System and method of monitoring precursor tank
A system for monitoring a precursor tank during a deposition process includes a sensor and a signal processor. The sensor includes a sensor chamber connected in line with the precursor tank and a deposition chamber, a radiation emitter to emit a radiation passing through a precursor-containing gas in the sensor chamber, and a radiation receiver to receive the radiation passed through the precursor-containing gas. The signal processor obtains an absorption spectrum of the precursor-containing gas from the received radiation and determines a remaining precursor amount in the precursor tank based on the absorption spectrum. The system facilitates inline monitoring the remaining precursor amount in the precursor tank during a deposition operation, thereby advantageously reducing risks of undergoing a deposition operation while the remaining precursor amount is unacceptably low and avoiding replacing the precursor tank while the remaining precursor amount is acceptable.
1 . A system for monitoring a precursor tank during a deposition process, comprising:
a gas sensor comprising a sensor chamber connected in line with the precursor tank and a deposition chamber, a radiation emitter configured to emit a radiation to pass through a precursor-containing gas in the sensor chamber, and a radiation receiver configured to receive the radiation passed through the precursor-containing gas; and
a signal processor configured to;
obtain an absorption spectrum S 1 of the precursor-containing gas from the received radiation,
determine an absorption ratio value of an absorption peak value P 1 of the absorption spectrum S 1 to an initial absorption peak value P 0 of an initial absorption spectrum S 0 , and
determine a remaining precursor amount of a precursor in the precursor tank based on the absorption ratio value.
2 . The system of claim 1 , wherein the signal processor is configured to send a warning signal to a process controller upon detecting the remaining precursor amount equal to or lower than a threshold value.
3 . The system of claim 1 , wherein the precursor-containing gas is delivered from the precursor tank to the sensor chamber via an inlet, and wherein the precursor-containing gas is delivered from the sensor chamber to the deposition chamber via an outlet.
4 . The system of claim 1 , wherein the signal processor is configured to identify an existence of the precursor in the precursor-containing gas by the absorption peak value P 1 at a characteristic wavelength of the precursor in the absorption spectrum S 1 .
5 . The system of claim 1 , wherein the absorption peak value P 1 and the initial absorption peak value P 0 are both determined at a characteristic wavelength, the absorption peak value P 1 is determined at time T 1 , and the initial absorption peak value P 0 is determined at time T 0 before time T 1 .
6 . The system of claim 5 , wherein the time T 0 corresponds to an initial time when the precursor tank contains a maximum or full amount of the precursor.
7 . The system of claim 5 , wherein the signal processor is configured to estimate an existing precursor amount value in a statistical process chart (SPC) using the absorption ratio value, and determine the remaining precursor amount being equal to the existing precursor amount value in the SPC, and wherein each existing precursor amount value in the SPC is associated with an existing absorption ratio value in the SPC.
8 . A system of monitoring and controlling a deposition operation, comprising:
a sensor comprising a sensor chamber connected in line with a precursor tank and a deposition chamber, a radiation emitter to emit a radiation passing through a precursor-containing gas supplied from the precursor tank, and a radiation receiver to receive the radiation;
a signal processor configured to:
obtain an absorption spectrum S 1 of the precursor-containing gas from the received radiation,
determine an absorption ratio value of an absorption peak value P 1 of the absorption spectrum S 1 to an initial absorption peak value P 0 of an initial absorption spectrum S 0 , and
determine a remaining precursor amount of a precursor in the precursor tank based on the absorption ratio value; and
a process controller configured to activate one or more actions upon being informed by the signal processor of the remaining precursor amount equal to or lower than a threshold value.
9 . The system of claim 8 , wherein the deposition operation comprises a chemical vapor deposition (CVD) or an atomic layer deposition (ALD).
10 . The system of claim 8 , wherein the one or more actions comprise automatically stopping the deposition operation, sealing the precursor tank, and switching on a spare precursor tank to connect to the deposition chamber via the sensor.
11 . The system of claim 8 , wherein the precursor in the precursor tank is in solid state.
12 . The system of claim 8 , wherein the precursor-containing gas comprises a gaseous precursor supplied from the precursor tank and a carrier gas supplied from a carrier gas source.
13 . The system of claim 8 , wherein the absorption peak value P 1 and the initial absorption peak value P 0 are both determined at a characteristic wavelength, the absorption peak value P 1 is determined at time T 1 , and the initial absorption peak value P 0 is determined at time T 0 before time T 1 .
14 . The system of claim 13 , wherein the time T 0 corresponds to an initial time when the precursor tank contains a maximum or full amount of the precursor.
15 . The system of claim 13 , wherein the signal processor is configured to estimate an existing precursor amount value in a statistical process chart (SPC) using the absorption ratio value, and determine the remaining precursor amount being equal to the existing precursor amount value in the SPC, and wherein each existing precursor amount value in the SPC is associated with an existing absorption ratio value in the SPC.
16 . A method of monitoring a precursor tank during a deposition operation, comprising:
introducing a precursor-containing gas into a sensor chamber of a gas sensor from the precursor tank;
emitting by a radiation emitter a radiation passing through the precursor-containing gas and received by a radiation receiver;
obtaining by a signal processor an absorption spectrum S 1 of the precursor-containing gas from the received radiation;
determining by the signal processor an absorption ratio value of an absorption peak value P 1 of the absorption spectrum S 1 to an initial absorption peak value P 0 of an initial absorption spectrum S 0 ;
determining by the signal processor a remaining precursor amount of a precursor in the precursor tank based on the absorption ratio value; and
sending by the signal processor a warning signal upon detecting the remaining precursor amount reaching or below a threshold value.
17 . The method of claim 16 , wherein upon receiving the warning signal, a process controller automatically stops the deposition operation and seals the precursor tank.
18 . The method of claim 16 , wherein the absorption peak value P 1 and the initial absorption peak value P 0 are both determined at a characteristic wavelength, the absorption peak value P 1 is determined at time T 1 , and the initial absorption peak value P 0 is determined at time T 0 before time T 1 .
19 . The method of claim 18 , wherein the time T 0 corresponds to at an initial time when the precursor tank contains a full amount of the precursor.
20 . The method of claim 18 , wherein the signal processor is configured to estimate an existing absorption spectrum associated with an existing precursor amount value in a statistical process chart (SPC) using the absorption ratio value, and determine the remaining precursor amount at the time using the existing precursor amount value in the SPC, and wherein each existing precursor amount value in the SPC is associated with an existing absorption value in the SPC.