IP Library › Granted Patent US 12,522,923
Granted Patent B2
US 12,522,923 · App. 17/692,351 · Granted Jan 13, 2026

Advanced barrier nickel oxide (BNiO) coating development for process chamber components via ozone treatment

Inventors: Laksheswar Kalita (Santa Clara, CA); Joseph Behnke (Santa Clara, CA); David Knapp (Santa Clara, CA)
Assignee: Applied Materials, Inc.
C23C16/45565C23C14/165C23C14/5853C23C16/40C23C18/1689C23C18/32
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 12,522,923
App. No.
17/692,351
Granted
Jan 13, 2026
Kind
B2
Abstract

Described herein is a chamber component including a metal layer comprising nickel and a barrier layer of nickel oxide over the metal layer. The barrier layer of nickel oxide may be formed by ozone treating the chamber component with air, nitrogen or argon O 2 , O 3 at a temperature from about 25° C. to about 350° C.

Claims (12)

1 . A method of protecting a chamber component, consisting of:

forming a metal plating directly on a surface of a body of the chamber component by performing electroless metal plating, wherein the metal plating comprises nickel, and

subsequently forming a barrier layer directly on the metal plating using a one-step process consisting of performing an ozone treatment on the chamber component by contacting the body of the chamber component with an ozone gas, wherein the barrier layer comprises nickel oxide and mitigates formation of a black film.

2 . The method of claim 1 , wherein the performing the ozone treatment occurs at a temperature of from about 25° C. to about 350° C.

3 . The method of claim 1 , wherein the performing the ozone treatment occurs at atmospheric pressure.

4 . The method of claim 1 , wherein the performing the ozone treatment occurs for about 1 hour to about 50 hours.

5 . The method of claim 1 , wherein the barrier layer has a thickness from about 10 nm to about 50 nm.

6 . The method of claim 1 , wherein the metal plating further comprises phosphorus.

7 . The method of claim 1 , wherein the body comprises an aluminum alloy, aluminum nitride, alumina, or combinations thereof.

8 . A method of protecting a chamber component, consisting of:

forming a metal plating directly on a surface of a body of the chamber component by performing electroless metal plating, wherein the metal plating comprises nickel, and

subsequently forming a barrier layer directly on the metal plating using a one-step process consisting of performing an ozone treatment on the chamber component by contacting the body of the chamber component with an ozone gas and at least of air, nitrogen, argon, or O 2 , wherein the barrier layer comprises nickel oxide and mitigates formation of a black film.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 7, 2022
From: KALITA, LAKSHESWAR; BEHNKE, JOSEPH; KNAPP, DAVID
To: APPLIED MATERIALS, INC.
Reel/Frame 060430/0007 →
Continuity (1)
Related Publication 20230287568A1 · Sep 14, 2023
References Cited (42)
US 3574930A · Riddel et al. · 1971 [cited by applicant]
US 4167416A · Zolla · 1979 [cited by applicant]
US 4659379A · Singh et al. · 1987 [cited by applicant]
US 5344425A · Sawyer · 1994 [cited by applicant]
US 5849170A · Djokic et al. · 1998 [cited by applicant]
US 5952718A · Ohtsuka et al. · 1999 [cited by applicant]
US 6280597B1 · Kashiwada et al. · 2001 [cited by applicant]
US 20020093101A1 · Iyer et al. · 2002 [cited by applicant]
US 20030106793A1 · Sirkis et al. · 2003 [cited by applicant]
US 20040045503A1 · Lee et al. · 2004 [cited by applicant]
US 20050155625A1 · Jangjian et al. · 2005 [cited by applicant]
US 20050249618A1 · Nonaka et al. · 2005 [cited by applicant]
US 20060228569A1 · Kojima et al. · 2006 [cited by applicant]
US 20070203041A1 · Lee · 2007 [cited by applicant]
US 20090140262A1 · Ohki et al. · 2009 [cited by applicant]
US 20110101076A1 · Ogaki et al. · 2011 [cited by applicant]
US 20120037930A1 · Höppel · 2012 [cited by applicant]
US 20120220116A1 · Noori et al. · 2012 [cited by applicant]
US 20130115778A1 · Xue et al. · 2013 [cited by applicant]
US 20150110965A1 · Brunner et al. · 2015 [cited by applicant]
US 20160002811A1 · Sun et al. · 2016 [cited by applicant]
US 20180080888A1 · Nazarian · 2018 [cited by applicant]
US 20180330923A1 · Tran et al. · 2018 [cited by applicant]
US 20190323127A1 · Kalita et al. · 2019 [cited by applicant]
US 20210032745A1 · Enman et al. · 2021 [cited by applicant]
CN 105261491A · 2016 [cited by applicant]
JP S61253383A · 1986 [cited by applicant]
JP H10312976A · 1998 [cited by applicant]
JP H1192912A · 1999 [cited by applicant]
JP 2003342752A · 2003 [cited by applicant]
JP 2004360066A · 2004 [cited by examiner]
JP 2005089860A · 2005 [cited by applicant]
JP 2006283141A · 2006 [cited by applicant]
JP 2010006010A · 2010 [cited by applicant]
JP 2013256686A · 2013 [cited by applicant]
KR 19980071010A · 1998 [cited by applicant]
WO WO2005014881A2 · 2005 [cited by examiner]
WO 2020196061A1 · 2020 [cited by applicant]
PCT International Search Report and Written Opinion for International Application No. PCT/US2023/011367, mailed May 24, 2023, 11 pages. [cited by applicant]
International Search Report and Written Opinion for International Application No. PCT/US2022/045268, mailed Feb. 2, 2023, 11 Pages. [cited by applicant]
International Search Report and Written Opinion for International Application No. PCT/US2023/11367, mailed May 24, 2023, 9 pages. [cited by applicant]
Kim Y., et al., “Preparation of Nickel Oxide Films by Anodizing,” Korean Chemical Engineering Research, Apr. 2012, vol. 50, No. 2, pp. 204-210. [cited by applicant]