IP Library › Granted Patent US 12,709,787
Granted Patent B2
US 12,709,787 · App. 18/479,526 · Granted Aug 18, 2026

Strain resistance film, physical quantity sensor, and method for manufacturing the strain resistance film

Inventors: Kohei Nawaoka (Tokyo, JP); Ken Unno (Tokyo, JP); Tetsuya Sasahara (Tokyo, JP); Masanori Kobayashi (Tokyo, JP); Tetsuo Hata (Tokyo, JP)
Assignee: TDK CORPORATION
C22C27/06G01B7/18
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Quick Facts
Patent No.
US 12,709,787
App. No.
18/479,526
Filed
Oct 2, 2023
Granted
Aug 18, 2026
Kind
B2
Art Unit
2855
USPC
73/774
Abstract

A strain resistance film containing a composition represented by Cr 100-x-y-z Al x N y O z , satisfying 5≤x≤50, 0.1≤y≤20, 0.1≤z≤17, and y+z≤25.

Claims (7)

1 . A strain resistance film comprising a composition represented by Cr 100-x-y-z Al x N y O z , satisfying 5≤x≤50, 0.1≤y≤20, 0.1≤z≤17, and y+z≤25.

2 . The strain resistance film according to claim 1 , having a film thickness of 10 nm or more.

3 . A physical quantity sensor comprising the strain resistance film according to claim 1 .

4 . A manufacturing method of the strain resistance film according to claim 1 , the manufacturing method being a thin film method, wherein during the thin film method, k-factor and temperature coefficient of resistance of the strain resistance film are controlled by controlling an oxygen amount and a nitrogen amount in an atmosphere gas.

5 . The strain resistance film according to claim 1 , wherein y+z is 12.0 to 20.0.

6 . The strain resistance film according to claim 1 , wherein y+z is 14.0 to 20.0.

7 . The strain resistance film according to claim 1 , wherein y+z is 1.8 to 10.7.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 2, 2023
From: NAWAOKA, KOHEI; UNNO, KEN; SASAHARA, TETSUYA; KOBAYASHI, MASANORI; HATA, TETSUO
To: TDK CORPORATION
Reel/Frame 065097/0573 →
Priority Claims (1)
JP 2022-161188 · Oct 5, 2022 · national
Continuity (1)
Related Publication 20240117474A1 · Apr 11, 2024
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