IP Library › Granted Patent US 12,411,000
Granted Patent B2
US 12,411,000 · App. 17/907,567 · Granted Sep 9, 2025

Strain gauge

Inventors: Atsushi Kitamura (Nagano, JP); Toshiaki Asakawa (Nagano, JP); Aya Ono (Nagano, JP); Akiyo Yuguchi (Nagano, JP)
Assignee: MINEBEA MITSUMI Inc.
G01B7/20G01L1/225G01L1/2293
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Quick Facts
Patent No.
US 12,411,000
App. No.
17/907,567
Granted
Sep 9, 2025
Kind
B2
Abstract

A strain gauge includes a flexible resin substrate and a resistor formed of a film that includes Cr, CrN, and Cr 2 N, the resistor being situated on or above the substrate. A film thickness of the resistor is greater than or equal to 100 nm and less than or equal to 700 nm.

Claims (13)

1. A strain gauge comprising:

a flexible resin substrate; and

a resistor formed of a film that includes a composite film of Cr, CrN, and Cr 2 N, the resistor being situated on or above the substrate,

wherein a film thickness of the resistor is greater than or equal to 100 nm and less than or equal to 700 nm, and each of a creep amount and a creep recovery amount of a weighing instrument including the strain gauge is within ±0.0735% when measured with the weighing instrument according to International Organization of Legal Metrology (OIML) R60.

2. The strain gauge according to claim 1 , wherein the film thickness of the resistor is greater than or equal to 150 nm and less than or equal to 500 nm.

3. The strain gauge according to claim 2 , wherein the film thickness of the resistor is greater than or equal to 250 nm and less than or equal to 400 nm.

4. The strain gauge according to claim 1 , wherein a film thickness of the substrate is greater than or equal to 10 μm and less than or equal to 130 μm.

5. The strain gauge according to claim 4 , wherein the film thickness of the substrate is greater than or equal to 10 μm and less than or equal to 100 μm.

6. The strain gauge according to claim 5 , wherein the film thickness of the substrate is greater than or equal to 30 μm and less than or equal to 70 μm.

7. The strain gauge according to claim 1 , wherein a material of the substrate is polyimide.

8. The strain gauge according to claim 1 , wherein a gauge factor is 10 or more.

9. The strain gauge according to claim 1 , wherein CrN and Cr 2 N included in the resistor are at 20% by weight or less.

10. The strain gauge according to claim 1 , wherein a percentage of Cr 2 N in the CrN and Cr 2 N is greater than or equal to 80% by weight and less than 90% by weight.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 13, 2025
From: KITAMURA, ATSUSHI; ASAKAWA, TOSHIAKI; ONO, AYA; YUGUCHI, AKIYO
To: MINEBEA MITSUMI INC.
Reel/Frame 072005/0723 →
Priority Claims (1)
JP 2020-060534 · Mar 30, 2020 · national
Continuity (1)
Related Publication 20230147031A1 · May 11, 2023
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Cited By (1)
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