IP Library › Granted Patent US 12,523,461
Granted Patent B2
US 12,523,461 · App. 17/995,504 · Granted Jan 13, 2026

Strain gauge

Inventors: Atsushi Kitamura (Nagano, JP); Toshiaki Asakawa (Nagano, JP); Yosuke Ogasa (Nagano, JP); Aya Ono (Nagano, JP); Akiyo Yuguchi (Nagano, JP)
Assignee: MINEBEA MITSUMI Inc.
G01B7/18
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Quick Facts
Patent No.
US 12,523,461
App. No.
17/995,504
Granted
Jan 13, 2026
Kind
B2
Abstract

A strain gauge includes a flexible substrate, at least one resistor formed on or above the substrate, and a pair of electrodes formed on or above the substrate, electrodes being electrically coupled to the resistor via lines, respectively. Each of the lines electrically connects an end of the resistor and a given electrode, the end being situated in a width direction of a grid. Each of the lines includes a first metallic layer and a second metallic layer that is formed of a material having a lower resistance than a material of the first metallic layer, the second metallic layer being situated on the first metallic layer.

Claims (21)

1 . A strain gauge comprising:

a flexible substrate;

at least one resistor formed on or above the substrate; and

a pair of electrodes formed on or above the substrate, electrodes in the pair being electrically coupled to the resistor via lines, respectively,

wherein each of the lines electrically connects an end of the resistor and a given electrode among the pair of electrodes, the end being situated in a width direction of a grid,

wherein each of the lines includes

a first metallic layer, and

a second metallic layer that is formed of a material having a lower resistance than a material of the first metallic layer, the second metallic layer being situated on the first metallic layer,

wherein the first metallic layer has a width in a range of greater than or equal to 10 μm and less than or equal to 100 μm, and

wherein a strain limit of the strain gauge increases linearly as the width of the first metallic layer decreases within the range.

2 . The strain gauge according to claim 1 , wherein the at least one resistor includes a plurality of resistors that are formed on or above the substrate, and

wherein each of the lines serves as a portion that connects given resistors among the plurality of resistors.

3 . The strain gauge according to claim 1 , wherein the first metallic layer is integrally formed of a same material as the resistor.

4 . The strain gauge according to claim 1 , wherein each of the electrodes includes

the first metallic layer, and

the second metallic layer that is formed of the material having the lower resistance than the material of the first metallic layer, the second metallic layer being situated on the first metallic layer.

5 . The strain gauge according to claim 1 , wherein the second metallic layer is formed of a material that is more stretchable than the material of the first metallic layer.

6 . The strain gauge according to claim 1 , wherein the resistor is formed of a film that includes a mixture of Cr, CrN, and Cr 2 N.

7 . The strain gauge according to claim 6 , wherein a gauge factor is 10 or more.

8 . The strain gauge according to claim 6 , wherein CrN and Cr 2 N included in the resistor are at 20% by weight or less.

9 . The strain gauge according to claim 8 , wherein a percentage of Cr 2 N in the CrN and Cr 2 N is greater than or equal to 80% by weight and less than 90% by weight.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 14, 2025
From: KITAMURA, ATSUSHI; ASAKAWA, TOSHIAKI; OGASA, YOSUKE; ONO, AYA; YUGUCHI, AKIYO
To: MINEBEA MITSUMI INC.
Reel/Frame 072023/0373 →
Priority Claims (3)
JP 2020-069842 · Apr 8, 2020 · national
JP 2020-174823 · Oct 16, 2020 · national
JP 2021-055762 · Mar 29, 2021 · national
Continuity (1)
Related Publication 20230175831A1 · Jun 8, 2023
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Cited By (1)
US 12,709,787