IP Library Granted Patent US 12,529,145
Granted Patent B2
US 12,529,145 · App. 17/631,837 · Granted Jan 20, 2026

Pretreatment method for electroless plating, and pretreatment solution for electroless plating

Inventors: Tetsuji Ishida (Osaka, JP); Hisamitsu Yamamoto (Osaka, JP); Ryoyu Shimizu (Osaka, JP)
Assignee: C. Uyemura & Co., Ltd.
C23C18/24B01J23/44C23C18/2086
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Quick Facts
Patent No.
US 12,529,145
App. No.
17/631,837
Granted
Jan 20, 2026
Kind
B2
Abstract

The purpose of the present invention is to provide a pretreatment method for electroless plating and a pretreatment solution for electroless plating capable of increasing an adsorption amount of a catalyst. A pretreatment method for electroless plating for performing an electroless plating on a substrate, the pretreatment method at least comprises: a cleaner process S 10 ; a soft etching process S 20 and/or an acid treatment process S 30 ; a catalyst imparting process S 40 ; and a catalyst reducing process S 50 , wherein an anionic surfactant for ionizing a part of a hydrophilic group to an anion is added to a treatment solution used in the soft etching process S 20 and/or the acid treatment process S 30 , an ionic catalyst is imparted on the substrate in the catalyst imparting process S 40 , and the ionic catalyst is reduced in the catalyst reducing process S 50 to increase an adsorption amount of the catalyst on the substrate.

Claims (13)

1 . A pretreatment method for electroless plating for performing an electroless plating on a substrate, the pretreatment method at least comprises a cleaner process; a soft etching process; an acid treatment process; a catalyst imparting process; and a catalyst reducing process,

wherein the cleaner process comprises cleaning the substrate with a cleaner solution having a first surfactant,

wherein the soft etching process comprises etching the substrate, dissolving a metal disposed on at least a portion of the substrate, and removing the first surfactant with a first treatment solution that includes a first acid,

wherein the acid treatment process comprises washing the substrate with a second treatment solution that includes a second acid,

wherein the catalyst imparting process comprises imparting an ionic catalyst on the substrate,

wherein the catalyst reducing process comprises reducing complex ions adsorbed on the substrate to metal, and

wherein an anionic surfactant for ionizing a part of a hydrophilic group to an anion is added to the first treatment solution and the second treatment solution, and

the ionic catalyst is reduced in the catalyst reducing process to increase an adsorption amount of the catalyst on the substrate.

2 . The pretreatment method for electroless plating according to claim 1 , wherein the pretreatment method enables adsorption of a metal catalyst on the substrate without requiring a predip process to facilitate the adsorption.

3 . The pretreatment method for electroless plating according to claim 1 , wherein a concentration of the anionic surfactant is 0.01 to 10 g/L.

4 . The pretreatment method for electroless plating according to claim 1 , wherein the anionic surfactant is one or more of a carboxylate, a sulfonate, a polyoxyethylene alkyl ether phosphate, and a polyacrylate.

5 . The pretreatment method for electroless plating according to claim 1 , wherein the anionic surfactant is an alkyl diphenyl ether disulfonate.

6 . The pretreatment method for electroless plating according to claim 1 , wherein the catalyst is a palladium.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 31, 2022
From: ISHIDA, TETSUJI; YAMAMOTO, HISAMITSU; SHIMIZU, RYOYU
To: C. UYEMURA & CO., LTD.
Reel/Frame 058836/0007 →
Priority Claims (1)
JP 2019-142711 · Aug 2, 2019 · national
Continuity (1)
Related Publication 20220275516A1 · Sep 1, 2022
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