Integrated gas box and ion source
An integrated gas box is disclosed. The integrated gas box is an enclosure, wherein one wall of the enclosure includes an aperture. A bushing is affixed to the exterior of this wall. The distal end of the bushing has a flange that is affixed to a wall of the vacuum chamber. The ion source is introduced into the bushing through an access door in the enclosure and slides into the aperture. The base flange of the ion source is sufficiently large such that it cannot pass through the aperture and forms a seal between the bushing and the interior of the integrated gas box. The integrated gas box includes the gas canisters and associated valves which are used to supply feed gas and diluent gasses to the ion source. The integrated gas box also houses the power supplies used to bias the components within the ion source.
1 . An ion implantation system, comprising:
a vacuum chamber that houses:
extraction optics;
a mass analyzer;
a mass resolving device; and
a workpiece holder; and
an integrated gas box located in atmospheric conditions, the integrated gas box comprising an enclosure comprising a plurality of walls, wherein a wall of the plurality of walls includes an aperture, the enclosure containing one or more gas canisters and one or more power supplies; and
a bushing affixed to the wall of the enclosure having the aperture, wherein an ion source is disposed within the bushing and a distal end of the bushing comprises a flange affixed to a wall of the vacuum chamber.
2 . The ion implantation system of claim 1 , wherein the ion source is insertable into the bushing via an interior of the enclosure.
3 . The ion implantation system of claim 1 , wherein the ion source creates a seal between the bushing and an interior of the enclosure, such that the ion source is at vacuum conditions.
4 . The ion implantation system of claim 1 , wherein the enclosure is biased at an enclosure voltage.
5 . The ion implantation system of claim 1 , wherein the enclosure comprises:
a first compartment;
a second compartment to allow access to the bushing; and
a third compartment.
6 . The ion implantation system of claim 5 , wherein the one or more gas canisters and associated valves are disposed in the first compartment.
7 . The ion implantation system of claim 5 , wherein the one or more power supplies are disposed in the third compartment.
8 . The ion implantation system of claim 5 , wherein the second compartment also contains a rack to hold one or more of the one or more power supplies.
9 . The ion implantation system of claim 1 , wherein the ion source comprises an indirectly heated cathode ion source, having an arc chamber that contains an indirectly heated cathode, a filament disposed behind the indirectly heated cathode, and the one or more power supplies comprise a filament power supply to provide current to the filament, a cathode bias power supply to bias the indirectly heated cathode relative to the filament, and an arc power supply to bias the indirectly heated cathode relative to the arc chamber.
10 . An integrated gas box for use with an ion implantation system, comprising:
an enclosure, having a plurality of walls, wherein the enclosure houses:
one or more gas canisters and associated valves to provide gas to an ion source; and
one or more power supplies to supply a respective voltage to a plurality of biased components; and
wherein an aperture is disposed in a wall of the plurality of walls, and
a bushing affixed to the wall having the aperture, such that an interior of the bushing is accessible through an interior of the enclosure, wherein the ion source is configured to be disposed in the bushing.
11 . The integrated gas box of claim 10 , wherein the enclosure is biased at an enclosure voltage, and wherein a ground reference of the one or more power supplies is the enclosure voltage.
12 . The integrated gas box of claim 10 , wherein the ion source comprises an indirectly heated cathode ion source, having an arc chamber and an indirectly heated cathode.
13 . The integrated gas box of claim 12 , wherein the arc chamber comprises a filament disposed behind the indirectly heated cathode, and the one or more power supplies comprise a filament power supply to provide current to the filament, a cathode bias power supply to bias the indirectly heated cathode relative to the filament, and an arc power supply to bias the indirectly heated cathode relative to the arc chamber.
14 . The integrated gas box of claim 10 , wherein the enclosure comprises:
a first compartment;
a second compartment to allow access to the bushing; and
a third compartment.
15 . The integrated gas box of claim 14 , wherein the one or more gas canisters and associated valves are disposed in the first compartment.
16 . The integrated gas box of claim 15 , wherein the one or more power supplies are disposed in the third compartment.
17 . The integrated gas box of claim 16 , wherein the second compartment also contains a rack to hold at least one of the one or more power supplies.
18 . The integrated gas box of claim 17 , wherein the third compartment is disposed above the second compartment and the first compartment is disposed below the second compartment.