IP Library › Granted Patent US 12,523,556
Granted Patent B2
US 12,523,556 · App. 18/322,943 · Granted Jan 13, 2026

Strain gauge

Inventors: Shinya Toda (Shizuoka, JP); Eiji Misaizu (Kanagawa, JP); Kosuke Kitahara (Kanagawa, JP)
Assignee: MINEBEA MITSUMI Inc.
G01L1/2287H05K1/0296H05K1/0393H05K1/167H05K2201/10151
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Quick Facts
Patent No.
US 12,523,556
App. No.
18/322,943
Granted
Jan 13, 2026
Kind
B2
Abstract

A strain gauge includes a flexible substrate, a resistor, and electrodes. Each electrode includes first patterns juxtaposed at predetermined intervals and electrically connected to each other. Second patterns of which longitudinal directions are toward a same direction as a longitudinal direction of each of the first patterns are disposed between opposing electrodes. The second patterns are electrically floating dummy patterns. The second patterns of which the longitudinal directions are toward a same direction as the longitudinal direction of each first pattern are disposed, the second patterns being interposed between first patterns opposite each other that are among given first patterns that constitute one of the electrodes and given first patterns that constitute another electrode. The plurality of second patterns are interposed between first patterns opposite each other that are among given first patterns that constitute one of the electrodes and given first patterns that constitute another electrode.

Claims (42)

1 . A strain gauge comprising:

a flexible substrate;

a resistor formed of material containing at least one from among chromium and nickel, on or above the substrate; and

a pair of electrodes electrically connected to the resistor,

wherein each electrode includes a plurality of first patterns that are juxtaposed at predetermined intervals and that are electrically connected to each other,

wherein a plurality of second patterns of which longitudinal directions are toward a same direction as a longitudinal direction of each of the first patterns are disposed between opposing electrodes,

wherein the plurality of second patterns are electrically floating dummy patterns, and

wherein the plurality of second patterns of which the longitudinal directions are toward a same direction as the longitudinal direction of each first pattern are disposed, the second patterns being interposed between first patterns opposite each other, among the first patterns, and the first patterns opposite each other being from among given first patterns that constitute one of the electrodes and given first patterns that constitute another electrode.

2 . The strain gauge according to claim 1 , wherein a width of each first pattern is same as a width of each second pattern, and

wherein a space between first patterns that are next to each other is same as a space between second patterns that are next to each other.

3 . The strain gauge according to claim 1 , wherein the longitudinal direction of each of the first patterns and the second patterns is parallel to a grid direction of the resistor.

4 . The strain gauge according to claim 1 , wherein the resistor is formed with alpha-chromium as a main component.

5 . The strain gauge according to claim 4 , wherein the resistor includes alpha-chromium at 80% by weight or more.

6 . The strain gauge according to claim 1 , wherein the functional layer includes a function of promoting crystal growth of the resistor.

7 . A strain gauge comprising:

a flexible substrate;

a resistor formed of material containing at least one from among chromium and nickel, on or above the substrate; and

a pair of electrodes electrically connected to the resistor,

wherein each electrode includes a plurality of first patterns that are juxtaposed at predetermined intervals and that are electrically connected to each other,

wherein a plurality of second patterns of which longitudinal directions are toward a same direction as a longitudinal direction of each of the first patterns are disposed between opposing electrodes,

wherein the plurality of second patterns are a zigzag pattern that constitutes the resistor, and

wherein the plurality of second patterns of which the longitudinal directions are toward a same direction as the longitudinal direction of each first pattern are disposed, the second patterns being interposed between first patterns opposite each other, among the first patterns, and the first patterns opposite each other being from among given first patterns that constitute one of the electrodes and given first patterns that constitute another electrode.

8 . The strain gauge according to claim 7 , wherein a width of each first pattern is same as a width of each second pattern, and

wherein a space between first patterns that are next to each other is same as a space between second patterns that are next to each other.

9 . The strain gauge according to claim 7 , wherein the longitudinal direction of each of the first patterns and the second patterns is parallel to a grid direction of the resistor.

10 . The strain gauge according to claim 7 , wherein the resistor includes alpha-chromium as a main component.

11 . The strain gauge according to claim 10 , wherein the resistor includes alpha-chromium at 80% by weight or more.

12 . The strain gauge according to claim 7 , wherein the functional layer includes a function of promoting crystal growth of the resistor.

13 . A strain gauge comprising:

a flexible substrate;

a resistor formed of material containing at least one from among chromium and nickel, on or above the substrate; and

a pair of electrodes electrically connected to the resistor,

wherein each electrode includes a plurality of first patterns that are juxtaposed at predetermined intervals and that are electrically connected to each other,

wherein a plurality of second patterns of which longitudinal directions are toward a same direction as a longitudinal direction of each of the first patterns are disposed between opposing electrodes,

wherein a width of each first pattern is same as a width of each second pattern,

wherein a space between first patterns that are next to each other is same as a space between second patterns that are next to each other, and

wherein the plurality of second patterns of which the longitudinal directions are toward a same direction as the longitudinal direction of each first pattern are disposed, each of the second patterns being interposed between end portions of opposing first patterns, among the first patterns, the opposing first patterns being from among given first patterns that constitute one of the electrodes and given first patterns that constitute another electrode.

14 . The strain gauge according to claim 13 , wherein the longitudinal direction of each of the first patterns and the second patterns is perpendicular to a grid direction of the resistor.

15 . The strain gauge according to claim 13 , wherein the plurality of second patterns are electrically floating dummy patterns.

16 . The strain gauge according to claim 13 , wherein the resistor is formed with alpha-chromium as a main component.

17 . The strain gauge according to claim 16 , wherein the resistor includes alpha-chromium at 80% by weight or more.

18 . The strain gauge according to claim 13 , wherein the functional layer includes a function of promoting crystal growth of the resistor.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 27, 2023
From: TODA, SHINYA; MISAIZU, EIJI; KITAHARA, KOSUKE
To: MINEBEA MITSUMI INC.
Reel/Frame 065042/0184 →
Priority Claims (1)
JP 2018-065346 · Mar 29, 2018 · national
Continuity (2)
Continuation 17041704
Related Publication 20230296457A1 · Sep 21, 2023
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Cited By (1)
US 12,709,787