the polarization state corresponding to a stored data value of the memory cell.

Claims (68)

1 . A memory cell, comprising:

a read word line extending in a first direction;

a write transistor

a read transistor coupled to the write transistor, the read transistor comprising:

a ferroelectric layer;

a drain terminal of the read transistor directly connected to the read word line; and

a source terminal of the read transistor coupled to a first node;

wherein the write transistor is configured to adjust a polarization state of the read transistor, the polarization state corresponding to a stored data value of the memory cell, and during a read operation of the memory cell, adjusting a voltage of the read word line from a first read voltage to a second read voltage different from the first read voltage.

2 . The memory cell of claim 1 , wherein the ferroelectric layer includes a ferroelectric material including HfO 2 , HfZrO, HfO or combinations thereof.

3 . The memory cell of claim 1 , wherein the write transistor comprises:

a drain terminal of the write transistor coupled to a write bit line;

a source terminal of the write transistor coupled to the read transistor; and

a gate terminal of the write transistor coupled to a write word line.

4 . The memory cell of claim 3 , wherein the read transistor further comprises:

a gate terminal of the read transistor coupled to the source terminal of the write transistor, and the gate terminal of the read transistor is on a surface of the ferroelectric layer.

5 . The memory cell of claim 4 , further comprising:

a read bit line;

a first transistor coupled between the read bit line and the read transistor, the first transistor comprising:

a drain terminal of the first transistor coupled to the source terminal of the read transistor by the first node;

a source terminal of the first transistor coupled to the read bit line; and

a gate terminal of the first transistor.

6 . The memory cell of claim 5 , wherein the gate terminal of the first transistor is configured to receive a control signal.

7 . The memory cell of claim 4 , further comprising:

a read bit line,

wherein the source terminal of the read transistor is directly connected to the read bit line by a second node.

8 . A memory cell, comprising:

a write word line extending in a first direction, and configured to supply a write word line signal;

a read word line extending in the first direction, and being separated from the write word line in a second direction different from the first direction;

a write transistor of a first transistor type, coupled to the write word line, the write transistor configured to be enabled or disabled in response to the write word line signal; and

a read transistor of the first transistor type coupled to the write transistor, the read transistor comprising:

a drain terminal of the read transistor is directly connected to the read word line;

a gate terminal of the read transistor coupled to the write transistor; and

a ferroelectric layer having a polarization state that corresponds to a stored data value in the memory cell;

wherein the write transistor is configured to adjust the polarization state of the ferroelectric layer, and during a read operation of the memory cell, adjusting a voltage of the read word line from a first read voltage to a second read voltage different from the first read voltage.

9 . The memory cell of claim 8 , wherein the ferroelectric layer includes a ferroelectric material including HfO 2 , HfZrO, HfO or combinations thereof.

10 . The memory cell of claim 8 , wherein the read transistor further comprises:

a channel region;

a gate insulating layer above the channel region; and

a gate layer above the ferroelectric layer,

wherein the ferroelectric layer is between the gate insulating layer and the gate layer.

11 . The memory cell of claim 8 , wherein

the write transistor includes a first oxide channel region; and

the read transistor includes a second oxide channel region.

12 . The memory cell of claim 8 , wherein

the write transistor includes an oxide channel region; and

the read transistor includes a silicon channel region.

13 . The memory cell of claim 8 , wherein the read transistor further comprises:

a source terminal of the read transistor coupled to a first node.

14 . The memory cell of claim 13 , further comprising:

a read bit line; and

a first transistor of the first transistor type, the first transistor being coupled between the read transistor and the read bit line, the first transistor comprising:

a drain terminal of the first transistor coupled to the source terminal of the read transistor by the first node;

a source terminal of the first transistor coupled to the read bit line; and

a gate terminal of the first transistor configured to receive a control signal.

15 . The memory cell of claim 13 , further comprising:

a read bit line,

wherein the source terminal of the read transistor is coupled to the read bit line by the first node.

16 . A method of operating a memory cell, the method comprising:

performing a read operation of the memory cell, the performing the read operation of the memory cell comprising:

pre-discharging a voltage of a read bit line to a first voltage or pre-charging the voltage of the read bit line to a second voltage different from the first voltage;

adjusting a voltage of a read word line from a third voltage to a fourth voltage, the read word line being directly connected to a drain of a read transistor; and

sensing the voltage of the read bit line in response to adjusting the voltage of the read word line from the third voltage to the fourth voltage thereby outputting a stored data value in the memory cell.

17 . The method of claim 16 , further comprising:

performing a write operation of the memory cell.

18 . The method of claim 16 , wherein the stored data value of the memory cell has a first logical value corresponding to a first resistance state of the read transistor, or a second logical value corresponding to a second resistance state of the read transistor, the second logical value being opposite of the first logical value, the second resistance state being opposite of the first resistance state.

19 . The method of claim 16 , wherein the third voltage is a voltage of a logically high signal, and the fourth voltage is a voltage of a logically low signal.

20 . The method of claim 16 , wherein adjusting the voltage of the read word line from the third voltage to the fourth voltage comprises:

turning on a first transistor in response to a first control signal or the voltage of the read word line being the fourth voltage thereby electrically coupling the read bit line to a source of the read transistor.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 24, 2023
From: YOUNG, BO-FENG; YEONG, SAI-HOOI; WU, CHAO-I; CHANG, CHIH-YU; LIN, YU-MING
To: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
Reel/Frame 065655/0262 →
Continuity (4)
Continuation 18156593 · Jan 19, 2023
Continuation 17196131 · Mar 9, 2021
Provisional Application 63031851 · May 29, 2020
Related Publication 20240096388A1 · Mar 21, 2024
References Cited (23)
US 5689456A · Kobayashi · 1997 [cited by applicant]
US 11568912B2 · Young · 2023 [cited by examiner]
US 11862219B2 · Young · 2024 [cited by examiner]
US 20040129987A1 · Uchiyama et al. · 2004 [cited by applicant]
US 20080037349A1 · Stiple · 2008 [cited by applicant]
US 20120314476A1 · Appenzeller · 2012 [cited by examiner]
US 20180366476A1 · Liu · 2018 [cited by examiner]
US 20190371802A1 · Morris et al. · 2019 [cited by applicant]
US 20200357453A1 · Slesazeck et al. · 2020 [cited by applicant]
US 20210036024A1 · Kim et al. · 2021 [cited by applicant]
US 20210210496A1 · Chia et al. · 2021 [cited by applicant]
US 20220173251A1 · Samachisa et al. · 2022 [cited by applicant]
CN 110415744 · 2021 [cited by applicant]
EP 3506265 · 2019 [cited by applicant]
KR 20180013861 · 2018 [cited by applicant]
KR 1020180109902 · 2018 [cited by applicant]
WO 2016190880 · 2016 [cited by applicant]
WO WO2016190880A1 · 2016 [cited by examiner]
Teman, Adam, et al. “Review and classification of gain cell eDRAM implementations.” 2012 IEEE 27th Convention of Electrical and Electronics Engineers in Israel. IEEE, 2012. [cited by applicant]
COffice Action dated Apr. 14, 2022 for corresponding case No. KR 10-2021-0054323. (pp. 1-5). [cited by applicant]
Juejian Wu et al., Adaptive circuit approaches to low-power multi-level/cell FeFET Memory, 2020 IEEE, KIPO, Downloaded on Oct. 6, 2022 from IEEE Xplore, pp. 407-413. [cited by applicant]
Amit Kazimirsky et al., Opportunist refreshing algorithm for eDRAM memories, IEEE Transactions on Circuits and Systems—1:Regular Papers, vol. 63, No. 11, Nov. 16, pp. 1921-1932. [cited by applicant]
Review and Classification of Gain Cell eDRAM Implementations, Teman et al., all pages (Year: 2012). [cited by applicant]